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公开(公告)号:US20230082177A1
公开(公告)日:2023-03-16
申请号:US17900803
申请日:2022-08-31
申请人: Atlas Magnetics
摘要: An apparatus and method for plating magnetic cores by periodically transferring a plate directly back and forth between a metal plating environment and an insulation deposit environment. This direct metal to insulation to metal plating is enabled by a nano-scale insulation layer that provides an imperfect coverage of the metal layer while still keeping sufficient insulation to prevent eddy current formation—even during high-frequency current applications. Therefore, this invention enables the practical creation of magnetic cores having layers with widths even under one nanometer and can generate cores having a layer scale that can be varied to suit a variety of uses in the microelectronic industry.
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公开(公告)号:US11591705B2
公开(公告)日:2023-02-28
申请号:US17227726
申请日:2021-04-12
申请人: Fabric8Labs, Inc.
IPC分类号: C25D1/00 , B33Y10/00 , C25D5/10 , C25D21/12 , C25D17/12 , C25D15/00 , B33Y30/00 , B33Y50/02 , B33Y70/00 , C25D3/12 , C25D3/20 , C25D3/24 , C25D3/40 , C25D3/44 , C25D3/46 , C25D5/04 , C25D9/02 , C25D3/22 , C25D3/38
摘要: An apparatus and method for electrochemically depositing a unitary layer structure using a reactor configured to contain an electrolyte solution with an anode array containing a plurality of independently electrically controllable anodes arranged in a two-dimensional array, a cathode, an addressing circuit for receiving a signal containing anode address data and for outputting a signal causing an anode array pattern; and, a controller, in communication with the addressing circuit and the anode array, configured to electrically control each anode in the anode array to cause an electrochemical reaction at the cathode that deposits a unitary layer structure according to the anode array pattern signal.
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公开(公告)号:US11584973B2
公开(公告)日:2023-02-21
申请号:US16642630
申请日:2018-09-13
申请人: POSCO
发明人: Doo-Jin Paik , Seul-Ki Park , Chung-Won Kim , Jung-Ki Kim , Sung-Il Kim , Hyeon-Seok Hwang , Je-Woong Lee , Jeong-Eun Kim , Cho-Rong Hong
IPC分类号: C23C2/02 , C23C2/06 , C23C2/12 , C23C2/40 , C23C16/06 , B32B15/01 , C22C38/14 , C22C38/12 , C22C38/06 , C22C38/04 , C22C38/02 , C22C38/00 , C21D6/00 , C21D8/02 , C21D9/46 , C21D1/26 , C25D3/22 , C25D3/44 , C25D5/36 , C25D7/06 , C23C30/00 , B32B15/18 , B32B15/04
摘要: Provided is a steel sheet having excellent image clarity after painting, including: carbon (C): 0.001% to 0.03%, silicon (Si): 0.001% to 0.35%, manganese (Mn): 0.05% to 2.2%, phosphorus (P): 0.003% to 0.1%, sulfur (S): 0.001% or 0.025%, aluminum (Al): 0.01% to 0.1%, nitrogen (N): 0.001% to 0.007%, and a remainder of iron (Fe) and inevitable impurities. The microstructure of the steel sheet mainly is ferrite phases. An R-cube texture of a surface layer of the steel sheet is 5% or less by area %.
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公开(公告)号:US20220154357A1
公开(公告)日:2022-05-19
申请号:US17533015
申请日:2021-11-22
申请人: MODUMETAL, INC.
IPC分类号: C25D5/20 , C25D7/06 , C25D21/10 , C25D21/12 , C25D5/18 , C25D17/00 , B82Y40/00 , C25D5/08 , C25D5/10 , C25D7/04 , C25D3/04 , C25D3/12 , C25D3/20 , C25D3/22 , C25D3/30 , C25D3/34 , C25D3/38 , C25D3/42 , C25D3/44 , C25D3/46 , C25D3/48 , C25D3/54 , C25D3/56 , C25D5/12 , C25D17/06
摘要: Described herein are apparatus and methods for the continuous application of nanolaminated materials by electrodeposition.
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公开(公告)号:US20220025479A1
公开(公告)日:2022-01-27
申请号:US17311219
申请日:2019-12-19
申请人: POSCO
发明人: Seong-Woo Kim , Jin-Keun Oh , Sang-Heon Kim , Yeol-Rae Cho
IPC分类号: C21D9/46 , C21D8/02 , C22C38/00 , C22C38/28 , C22C38/32 , C22C38/02 , C22C38/04 , C22C38/06 , C25D3/22 , C25D3/44 , B21D22/02
摘要: The present invention provides: a plated steel sheet for hot press forming having excellent impact properties after hot press forming; a hot press formed member manufactured using the plated steel sheet for hot press forming; and manufacturing methods thereof. The plated steel sheet comprises: a base steel sheet containing, by weight, 0.15-0.4% of C, 0.1-1% of Si, 0.6-8% of Mn, 0.001-0.05% of P, 0.0001-0.02% of S, 0.01-0.1% of Al, 0.001-0.02% of N, and 0.01-0.5% of Cr, with the remainder comprising Fe and miscellaneous impurities; and a plating layer formed on the surface of the base steel sheet and composed of zinc, aluminum, or an alloy containing zinc and aluminum, wherein the ratio (C S/C B) of the content (C S) of C in a surface layer to the content (C B) of C in the base steel sheet is 0.6 or less, and the ratio ((Mn S+Cr S)/(Mn B+Cr B)) of the total content (Mn S+Cr S) of Mn and Cr in the surface layer to the total content (Mn B+Cr B) of Mn and Cr in the base steel sheet is 0.8 or more.
