公开(公告)号：US20040089231A1

公开(公告)日：2004-05-13

申请号：US10292346

申请日：2002-11-12

Inventor： Christopher D. Gilmore ,  Christopher B. Barney

IPC: B05C003/00 ,  B05C019/02

CPC classification number: B05C3/09 ,  B05C3/02 ,  B05C9/12 ,  B05D1/18 ,  B05D3/0486 ,  B05D7/14 ,  B22D31/005

Abstract: A machine for impregnating a die cast metal part with liquid impregnant comprises an impregnation chamber having liquid impregnant in a lower portion, an opening for ingress and egress of the parts being defined in a side wall of the chamber above the liquid impregnant, a door for sealing the opening, a part holder in the chamber and an elevator for positioning parts above the liquid impregnant during evacuation of the chamber and then immersing the parts in the liquid impregnant during subsequent pressurization of the chamber.

Abstract translation: 用液体浸渍剂浸渍压铸金属部件的机器包括在下部具有液体浸渍剂的浸渍室，位于液体浸渍剂上方的室的侧壁中的用于进入和流出的开口，用于 密封开口，腔室中的部件保持器和用于在腔室抽出期间将液体浸渍剂上方的部件定位的电梯，然后在腔室的随后加压期间将部件浸入液体浸渍剂中。

公开(公告)号：US20030019426A1

公开(公告)日：2003-01-30

申请号：US09983401

申请日：2001-10-24

Inventor： Hiroaki Inoue ,  Koji Mishima ,  Tsutomu Karimata ,  Kenji Nakamura ,  Moriji Matsumoto ,  Junji Kunisawa

IPC: B05C003/00 ,  B05C019/02 ,  B05C013/00 ,  B05C013/02 ,  B05C021/00

CPC classification number: H01L21/76843 ,  C23C18/1619 ,  H01L21/288 ,  H01L21/76849 ,  H01L21/76873 ,  H01L21/76874 ,  H01L21/76877 ,  H01L2221/1089

Abstract: The present invention relates to an electroless plating apparatus which can reduce the amount of a plating liquid to be used, maintain a stable plating process, be downsized, reduce an apparatus cost, form a film having a uniform thickness over an entire surface, and prevent a plating liquid from being deteriorated due to a temperature rise. The present invention comprises a holding apparatus for holding a substrate with a surface, to be plated, facing upward, a plating liquid holding mechanism for sealing a periphery of the surface, to be plated, of the substrate held by the holding apparatus, an electroless plating treatment liquid supply apparatus for supplying an electroless plating liquid to the surface, to be plated, of the substrate sealed by the plating liquid holding mechanism to allow the supplied electroless plating liquid to be stored on the substrate, and a heating apparatus provided below the substrate.

Abstract translation: 本发明涉及一种能够减少使用的电镀液量，保持电镀工序稳定，小型化，降低设备成本，在整个表面上形成均匀厚度的膜的化学镀设备，并且防止 电镀液由于升温而劣化。 本发明包括一个保持装置，用于将一个表面保持在待镀的表面上，一个电镀液保持机构，用于密封被保持装置保持的基板的待镀表面周边，一个无电镀 电镀处理液供给装置，用于向由电镀液保持机构密封的基板的待镀表面供给化学镀液体，使供给的化学镀液保存在基板上;以及加热装置， 基质。

公开(公告)号：US20040083954A1

公开(公告)日：2004-05-06

申请号：US10433372

申请日：2003-07-22

Inventor： Takuji Nakamura

IPC: B05C003/00 ,  B05C019/02

CPC classification number: B05C3/09 ,  B05C3/20 ,  B05C19/00 ,  B05C19/025 ,  B05C19/04 ,  B05C19/06 ,  B05D1/18 ,  B05D1/32 ,  B05D2401/32 ,  C23C8/04 ,  C23C24/00

Abstract: A coating apparatus having a fluid circulating system wherein the fluid ascending in a dipping container overflows an overflow edge disposed at the top of the dipping container into an overflow-fluid receiving container and returns from the bottom of the overflow-fluid receiving container into the dipping container, wherein the dipping container has a depth of null to null of the internal diameter thereof. When the dipping container is too deep, the powder or the like tends to be compressed tightly in the upper part of the dipping container, often impeding efficient insertion of a substrate, but the coating apparatus according to the present invention, the dimension thereof being specified as above, keeps favorable fluidity of the powder or the like.

