利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

175 条记录 (耗时 0.059 秒)

    Thrombectomy Devices and Methods for Making.
    91.
    发明申请
    Thrombectomy Devices and Methods for Making. 审中-公开
    血栓切除装置及方法。

    公开(公告)号：US20070265648A1

    公开(公告)日：2007-11-15

    申请号：US11734273

    申请日：2007-04-11

    申请人： Adam L. Cohen

    发明人： Adam L. Cohen

    IPC分类号： A61B17/22

    CPC分类号： A61B17/221 ,  A61B2017/00345 ,  A61B2017/00526 ,  A61B2017/22034

    摘要： Embodiments of invention are directed to devices, and methods of forming them, that can be used for thrombus extraction from intravascular regions. The small size of these devices may make them particularly suitable for extracting thrombus in narrow vessels such as those in the brain.

    摘要翻译： 本发明的实施方案涉及可用于从血管内区域提取血栓的装置及其形成方法。 这些装置的小尺寸可能使它们特别适用于在诸如脑中的狭窄血管中提取血栓。

    Method and apparatus for maintaining parallelism of layers and/or achieving desired thicknesses of layers during the electrochemical fabrication of structures
    92.
    发明授权
    Method and apparatus for maintaining parallelism of layers and/or achieving desired thicknesses of layers during the electrochemical fabrication of structures 有权
    在结构的电化学制造期间保持层的平行度和/或实现所需厚度的层的方法和装置

    公开(公告)号：US07271888B2

    公开(公告)日：2007-09-18

    申请号：US11029220

    申请日：2005-01-03

    申请人： Uri Frodis ,  Adam L. Cohen ,  Michael S. Lockard

    发明人： Uri Frodis ,  Adam L. Cohen ,  Michael S. Lockard

    IPC分类号： G01N21/88

    CPC分类号： C25D5/48 ,  B33Y10/00 ,  B81C1/00492 ,  B81C99/0065 ,  B81C2201/0104 ,  B81C2201/0197 ,  C25D1/00 ,  C25D1/003 ,  C25D5/022 ,  C25D5/10 ,  C25D21/12 ,  H01L21/2885 ,  H01L21/76885 ,  Y10T156/1052

    摘要： Some embodiments of the present invention provide processes and apparatus for electrochemically fabricating multilayer structures (e.g. mesoscale or microscale structures) with improved endpoint detection and parallelism maintenance for materials (e.g. layers) that are planarized during the electrochemical fabrication process. Some methods involve the use of a fixture during planarization that ensures that planarized planes of material are parallel to other deposited planes within a given tolerance. Some methods involve the use of an endpoint detection fixture that ensures precise heights of deposited materials relative to an initial surface of a substrate, relative to a first deposited layer, or relative to some other layer formed during the fabrication process. In some embodiments planarization may occur via lapping while other embodiments may use a diamond fly cutting machine.

    摘要翻译： 本发明的一些实施例提供了用于电化学制造多层结构（例如中尺度或微结构）的方法和装置，其具有改进的端点检测和用于在电化学制造过程中被平坦化的材料（例如层）的并行维护。 一些方法涉及在平坦化期间使用夹具，其确保材料的平面化平面平行于给定公差内的其它沉积平面。 一些方法涉及使用端点检测夹具，其相对于第一沉积层或相对于在制造过程期间形成的一些其它层，相对于衬底的初始表面确保沉积材料的精确高度。 在一些实施例中，平面化可以通过研磨发生，而其他实施例可以使用金刚石切片机。

    Multi-cell masks and methods and apparatus for using such masks to form three-dimensional structures
    94.
    发明授权
    Multi-cell masks and methods and apparatus for using such masks to form three-dimensional structures 失效

