摘要:
The present invention relates to an electrochromic element for use in various types of displays and dimming devices, and having a structure comprising bases, a pair of electrodes provided on the bases, at least one of the electrodes being a transparent electrode, color-forming layers provided between the pair of electrodes, and electrolyte superposed with the color-forming layers, and also provided between the pair of electrodes, and a light stabilizer made to be contained in the color-forming layers by being contained in the electrolyte.
摘要:
A resin molded article comprising a main body of molded material, an intermediate coating layer comprising scaly pieces of matter and a resin constituent composed of one, or a plurality of layers, and a finish coating layer formed on the outermost surface of the intermediate coating layer. The resin molded article of the present invention provides improved resistance to chipping.
摘要:
An electrochromic device is disclosed. The electrochromic device includes a pair of bases, and both a primary and a reference electrochromic element provided between the bases. The reference electrode is electrically connected to the primary electrochromic element so as to maintain the color-developing and fading potentials of the primary electrochromic element at predetermined voltages. A power regulator is also provided for driving the primary electrochromic element based in part on the output of the reference electrochromic element.
摘要:
Contoured step sections and contoured grooves along the step sections are formed on a grille body. The grille body is subjected to chemical plating. Since the grooves have narrow bottoms, the bottoms remain unplated, so that a chemical plating layer is formed on the entire surface of the grille body except for the bottoms. The grille body having the chemical plating layer formed thereon is then subjected to an electroplating step having a plurality of steps. An undercoat plating layer is formed on the chemical plating layer formed on the portions where decorative plating is to be applied. The chemical plating layer formed on the portions where no decorative plating is to be applied is dissolved with a predetermined solution. Subsequently, a general electroplating layer is formed on the undercoat plating layer. Thus, the chemical plating layer and the electroplating layers are formed only on the to-be-plated portions. The plated portions are covered with an electroforming mask, and a coating is applied onto the exposed portions to form a coating layer, where the edges of the electroforming mask can be registered with the edges of the plating layer. Accordingly, the boundaries between the coating layer and the plating layer can clearly be defined.
摘要:
Annular grooves having substantially V-shaped cross sections are formed on the front surface and the rear surface of a grille body. A through hole communicating to the front surface and the rear surface of the grille body is also formed so that the front aperture may be smaller than the rear aperture. A protrusion is formed on the rear surface of the grille body, which is located inner than the groove. The grille body is immersed into a chemical plating solution to form a chemical plating layer on the entire surface of the grille body except for the bottoms of the grooves. The grille body is then subjected to undercoat plating, in which the grille body is immersed into a predetermined plating solution utilizing the protrusion as a kind of electrode so as to electrically charge the chemical plating layer present on the front surface from the layer present on the protrusion and through the layer present in the through hole to allow an undercoat plating layer to be formed on the portions where decorative plating is formed. The chemical plating layer formed on the portions where no decorative plating is formed is dissolved by a predetermined solution. A general electroplating layer is formed likewise on the undercoat plating layer. The chemical plating layer and the electroplating layer are formed only on the to-be-plated portions. The protrusion does not impair the front appearance of the front grille.
摘要:
In layer structure 20 of a semiconductor laser of a surface emitting type, 21 and 24 represent an n-type contact layer made of n-type GaN and a p-layer made of p-type AlGaN, respectively. In the laser, an n-type DBR layer 22 made of n-type InGaN and a DBR layer 25 made of dielectric are formed on and below a InGaN active layer 23, respectively, each of which forms a reflection surface vertical to the z axis. By forming a reflection surface vertical to the z axis at each of on and above the active layer 23, a resonator is obtained. Here optical distance between two reflection facets are arranged to an integral multiple of half a oscillation wavelength. Consequently, the present invention enables to produce a semiconductor laser of a surface emitting type easier by far compared with a conventional invention.
摘要:
To provide a light emitting element that can extract substantially all the light emitted from a luminous layer structure to the outside, a GaN substrate and a luminous layer structure are formed by growing III nitride compound semiconductor on a sapphire substrate that is a growth substrate. Thereafter, the sapphire substrate is lifted off and minute irregularities are formed on the exposed GaN substrate. The pitch of irregularities is shorter than the wavelength of light emitted from the luminous layer structure.
摘要:
A light-emitting device including: a semiconductor light-emitting element using a substrate surface as a light-extracting surface; and a mount frame on which the semiconductor light-emitting element is mounted and which has a reflecting portion for reflecting light emitted from the substrate surface; wherein the mount frame has a swollen portion formed so that part of the substrate surface of the light-emitting element is supported by the swollen portion.
摘要:
A III group nitride system compound semiconductor light emitting element has: a transparent substrate with a concave portion on the surface; a filling material that is embedded in the concave portion; and a III group nitride system compound semiconductor layer that is formed on the surface of the transparent substrate. The filling material has a refractive index substantially equal to that of the III group nitride system compound semiconductor layer or closer to that of the III group nitride system compound semiconductor layer than that of the transparent substrate.
摘要:
In a group III nitride compound semiconductor light emitting device comprising an n-type semiconductor layer, a p-type semiconductor layer having a superlattice structure in which a first layer comprising at least Al and a second layer having a different composition from that of the first layer are laminated repetitively, and an active layer interposed between the n-type semiconductor layer and the p-type semiconductor layer, wherein an Al composition of the first layer which is the closest to the active layer is set to be lower than that of each of the other first layers, and wherein a doping amount of a p-type impurity in the first layer which is the closest to the active layer is set to be smaller than that of the p-type impurity of each of the other first layers or non-doped.