Abstract translation: 一种具有流体循环系统的涂覆装置，其中在浸渍容器中上升的流体将设置在浸渍容器顶部的溢流边缘溢流到溢流流体接收容器中，并从溢流流体接收容器的底部返回到浸渍 容器，其中浸渍容器的内径为其内径的1/3至2/3的深度。 当浸渍容器太深时，粉末等倾向于在浸渍容器的上部被紧压缩，通常妨碍基材的有效插入，但是根据本发明的涂布装置的尺寸规定 如上所述，保持粉末等的良好的流动性。

公开(公告)号：US20040074441A1

公开(公告)日：2004-04-22

申请号：US10726358

申请日：2003-12-03

Inventor： James N. Ray

IPC: B05C003/00 ,  B05C019/02

CPC classification number: B27K5/001 ,  B27K3/08 ,  B27K3/10 ,  B27K2200/10

Abstract: A method and apparatus for applying a fluid preservative to wood or wood products has a work tank for maintaining a predetermined concentration of preservative in the fluid. The work tank is equipped with a heater to keep the temperature of the fluid and the preservative in the work tank at a predetermined level. Hot fluid and preservative is drawn under a vacuum, initially from the work tank. On filling a pressure vessel, a pressure pump then supplies the preservative and fluid mixture under pressure to the pressure vessel in which the wood or wood product is being treated. As the treatment process depletes the preservative in the fluid, through absorption in the wood, the depleted fluid is circulated back to the work tank where it is heated and more preservative is added to restore the concentration of preservative in the fluid to a desired level. The fluid, replenished with preservative, is then pumped into the pressure vessel. In this way a more uniform distribution of preservative in a desired concentration is achieved in the treated wood or wood product.

Abstract translation: 用于将液体防腐剂施用于木材或木制品的方法和装置具有用于在流体中保持预定浓度的防腐剂的工作罐。 工作罐配有加热器，以将工作罐中的流体和防腐剂的温度保持在预定水平。 热液体和防腐剂在真空下抽取，最初来自工作罐。 在填充压力容器时，压力泵然后在压力下将防腐剂和流体混合物供应到正在处理木材或木材产品的压力容器中。 由于处理过程消耗流体中的防腐剂，通过在木材中的吸收，贫化的流体循环回加工的工作罐，并加入更多的防腐剂以将流体中的防腐剂的浓度恢复到所需的水平。 然后将补充有防腐剂的流体泵入压力容器中。 以这种方式，在经处理的木材或木材产品中实现所需浓度的更均匀的防腐剂分布。

公开(公告)号：US20040194698A1

公开(公告)日：2004-10-07

申请号：US10481448

申请日：2004-05-19

Inventor： Akihisa Hongo ,  Naoki Matsuda ,  Xinming Wang

IPC: B05C003/00 ,  B05C019/02

CPC classification number: C25D17/001 ,  C23C18/1617 ,  C23C18/1628 ,  C23C18/1676 ,  C23C18/50 ,  H01L21/288

Abstract: There is provided a plating apparatus which can keep a plating solution always in its optimal condition while minimizing, the amount of plating solution used, and which can easily form a uniform plated film on the plating surface of a workpiece. The plating apparatus includes: a plating solution supply system (70) for constantly circulating a plating solution while heating the plating solution in a circulation tank (80) provided with a heating apparatus (78a), and supplying a predetermined amount of plating solution to a plating treatment section (24) when carrying out plating treatment; a plating solution recovery system (72) for recovering the plating solution after the plating treatment in the plating treatment section (24), heating the plating solution and returning the heated plating solution to the circulation tank (80); and a plating solution replenishment system (74) for replenishing the circulation tank (80) with a fresh plating solution or a plating solution component.

Abstract translation: 提供一种电镀设备，其可以使电镀液始终处于最佳状态，同时最小化所用电镀液的量，并且可以在工件的电镀表面上容易地形成均匀的镀膜。 电镀装置包括：电镀液供给系统（70），用于在加热设置有加热装置（78a）的循环罐（80）的同时加热电镀液，不断循环电镀液，并将规定量的电镀液供给到 电镀处理部（24）进行电镀处理时; 电镀液回收系统（72），用于在所述电镀处理部（24）中回收所述电镀处理后的所述电镀液，加热所述电镀液并将所述被加热的电镀液返回到所述循环罐（80）。 以及用于用新鲜电镀液或电镀液成分补充循环罐（80）的电镀液补充系统（74）。

