公开(公告)号：US09850161B2

公开(公告)日：2017-12-26

申请号：US15418615

申请日：2017-01-27

Applicant: Applied Materials, Inc.

Inventor： Chengtsin Lee ,  Jennifer Y. Sun

IPC: C03C17/22 ,  C03C10/00 ,  C03C10/16 ,  C03C8/06 ,  C03C4/18 ,  C03C17/245

CPC classification number: C03C17/22 ,  C03C4/18 ,  C03C8/06 ,  C03C10/00 ,  C03C10/16 ,  C03C17/245 ,  C03C21/007 ,  C03C2204/00 ,  C03C2209/00 ,  C03C2217/214 ,  C03C2217/285 ,  C03C2218/13

Abstract: An article comprises a body having a coating. The coating comprising a mixture of a first oxide and a second oxide. The coating includes a glaze on a surface of the coating, the glaze comprising a eutectic system having a super-lattice of a first fluoride and a second fluoride.

公开(公告)号：US20170323772A1

公开(公告)日：2017-11-09

申请号：US15498383

申请日：2017-04-26

Applicant: Applied Materials, Inc.

Inventor： David Fenwick ,  Chengtsin Lee ,  Jennifer Y. Sun ,  Yikai Chen

IPC: H01J37/32 ,  C23C14/30 ,  C23C14/06 ,  C23C14/46 ,  C23C14/00

CPC classification number: H01J37/32495 ,  C23C14/0021 ,  C23C14/06 ,  C23C14/0694 ,  C23C14/30 ,  C23C14/46 ,  C23C16/4404

Abstract: An article comprises a body having a protective coating. The protective coating is a thin film that comprises a metal oxy-fluoride. The metal oxy-fluoride has an empirical formula of MxOyFz, where M is a metal, y has a value of 0.1 to 1.9 times a value of x and z has a value of 0.1 to 3.9 times the value of x. The protective coating has a thickness of 1 to 30 microns and a porosity of less than 0.1%.

公开(公告)号：US09812341B2

公开(公告)日：2017-11-07

申请号：US15413192

申请日：2017-01-23

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Ying Zhang

IPC: H01L21/67 ,  B65D43/02 ,  H01J37/32 ,  C23C14/00 ,  C23C14/08

CPC classification number: H01L21/67023 ,  B65D43/02 ,  C23C4/01 ,  C23C4/04 ,  C23C4/10 ,  C23C4/11 ,  C23C4/12 ,  C23C4/134 ,  C23C4/14 ,  C23C4/16 ,  C23C14/0015 ,  C23C14/0021 ,  C23C14/0031 ,  C23C14/0036 ,  C23C14/0052 ,  C23C14/0084 ,  C23C14/0094 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/088 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32513 ,  H01J2237/334 ,  H01L21/67063 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/67086 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/139 ,  Y10T428/1393

Abstract: A component for a semiconductor processing chamber includes a ceramic body having at least one surface with a first average surface roughness of approximately 8-16 micro-inches. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness of below 10 micro-inches, wherein the second average surface roughness is equal to or less than the first average surface roughness.

公开(公告)号：US20170301522A1

公开(公告)日：2017-10-19

申请号：US15640287

申请日：2017-06-30

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Ying Zhang

IPC: H01J37/32 ,  C23C14/00 ,  C23C14/08

Abstract: A ring shaped body includes a top flat region, a ring inner side and a ring outer side. The ring inner side comprises an approximately vertical wall. A conformal protective layer is disposed on at least the top flat region, the ring inner side and the ring outer side of the ring shaped body. The protective layer has a first thickness of less than 300 μm on the top flat region and a second thickness on the vertical wall of the ring inner side, where the second thickness is 45-70% of the first thickness.

公开(公告)号：US20170291856A1

公开(公告)日：2017-10-12

申请号：US15479209

申请日：2017-04-04

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Yikai Chen ,  Chengtsin Lee

IPC: C04B35/505 ,  C23C4/134 ,  C04B22/14 ,  C04B41/00 ,  C04B35/626 ,  C23C4/16 ,  C04B41/45

CPC classification number: C04B35/505 ,  C04B35/119 ,  C04B35/44 ,  C04B35/4885 ,  C04B35/50 ,  C04B35/553 ,  C04B35/62665 ,  C04B2235/32 ,  C04B2235/3217 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3244 ,  C04B2235/3418 ,  C04B2235/441 ,  C04B2235/443 ,  C04B2235/444 ,  C04B2235/445 ,  C04B2235/448 ,  C04B2235/449 ,  C23C4/11 ,  C23C4/134 ,  H01J37/32477

Abstract: Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a solution comprising a metal precursor into a plasma sprayer. The plasma sprayer generates a stream toward an article, forming a ceramic coating on the article upon contact.

公开(公告)号：US09725799B2

公开(公告)日：2017-08-08

申请号：US14562339

申请日：2014-12-05

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC: C23C14/34 ,  C23C14/08 ,  C04B41/50 ,  C23C14/46 ,  C23C14/58 ,  H01J37/32 ,  C04B41/87 ,  C04B41/89 ,  C04B41/00 ,  C04B41/52 ,  C04B35/505 ,  C04B35/622

CPC classification number: C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

Abstract: A method of manufacturing an article includes providing a component for an etch reactor. Ion beam sputtering with ion assisted deposition (IBS-IAD) is then performed to deposit a protective layer on at least one surface of the component, wherein the protective layer is a plasma resistant film having a thickness of less than 1000 μm.

