-
公开(公告)号：US09376750B2
公开(公告)日：2016-06-28
申请号：US10482627
申请日：2002-07-16
IPC分类号： C30B28/00 , C23C16/44 , B01J31/06 , B82Y30/00 , C08J7/04 , C23C16/02 , C23C16/14 , C23C16/34 , C23C16/40 , C23C16/442 , C23C16/455 , C09D1/00 , H01L51/52
摘要： Inorganic materials are deposited onto organic polymers using ALD methods. Ultrathin, conformal coatings of the inorganic materials can be made in this manner. The coated organic polymers can be used as barrier materials, as nanocomposites, as catalyst supports, in semiconductor applications, in coating applications as well as in other applications.
摘要翻译： 使用ALD方法将无机材料沉积到有机聚合物上。 可以以这种方式制造无机材料的超薄，保形涂层。 涂覆的有机聚合物可以用作阻挡材料，作为纳米复合材料，作为催化剂载体，在半导体应用中，在涂覆应用中以及在其它应用中。
-
公开(公告)号：US09196901B2
公开(公告)日：2015-11-24
申请号：US13159352
申请日：2011-06-13
CPC分类号： H01M4/485 , H01M4/0402 , H01M4/505 , H01M4/525 , H01M4/5825 , H01M4/628 , H01M10/0525 , Y02E60/122 , Y02T10/7011
摘要： Electrodes for lithium batteries are coated via an atomic layer deposition process. The coatings can be applied to the assembled electrodes, or in some cases to particles of electrode material prior to assembling the particles into an electrode. The coatings can be as thin as 2 Ångstroms thick. The coating provides for a stable electrode. Batteries containing the electrodes tend to exhibit high cycling capacities.
摘要翻译： 通过原子层沉积工艺涂覆锂电池电极。 在将颗粒组装成电极之前，涂层可以施加到组装的电极，或者在某些情况下应用于电极材料的颗粒。 涂层可以薄至2埃厚。 涂层提供稳定的电极。 含有电极的电池往往表现出高的循环能力。
-
3.发明授权Methods for preoducing coated phosphors and host material particles using atomic layer deposition methods 有权使用原子层沉积方法预处理涂覆的磷光体和主体材料颗粒的方法公开(公告)号：US08163336B2
公开(公告)日：2012-04-24
申请号：US12708562
申请日：2010-02-19
申请人： Alan W. Weimer , Steven M. George , Karen J. Buechler , Joseph A. Spencer, II , Jarod McCormick
发明人： Alan W. Weimer , Steven M. George , Karen J. Buechler , Joseph A. Spencer, II , Jarod McCormick
IPC分类号： B32B5/66
CPC分类号： C23C16/403 , C09K11/025 , C09K11/56 , C23C16/405 , C23C16/4417 , C23C16/442 , C23C16/45525 , C23C16/45555
摘要： Layers of a passivating material and/or containing luminescent centers are deposited on phosphor particles or particles that contain a host material that is capable of capturing an excitation energy and transferring it to a luminescent center or layer. The layers are formed in an ALD process. The ALD process permits the formation of very thin layers. Coated phosphors have good resistance to ambient moisture and oxygen, and/or can be designed to emit a distribution of desired light wavelengths.
摘要翻译： 钝化材料层和/或含有发光中心的层被沉积在含有能够捕获激发能并将其转移到发光中心或层的主体材料的荧光体颗粒或颗粒上。 层在ALD工艺中形成。 ALD工艺允许形成非常薄的层。 涂覆的荧光体具有良好的耐环境湿度和氧气的能力，和/或可被设计成发射所需光波长的分布。
-
4.发明申请METAL FERRITE SPINEL ENERGY STORAGE DEVICES AND METHODS FOR MAKING AND USING SAME 有权金属铁素体能量储存装置及其制造和使用方法公开(公告)号：US20100218491A1
公开(公告)日：2010-09-02
申请号：US12741492
申请日：2008-11-05
CPC分类号： F28D20/003 , C01B3/042 , C01B3/06 , C01B13/0203 , C09K5/16 , C23C16/406 , C23C16/45525 , C23C16/45531 , Y02E60/142 , Y02E60/364 , Y02E70/30 , Y02P20/134 , Y10T428/24033 , Y10T428/257
摘要： 1-100 nm metal ferrite spinel coatings are provided on substrates, preferably by using an atomic layer deposition process. The coatings are able to store energy such as solar energy, and to release that stored energy, via a redox reaction. The coating is first thermally or chemically reduced. The reduced coating is then oxidized in a second step to release energy and/or hydrogen, carbon monoxide or other reduced species.