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公开(公告)号:US20210301414A1
公开(公告)日:2021-09-30
申请号:US17227726
申请日:2021-04-12
申请人: Fabric8Labs, Inc.
IPC分类号: C25D1/00 , C25D15/00 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B33Y70/00 , C25D3/12 , C25D3/20 , C25D3/24 , C25D3/40 , C25D3/44 , C25D3/46 , C25D5/04 , C25D5/10 , C25D9/02 , C25D21/12 , C25D3/22 , C25D3/38 , C25D17/12
摘要: An apparatus and method for electrochemically depositing a unitary layer structure using a reactor configured to contain an electrolyte solution with an anode array containing a plurality of independently electrically controllable anodes arranged in a two-dimensional array, a cathode, an addressing circuit for receiving a signal containing anode address data and for outputting a signal causing an anode array pattern; and, a controller. in communication with the addressing circuit and the anode array, configured to electrically control each anode in the anode array to cause an electrochemical reaction at the cathode that deposits a unitary layer structure according to the anode array pattern signal.
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公开(公告)号:US11021803B2
公开(公告)日:2021-06-01
申请号:US16502455
申请日:2019-07-03
申请人: Xtalic Corporation
摘要: Electrodeposition bath compositions, additives, and maintenance methods are described. In one embodiment, an electrodeposition bath includes at least a first metal ionic species that reacts with a second metal ionic species to maintain either the first and/or second metal ionic species in a desired oxidation state for electrodeposition.
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公开(公告)号:US10465307B2
公开(公告)日:2019-11-05
申请号:US15356210
申请日:2016-11-18
申请人: Fabric8Labs, Inc.
IPC分类号: C25D1/00 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B33Y70/00 , C25D3/12 , C25D3/20 , C25D3/24 , C25D3/40 , C25D3/44 , C25D3/46 , C25D5/04 , C25D5/10 , C25D9/02 , C25D21/12 , C25D3/22 , C25D3/38 , C25D17/12
摘要: An apparatus for stereo-electrochemical deposition of metal layers consisting of an array of anodes, a cathode, a positioning system, a fluid handling system for an electrolytic solution, communications circuitry, control circuitry and software control. The anodes are electrically operated to promote deposition of metal layers in any combination on the cathode to fabricate a structure.
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公开(公告)号:US20190312162A1
公开(公告)日:2019-10-10
申请号:US16432702
申请日:2019-06-05
申请人: Meng Tao , Wen-Cheng Sun , Xiaofei Han
发明人: Meng Tao , Wen-Cheng Sun , Xiaofei Han
摘要: Electroplating of aluminum may be utilized to form electrodes for solar cells. In contrast to expensive silver electrodes, aluminum allows for reduced cell cost and addresses the problem of material scarcity. In contrast to copper electrodes which typically require barrier layers, aluminum allows for simplified cell structures and fabrication steps. In the solar cells, point contacts may be utilized in the backside electrodes for increased efficiency. Solar cells formed in accordance with the present disclosure enable large-scale and cost-effective deployment of solar photovoltaic systems.
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公开(公告)号:US10407789B2
公开(公告)日:2019-09-10
申请号:US15835067
申请日:2017-12-07
发明人: Balaji Ganapathy , Ankur Kadam , Prerna S. Goradia , Laksheswar Kalita , Tapash Chakraborty , Vijay Bhan Sharma
IPC分类号: C25D3/44 , C25D5/44 , C25D5/48 , C25D5/18 , C25D7/00 , C25D5/50 , C25D9/08 , C25D11/04 , C25D5/02
摘要: In one implementation, a method of depositing a material on a substrate is provided. The method comprises positioning an aluminum-containing substrate in an electroplating solution, the electroplating solution comprising a non-aqueous solvent and a deposition precursor. The method further comprises depositing a coating on the aluminum-containing substrate, the coating comprising aluminum or aluminum oxide. Depositing the coating comprises applying a first current for a first time-period to nucleate a surface of the aluminum-containing substrate and applying a second current for a second time-period, wherein the first current is greater than the second current and the first time-period is less than the second time-period to form the coating on the nucleated surface of the aluminum-containing substrate.
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