公开(公告)号：US20170137575A1

公开(公告)日：2017-05-18

申请号：US15352925

申请日：2016-11-16

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Sumanth Banda

IPC: C08G77/442 ,  C09D153/00 ,  B05D3/14 ,  C08G77/385 ,  B05D1/02 ,  C08G77/42 ,  C09J153/00

Abstract: A bonding component includes a first amount of an organofluorine polymer and a second amount of an organosilicon polymer which are chemically bound to each other and form a copolymer.

公开(公告)号：US09583369B2

公开(公告)日：2017-02-28

申请号：US14034315

申请日：2013-09-23

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Ying Zhang

IPC: H01L21/67 ,  B65D43/02 ,  C23C14/00 ,  C23C14/08 ,  H01J37/32

CPC classification number: H01L21/67023 ,  B65D43/02 ,  C23C4/01 ,  C23C4/04 ,  C23C4/10 ,  C23C4/11 ,  C23C4/12 ,  C23C4/134 ,  C23C4/14 ,  C23C4/16 ,  C23C14/0015 ,  C23C14/0021 ,  C23C14/0031 ,  C23C14/0036 ,  C23C14/0052 ,  C23C14/0084 ,  C23C14/0094 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/088 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32513 ,  H01J2237/334 ,  H01L21/67063 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/67086 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/139 ,  Y10T428/1393

Abstract: A method of manufacturing an article comprises providing a lid or nozzle for an etch reactor. Ion assisted deposition (IAD) is then performed to deposit a protective layer on at least one surface of the lid or nozzle, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of 10 micro-inches or less.

Abstract translation: 制造制品的方法包括提供用于蚀刻反应器的盖或喷嘴。 然后进行离子辅助沉积（IAD）以在盖或喷嘴的至少一个表面上沉积保护层，其中保护层是具有小于300μm的厚度的等离子体耐受稀土氧化物膜，平均表面粗糙度 为10微英寸或更小。

公开(公告)号：US20160326626A1

公开(公告)日：2016-11-10

申请号：US15211921

申请日：2016-07-15

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor

IPC: C23C14/22 ,  C23C4/134 ,  C23C14/46 ,  C23C14/08

CPC classification number: C23C14/221 ,  C23C4/134 ,  C23C14/08 ,  C23C14/081 ,  C23C14/46 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32807

Abstract: A method of manufacturing an article comprises providing an article. An ion assisted deposition (IAD) process is performed to deposit a second protective layer over a first protective layer. The second protective layer is a plasma resistant rare earth oxide having a thickness of less than 50 microns and a porosity of less than 1%. The second protective layer seals a plurality of cracks and pores of the first protective layer.

Abstract translation: 制造制品的方法包括提供制品。 执行离子辅助沉积（IAD）工艺以在第一保护层上沉积第二保护层。 第二保护层是厚度小于50微米，孔隙率小于1％的耐等离子体稀土氧化物。 第二保护层密封第一保护层的多个裂缝和孔。

公开(公告)号：US20160318807A1

公开(公告)日：2016-11-03

申请号：US15211470

申请日：2016-07-15

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo

IPC: C04B35/50 ,  C04B35/622 ,  C04B37/02 ,  C23C16/40 ,  H01L21/683 ,  C23C4/11 ,  C23C4/134 ,  C04B35/505 ,  H01L21/67

CPC classification number: C04B35/50 ,  C04B35/505 ,  C04B35/62222 ,  C04B35/62655 ,  C04B37/001 ,  C04B37/02 ,  C04B2235/3217 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3244 ,  C04B2235/3418 ,  C04B2235/656 ,  C04B2235/96 ,  C04B2235/9669 ,  C04B2237/34 ,  C04B2237/341 ,  C04B2237/348 ,  C04B2237/40 ,  C23C4/11 ,  C23C4/134 ,  C23C14/221 ,  C23C16/405 ,  C23C16/4401 ,  C23C16/45525 ,  C23C16/50 ,  H01J37/32082 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/6833 ,  H01L21/68757

Abstract: A solid sintered ceramic article may include Y2O3 at a concentration of approximately 40 molar % to approximately 60 molar % and Er2O3 at a concentration of approximately 400 molar % to approximately 60 molar %. An article may include a body and a plasma resistant ceramic coating on at least one surface of the body. The plasma resistant ceramic coating comprising Y2O3 at a concentration of approximately 30 molar % to approximately 60 molar %, Er2O3 at a concentration of approximately 20 molar % to approximately 60 molar %, and at least one of ZrO2, Gd2O3 or SiO2 at a concentration of over 0 molar % to approximately 30 molar %.

Abstract translation: 固体烧结陶瓷制品可以包括浓度为约40摩尔％至约60摩尔％的Y 2 O 3和浓度为约400摩尔％至约60摩尔％的Er 2 O 3。 制品可以在身体的至少一个表面上包括主体和耐等离子体陶瓷涂层。 浓度为约30摩尔％至约60摩尔％的浓度为约20摩尔％至约60摩尔％的Er 2 O 3和浓度为约20摩尔％至约60摩尔％的至少一种ZrO 2，Gd 2 O 3或SiO 2的耐等离子体陶瓷涂层，其浓度为约30摩尔％至约60摩尔％ 超过0摩尔％至约30摩尔％。