    公开(公告)号：US07229544B2

    公开(公告)日：2007-06-12

    申请号：US10677546

    申请日：2003-10-01

    申请人： Adam L. Cohen

    发明人： Adam L. Cohen

    IPC分类号： C25D5/02

    CPC分类号： B81C1/00492 ,  B33Y10/00 ,  C25D1/003 ,  C25D1/08 ,  C25D5/022 ,  C25D5/10 ,  C25D7/12

    摘要： Multilayer structures are electrochemically fabricated via depositions of one or more materials in a plurality of overlaying and adhered layers. Selectivity of deposition is obtained via a multi-cell controllable mask. Alternatively, net selective deposition is obtained via a blanket deposition and a selective removal of material via a multi-cell mask. Individual cells of the mask may contain electrodes comprising depositable material or electrodes capable of receiving etched material from a substrate. Alternatively, individual cells may include passages that allow or inhibit ion flow between a substrate and an external electrode and that include electrodes or other control elements that can be used to selectively allow or inhibit ion flow and thus inhibit significant deposition or etching. Single cell masks having a cell size that is smaller or equal to the desired deposition resolution may also be used to form structures.

    Methods of reducing interlayer discontinuities in electrochemically fabricated three-dimensional structures
    95.
    发明授权
    Methods of reducing interlayer discontinuities in electrochemically fabricated three-dimensional structures 有权
    减少电化学制造的三维结构中的层间不连续性的方法

    公开(公告)号：US07198704B2

    公开(公告)日：2007-04-03

    申请号：US10830262

    申请日：2004-04-21

    申请人： Adam L. Cohen ,  Michael S. Lockard ,  Dennis R. Smalley

    发明人： Adam L. Cohen ,  Michael S. Lockard ,  Dennis R. Smalley

    IPC分类号： C25D5/02

    CPC分类号： C25D5/02 ,  B33Y10/00 ,  C23C18/1605 ,  C23C18/1651 ,  C25D1/003 ,  H01P11/006

    摘要： Disclosed methods reduce the discontinuities between individual layers of a structure that are formed at least in part using electrochemical fabrication techniques. Discontinuities may exist between layers of a structure as a result of up-facing or down-facing regions defined in data descriptive of the structure or they may exist as a result of building limitations, e.g., limitations that result in non-parallel orientation between a building axis and sidewall surfaces of layers. Methods for reducing discontinuities may be applied to all regions or only to selected regions of the structure. Methods may be tailored to improve the accuracy between an original design of the structure and the structure as fabricated or they may simply be used to smooth the discontinuities between layers. Methods may include deposition operations that selectively favor filling of the discontinuities and/or etching operations that selectively favor removal of material from protrusions that define discontinuities.

    摘要翻译： 公开的方法减少了至少部分地使用电化学制造技术形成的结构的各层之间的不连续性。 结构的层之间可能存在不连续性，这是由于在描述结构的数据中定义的面向上或向下的区域的结果，或者由于建筑局限性而可能存在结构，例如，导致不平行取向的限制 建筑轴线和层的侧壁表面。 用于减少不连续性的方法可以应用于所有区域或仅应用于结构的选定区域。 可以调整方法以提高结构的原始设计和所制造的结构之间的精度，或者可以简单地用于平滑层之间的不连续性。 方法可以包括选择性地有利于填充不连续性和/或蚀刻操作的沉积操作，其选择性地有利于从限定不连续性的突起中去除材料。

    Apparatus and related method for forming a substantially flat stereolithographic working surface
    98.
    发明授权
    Apparatus and related method for forming a substantially flat stereolithographic working surface 失效
    用于形成基本上平坦的立体光刻工作表面的装置和相关方法

    公开(公告)号：US5447822A

    公开(公告)日：1995-09-05

    申请号：US230443

    申请日：1994-04-20

    申请人： Charles W. Hull ,  Adam L. Cohen ,  Stuart L. Spence ,  Charles W. Lewis

    发明人： Charles W. Hull ,  Adam L. Cohen ,  Stuart L. Spence ,  Charles W. Lewis

    IPC分类号： B29C67/00 ,  B29C35/08 ,  B29K105/24 ,  B05D3/06 ,  G03C9/08

    CPC分类号： B29C67/0066 ,  B29K2995/0073

    摘要： An apparatus and related method for providing a substantially flat working surface of photocurable resin for the formation of a next layer of a stereolithographic part. A substantially flat surface of a rigid member is substantially covered by and spaced from the resin by a substance or film, which is placed in contact with the photocurable resin to form the working surface. Various embodiments are described including where the rigid member is a quartz including a fused silica plate, a bar, a vat wall, the face of a CRT, a fiber-optic bundle, or the bottom of a piston, and also including embodiments where the substance or film is a thin teflon or mylar film, an inert liquid, wax, a thin coating of trichlorosilane or ethoxysilane, or oxygen-saturated resin. Embodiments are also described whereby the next layer is exposed by transmitting solidifying radiation through the member and substance or film.

