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公开(公告)号:US07002443B2
公开(公告)日:2006-02-21
申请号:US10607407
申请日:2003-06-25
IPC分类号: H01F27/08
CPC分类号: H01F27/266 , H01F27/025 , H01F27/10 , H01S3/097
摘要: An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member having at least one core support member wall is disclosed which may comprise a core support coolant inlet; a core support coolant outlet; a plurality of interconnected coolant flow passages contained within the core support member wall and interconnected and arranged to pass coolant from one coolant flow passage to the next within the core support member wall along a coolant flow path within at least a substantial portion of the core support member wall from the core support coolant inlet to the core support coolant outlet. The apparatus may also comprise each core support coolant flow passage is in fluid communication with a fluid communication plenum at each end of each respective core support coolant flow passage, with each respective fluid communication plenum forming an outlet plenum for at least a first one of the respective core support coolant flow passages and an inlet plenum for at least a second one of the respective core support coolant flow passages along the coolant flow path from the core support coolant inlet to the core support coolant outlet. The core support member may comprise a flange extending from the core support member, the flange having an inner dimension and an outer dimension, which may also comprise a plurality of interconnected flange coolant flow passages extending alternatively toward the inner dimension and away from the outer dimension and then toward the outer dimension and away from the inner dimension, between the core support coolant inlet and the core support coolant outlet. The core and core support may be contained in a housing which may comprise a housing wall; a housing coolant inlet; a housing coolant outlet; and a plurality of interconnected housing coolant flow passages contained within the housing wall and interconnected and arranged to pass coolant from one coolant flow passage to the next within the housing wall along a coolant flow path within at least a substantial portion of the housing wall from the housing coolant inlet to the housing coolant outlet. The housing and core support may forma a part of at least a portion of an electrical current flow path forming two turns around the magnetic core. In another aspect of the invention buswork may be coated with a thin film of electrically conductive material.
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公开(公告)号:US06757316B2
公开(公告)日:2004-06-29
申请号:US09854097
申请日:2001-05-11
申请人: Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
发明人: Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
IPC分类号: H01S322
CPC分类号: H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译: 本发明提供了一种准分子激光器,其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数,并控制非常快的PZT驱动调光镜和脉冲功率充电电压,以将波长和脉冲能量保持在所需的极限内。 在优选实施例中,两个风扇马达驱动单个切向风扇,其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。
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公开(公告)号:US06882674B2
公开(公告)日:2005-04-19
申请号:US10036676
申请日:2001-12-21
申请人: Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
发明人: Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
IPC分类号: H01S3/097 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号: G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译: 本发明提供了一种准分子激光器,其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数,并控制非常快的PZT驱动调光镜和脉冲功率充电电压,以将波长和脉冲能量保持在所需的极限内。 在优选实施例中,两个风扇马达驱动单个切向风扇,其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。
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公开(公告)号:US07039086B2
公开(公告)日:2006-05-02
申请号:US10631349
申请日:2003-07-30
申请人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号: H01S3/22
CPC分类号: H01S3/225 , G03F7/70025 , G03F7/70041 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/0381 , H01S3/09702 , H01S3/1055 , H01S3/2258 , H01S3/2333
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
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公开(公告)号:US06690704B2
公开(公告)日:2004-02-10
申请号:US10210761
申请日:2002-07-31
申请人: John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人: John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号: H01S322
CPC分类号: H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 提供了反馈定时控制技术,即使在脉冲串模式操作中,也可以精确地控制两个室中的放电的相对定时,其精确度在大约2至50亿分之一秒的范围内。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。
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公开(公告)号:US06240112B1
公开(公告)日:2001-05-29
申请号:US09470288
申请日:1999-12-22
申请人: William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人: William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
IPC分类号: H01S304
CPC分类号: G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 4000 charges per second. In a preferred embodiment capable of operating at pulse rates of 2000 to 4000 Hz or greater, water cooling of the saturable inductors is provided.
摘要翻译: 用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。 源包括一个包括充电电容器,固态开关和限流电感器的脉冲发生电路。 在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩,并且升压脉冲变压器将峰值电压增加到至少12000伏特。 提供了一种非常快速的调节电源,用于在小于400微秒内为充电电容器充电,并且包括编程的处理器的脉冲控制系统以至少4000的速率控制充电电容器的充电,精度小于约百分之一 每秒收费 在能够以2000至4000Hz或更大的脉冲速率操作的优选实施例中,提供可饱和电感器的水冷却。
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公开(公告)号:US5936988A
公开(公告)日:1999-08-10
申请号:US118773
申请日:1998-07-18
申请人: William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人: William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
CPC分类号: G03F7/70483 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225
摘要: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译: 用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。 源包括一个包括充电电容器,固态开关和限流电感器的脉冲发生电路。 在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩,并且升压脉冲变压器将峰值电压增加到至少12000伏特。 提供了一种非常快速的调节电源,用于在小于400微秒内对充电电容器充电,并且包括编程的处理器的脉冲控制系统以至少2000的速率控制充电电容器的充电至小于约百分之一的精度 每秒收费
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公开(公告)号:USRE42588E1
公开(公告)日:2011-08-02
申请号:US11352522
申请日:2006-02-10
申请人: John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人: John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号: H01S3/22
CPC分类号: H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 提供了反馈定时控制技术,即使在脉冲串模式操作中,也可以精确地控制两个室中的放电的相对定时,其精确度在大约2至50亿分之一秒的范围内。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。
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公开(公告)号:US07596164B2
公开(公告)日:2009-09-29
申请号:US11376364
申请日:2006-03-15
申请人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号: H01S3/223
CPC分类号: H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制特征包括:(1)脉冲能量控制,具有纳秒定时精度(2)精确脉冲到脉冲波长控制,具有高速和极速波长调谐(3)快速响应气体 温度控制和(4)F2注入控制与新的学习算法。
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公开(公告)号:US07079564B2
公开(公告)日:2006-07-18
申请号:US11181258
申请日:2005-07-14
申请人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号: H01S3/22
CPC分类号: H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制特征包括:(1)脉冲能量控制,具有纳秒定时精度(2)精确脉冲到脉冲波长控制,具有高速和极速波长调谐(3)快速响应气体 温度控制和(4)F 2注入控制与新的学习算法。
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