摘要翻译： 优选通过使用原子层沉积工艺在衬底上提供1-100nm的金属铁素体尖晶石涂层。 涂层能够储存诸如太阳能的能量，并通过氧化还原反应释放储存的能量。 涂层首先被热或化学还原。 然后在第二步骤中将还原的涂层氧化以释放能量和/或氢，一氧化碳或其它还原物质。
-
公开(公告)号：US20100215897A1
公开(公告)日：2010-08-26
申请号：US12774286
申请日：2010-05-05
IPC分类号： C23C16/44
CPC分类号： F28D20/003 , C01B3/042 , C01B3/06 , C01B13/0203 , C09K5/16 , C23C16/406 , C23C16/45525 , C23C16/45531 , Y02E60/142 , Y02E60/364 , Y02E70/30 , Y02P20/134 , Y10T428/24033 , Y10T428/257
摘要： 1-100 nm metal ferrite spinel coatings are provided on substrates, preferably by using an atomic layer deposition process. The coatings are able to store energy such as solar energy, and to release that stored energy, via a redox reaction. The coating is first thermally or chemically reduced. The reduced coating is then oxidized in a second step to release energy and/or hydrogen, carbon monoxide or other reduced species.
-
6.发明授权
公开(公告)号：US6043177A
公开(公告)日：2000-03-28
申请号：US786675
申请日：1997-01-21
申请人： John L. Falconer , Steven M. George , Andrew W. Ott , Jason W. Klaus , Richard D. Noble , Hans H. Funke
发明人： John L. Falconer , Steven M. George , Andrew W. Ott , Jason W. Klaus , Richard D. Noble , Hans H. Funke
IPC分类号： B01D67/00 , B01D71/02 , B01J20/28 , C23C16/04 , C23C16/455 , B01J29/04 , B01J29/06 , C01G17/00
CPC分类号： B01D67/0093 , B01D71/028 , C23C16/045 , C23C16/45525 , C23C16/45555 , B01D2323/38
摘要： A process for modifying surfaces of zeolites and molecular sieve membranes to decrease effective pore size for separation of materials includes atomic layer controlled vapor or liquid deposition. The atomic layer controlled deposition process steps include (i) exposing the surface to a metal atom coordinated with ligand groups having bonds that are hydrolyzable to form molecular bonded structures on the surface, which structures comprise the metal atoms coordinated with the ligand group or a modified ligand group and then (ii) hydrolyzing the bonds and possibly, but not necessarily, cross-linking the bonds in the ligand or modified ligand group.
摘要翻译： 用于改性沸石和分子筛膜表面以降低用于分离材料的有效孔径的方法包括原子层控制的蒸汽或液体沉积。 原子层控制的沉积工艺步骤包括（i）将表面暴露于与具有可水解的键的配体基团配位的金属原子，以在表面上形成分子键合结构，该结构包含与配体基团配位的金属原子或经修饰的 然后（ii）水解所述键并且可能但不是必然地将配体或修饰的配体基团中的键交联。
-
7.发明申请PROTECTIVE COATINGS FOR ORGANIC ELECTRONIC DEVICES MADE USING ATOMIC LAYER DEPOSITION AND MOLECULAR LAYER DEPOSITION TECHNIQUES 有权使用原子层沉积和分子层沉积技术制备的有机电子器件的保护涂层公开(公告)号：US20100178481A1
公开(公告)日：2010-07-15
申请号：US12664858
申请日：2008-06-22
CPC分类号： H01L51/0097 , C23C16/402 , C23C16/403 , C23C16/45525 , C23C28/00 , C23C28/04 , C23C28/42 , H01L51/5237 , H01L51/5256 , H01L2251/5338 , Y02E10/549 , Y10T428/2495 , Y10T428/26
摘要： Coatings are applied on a flexible substrate using atomic layer deposition and molecular layer deposition methods. The coatings have thickness of up to 100 nanometers. The coatings include layers of an inorganic material such as alumina, which are separated by flexibilizing layers that are deposited with covalent chemical linkage to the inorganic material and which are one or more of silica deposited by an atomic layer deposition process; an organic polymer that is deposited by a molecular layer deposition process, or a hybrid organic-inorganic polymer that is deposited by an molecular layer deposition process.
摘要翻译： 使用原子层沉积和分子层沉积方法将涂层施加在柔性基底上。 涂层的厚度可达100纳米。 涂层包括无机材料如氧化铝的层，它们由通过共价化学键沉积到无机材料并且是通过原子层沉积工艺沉积的二氧化硅中的一种或多种的柔性层分离; 通过分子层沉积工艺沉积的有机聚合物，或通过分子层沉积工艺沉积的杂化有机 - 无机聚合物。
-
8.发明申请Methods for producing coated phosphor and host material particles using atomic layer deposition methods 审中-公开使用原子层沉积方法生产涂层磷光体和主体材料颗粒的方法公开(公告)号：US20070298250A1
公开(公告)日：2007-12-27
申请号：US11473289
申请日：2006-06-22
CPC分类号： C23C16/403 , C09K11/025 , C09K11/56 , C23C16/405 , C23C16/4417 , C23C16/442 , C23C16/45525 , C23C16/45555
摘要： Layers of a passivating material and/or containing luminescent centers are deposited on phosphor particles or particles that contain a host material that is capable of capturing an excitation energy and transferring it to a luminescent center or layer. The layers are formed in an ALD process. The ALD process permits the formation of very thin layers. Coated phosphors have good resistance to ambient moisture and oxygen, and/or can be designed to emit a distribution of desired light wavelengths.