    摘要翻译： 一种用于提供用于形成下一层立体光刻部件的光固化树脂的基本上平坦的工作表面的装置和相关方法。 刚性构件的基本上平坦的表面基本上被树脂覆盖并与物质或膜隔开，物质或膜与光固化树脂接触以形成工作表面。 描述了各种实施例，其中刚性构件是包括熔融石英板，棒，大桶壁，CRT的表面，光纤束或活塞的底部的石英，并且还包括其中 物质或膜是薄的聚四氟乙烯或聚酯薄膜，惰性液体，蜡，三氯硅烷或乙氧基硅烷的薄涂层或氧饱和树脂。 还描述了实施例，借此通过传递固化辐射通过构件和物质或膜来暴露下一层。

    Method of and apparatus for measuring and controlling fluid level in stereolithography
    100.
    发明授权
    Method of and apparatus for measuring and controlling fluid level in stereolithography 失效
    用于测量和控制立体光刻中液位的方法和装置

    公开(公告)号：US5258146A

    公开(公告)日：1993-11-02

    申请号：US880190

    申请日：1992-05-06

    申请人： Thomas A. Almquist ,  Borzo Modrek ,  Paul F. Jacobs ,  Charles W. Lewis ,  Mark A. Lewis ,  Abraham Liran ,  Adam L. Cohen ,  Dennis R. Smalley

    发明人： Thomas A. Almquist ,  Borzo Modrek ,  Paul F. Jacobs ,  Charles W. Lewis ,  Mark A. Lewis ,  Abraham Liran ,  Adam L. Cohen ,  Dennis R. Smalley

    IPC分类号： B29C35/08 ,  B29C41/02 ,  B29C41/12 ,  B29C41/52 ,  B29C67/00 ,  G01F23/292 ,  G01F23/36 ,  G05D9/12

    CPC分类号： G05D9/12 ,  B29C41/12 ,  B29C67/0066 ,  G01F23/2921 ,  G01F23/366 ,  B29K2995/0073 ,  Y10T156/17

    摘要： Improved apparatus and methods for forming a layer of material over a surface of a previously-formed cross-section of a three-dimensional object in anticipation of forming a next cross-section of the object out of the layer. A volume of material, including at least some excess material, is placed over the surface, and the excess material is swept off by placing the excess material in the predetermined path of a sweeping member, the path being substantially in a plane spaced from a working surface of material. The member may be directed to sweep the excess material away through a successive number of sweeps, which may vary for each cross-section, at least a velocity which may vary for each sweep. Additionally, the clearance between the member and the surface of the previous cross-section may vary for each sweep. A "winged" member is also provided, comprising two legs extending from a base, and a "Trident" embodiment is also provided, comprising three legs extending from a base.

    摘要翻译： 改进的用于在三维物体的预先形成的横截面的表面上形成材料层的装置和方法，以期将物体的下一个横截面形成在该层之外。 将一定体积的材料（包括至少一些多余的材料）放置在表面上，并且通过将多余的材料放置在扫掠构件的预定路径中来清除多余的材料，该路径基本上处于与工作 材料表面。 该构件可以被引导以通过连续数量的扫描来扫过多余的材料，该扫描对于每个横截面可以变化，至少每个扫描可能变化的速度。 此外，构件和前一横截面的表面之间的间隙可以针对每个扫掠而变化。 还提供了一个“翼形”构件，其包括从基座延伸的两个腿部，并且还提供了“三叉戟”实施例，其包括从底座延伸的三个腿部。