公开(公告)号：US20040177808A1

公开(公告)日：2004-09-16

申请号：US10482635

申请日：2003-12-24

Inventor： Daniel Plaetzer ,  Wilfried Plaetzer ,  Ernst-Werner Schmidt ,  Roman Lieutenant

IPC: B05C003/00 ,  B05C019/02

CPC classification number: C23C2/003 ,  C23C2/22 ,  F16C17/02 ,  F16C33/043 ,  F16C33/24

Abstract: The coating device (10) for coating a metal band (12,12null) in a melted metal mass (14) comprises a shaft (16,18) rotatably supported in the melted metal mass (14) by a slide bearing (261, 262), for guiding the metal band (12). The slide bearing (261, 262) is formed by a bearing housing (32) and an open bearing shell (34) held therein, with two bearing surfaces (36). Between the two bearing surfaces (36), the bearing shell (34) comprises a deformation zone (40) with a deformation element (44). With high radial forces of the shaft occurring, the two bearing shell halves (381, 382) are slightly spread. The flexible deformation zone ensures that the two bearing shell halves remain interconnected and cannot break in this area.

Abstract translation: 用于在熔融的金属块（14）中涂覆金属带（12,12'）的涂覆装置（10）包括通过滑动轴承（261）可旋转地支撑在熔融的金属块（14）中的轴（16,18） 262），用于引导金属带（12）。 滑动轴承（261,262）由轴承壳体（32）和保持在其中的开放轴承壳体（34）形成，具有两个轴承表面（36）。 在两个轴承表面（36）之间，轴承壳（34）包括具有变形元件（44）的变形区（40）。 随着轴的高径向力发生，两个轴承半壳（381,382）略微展开。 灵活的变形区确保两个轴承半壳保持互连，并且不能在该区域断裂。

公开(公告)号：US20020127875A1

公开(公告)日：2002-09-12

申请号：US10092980

申请日：2002-03-06

Applicant: Applied Materials, Inc.

Inventor： Timothy Weidman ,  Eric (Bram) Britcher ,  Todd Balisky

IPC: H01L021/31 ,  H01L021/469 ,  B05C003/00 ,  B05C019/02

CPC classification number: H01L21/02126 ,  C23C16/30 ,  C23C16/325 ,  C23C16/401 ,  C23C16/4486 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/312 ,  H01L21/3122 ,  H01L21/3124 ,  H01L21/3125 ,  H01L21/31633 ,  H01L21/31695 ,  H01L21/76801 ,  H01L21/76807

Abstract: A method for forming a low k dielectric constant material over a substrate. According to one embodiment, the method includes combining, in a mixing apparatus fluidly coupled to a solution applicator, an organo silicate glass (OSG) precursor, a solvent and a surfactant with water and an acid catalyst to form a coating solution; aging the coating solution in the mixing apparatus to form an aged coating solution; transporting the aged coating solution to the solution applicator; and then applying the aged coating solution to the substrate with the applicator.

Abstract translation: 一种在衬底上形成低k介电常数材料的方法。 根据一个实施方案，该方法包括在流体耦合到溶液施加器的混合设备中组合有机硅酸盐玻璃（OSG）前体，溶剂和表面活性剂与水和酸催化剂以形成涂布溶液; 在混合装置中老化涂层溶液以形成老化涂层溶液; 将老化的涂布溶液输送到溶液涂布器; 然后用涂抹器将老化的涂布溶液涂布到基材上。

公开(公告)号：US20020017237A1

公开(公告)日：2002-02-14

申请号：US09907522

申请日：2001-07-16

Applicant: Semitool, Inc.

Inventor： Paul Z. Wirth ,  Steven L. Peace

IPC: B05C013/00 ,  B05C013/02 ,  B05C021/00 ,  H01L021/31 ,  H01L021/469 ,  B25J001/00 ,  B65G049/07 ,  B05C003/00 ,  B05C019/02

CPC classification number: B08B3/04 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/6715 ,  Y10S118/90 ,  Y10S438/906 ,  Y10S438/913

Abstract: A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with the liquid. The head spins the workpiece during or after contact with the liquid. The upper and lower rotors have side openings for loading and unloading a workpiece into the head. The rotors are axially moveable to align the side openings.

Abstract translation: 用于处理工件的系统包括具有用于保持液体的碗或凹部的底座。 工艺反应器或头部将工件保持在上转子和下转子之间。 头部升降器降低了将工件保持与液体接触的头部。 头部在与液体接触期间或之后旋转工件。 上下转子具有用于将工件装载和卸载到头部中的侧开口。 转子可轴向移动以对准侧开口。