摘要翻译： 钝化材料层和/或含有发光中心的层沉积在含有能够捕获激发能并将其转移到发光中心或层的主体材料的荧光体颗粒或颗粒上。 层在ALD工艺中形成。 ALD工艺允许形成非常薄的层。 涂覆的荧光体具有良好的耐环境湿度和氧气的能力，和/或可被设计成发射所需光波长的分布。
-
公开(公告)号：US06913827B2
公开(公告)日：2005-07-05
申请号：US10731639
申请日：2003-12-09
IPC分类号： B01J2/00 , B01J21/04 , B01J23/755 , B01J27/24 , B01J37/02 , B01J37/08 , B22F1/02 , C04B20/10 , C04B41/45 , C04B41/52 , C04B41/81 , C04B41/89 , C23C8/02 , C23C10/06 , C23C16/40 , C23C16/44 , C23C16/442 , C23C16/455 , C23C30/00 , H01L23/29 , H01L23/373 , B32B5/16
CPC分类号： C23C16/45525 , B01J2/006 , B01J21/04 , B01J23/755 , B01J27/24 , B01J37/0207 , B01J37/0238 , B01J37/024 , B01J37/086 , B22F1/02 , B22F1/025 , C04B20/1066 , C04B35/628 , C04B35/62807 , C04B35/62813 , C04B35/62815 , C04B35/62821 , C04B35/62828 , C04B35/62831 , C04B35/62836 , C04B35/62842 , C04B35/62884 , C04B35/62894 , C04B35/62897 , C04B41/009 , C04B41/4584 , C04B41/52 , C04B41/81 , C04B41/89 , C04B2235/3225 , C04B2235/3244 , C04B2235/3821 , C04B2235/3839 , C04B2235/3843 , C04B2235/3847 , C04B2235/386 , C04B2235/3865 , C04B2235/3873 , C04B2235/444 , C04B2235/446 , C23C8/02 , C23C10/06 , C23C16/402 , C23C16/403 , C23C16/4417 , C23C16/442 , C23C16/45555 , C23C30/00 , H01L23/295 , H01L23/3737 , H01L2924/0002 , Y02T50/67 , Y10T428/2982 , Y10T428/2991 , Y10T428/2993 , Y10T428/2998 , C04B14/325 , C04B14/322 , C04B41/5027 , C04B41/4531 , C04B41/5031 , C04B41/5035 , C04B35/584 , C04B35/581 , C04B35/583 , H01L2924/00
摘要： Particles have an ultrathin, conformal coating are made using atomic layer deposition methods. The base particles include ceramic and metallic materials. The coatings can also be ceramic or metal materials that can be deposited in a binary reaction sequence. The coated particles are useful as fillers for electronic packaging applications, for making ceramic or cermet parts, as supported catalysts, as well as other applications.
摘要翻译： 颗粒具有超薄的保形涂层是使用原子层沉积方法制成的。 基础颗粒包括陶瓷和金属材料。 涂层也可以是可以以二元反应顺序沉积的陶瓷或金属材料。 涂覆的颗粒可用作电子包装应用的填料，用作制备陶瓷或金属陶瓷部件，作为载体催化剂以及其它应用。
-
10.发明授权公开(公告)号：US06818250B2
公开(公告)日：2004-11-16
申请号：US09896955
申请日：2001-06-29
申请人： Steven M. George , Jason W. Klaus
发明人： Steven M. George , Jason W. Klaus
IPC分类号： C23C1640
CPC分类号： C23C16/45534 , C23C16/402 , C23C16/45527
摘要： Silicon dioxide (SiO2) films are deposited at room temperature using a chemical vapor deposition (CVD) reaction catalyzed by ammonia or a Lewis base. The SiO2 film growth is accomplished through the reaction of water and certain silicon precursors. Examples of these reactions include the SiCl4+2H2O→SiO2+4HCl or Si(OR)4+2H2O→SiO2+4ROH reactions and catalyzed with ammonia (NH3) or other Lewis bases. The NH3 catalyst lowered the required temperature for SiO2 CVD from >900 K to 313-333 K and reduced the SiCl4 and H2O pressures required for efficient SiO2 CVD from several Torr to
摘要翻译： 使用由氨或路易斯碱催化的化学气相沉积（CVD）反应在室温下沉积二氧化硅（SiO 2）膜。 SiO2膜生长通过水和某些硅前体的反应完成。 这些反应的实例包括SiCl 4 + 2H 2 O-→SiO 2 + 4HCl或Si（OR）4 + 2H 2 O-> SiO 2 + 4ROH反应，并用氨（NH 3）或其它路易斯碱催化。 NH3催化剂将SiO 2 CVD的所需温度从> 900K降低到313-333K，并将有效SiO 2 CVD所需的SiCl 4和H 2 O压力从几Tor降低到<500MTORR。
-
-
-
-
-
-
-
-
-
搜索结果
32 条记录 (耗时 0.027 秒)
