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    Scanning electron microscope
    92.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US09472376B2

    公开(公告)日：2016-10-18

    申请号：US14379715

    申请日：2013-02-18

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hiroshi Makino ,  Yuzuru Mizuhara ,  Miki Isawa ,  Michio Hatano ,  Yoshinori Momonoi

    IPC: H01J37/28 ,  G01B15/00 ,  G01B15/04

    CPC classification number: H01J37/28 ,  G01B15/00 ,  G01B15/04 ,  H01J2237/0048 ,  H01J2237/0492 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

    Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

    Abstract translation: 本发明的目的是提供一种形成电场的扫描电子显微镜，即使样品表面是导电材料，也能高效地提高从孔底等排出的电子。 为了实现上述目的，根据本发明，提出了一种扫描电子显微镜，其包括使电子束的扫描位置偏转的偏转器和用于在其上装载样品的样品台。 扫描电子显微镜包括控制装置，其以这样的方式控制偏转器或样品台，即在测量目标图案上扫描光束之前，位于测量对象图案的下层中的下层图案在另一个上进行光束照射 图案位于下层。

    Charged particle beam device
    93.
    发明授权
    Charged particle beam device 有权
    带电粒子束装置

    公开(公告)号：US09324540B2

    公开(公告)日：2016-04-26

    申请号：US14407117

    申请日：2013-04-12

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Ichiro Tachibana ,  Naomasa Suzuki

    IPC: H01J37/26 ,  G21K5/04 ,  H01J37/21 ,  H01J37/28 ,  H01J37/10 ,  H01J37/147

    CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2602 ,  H01J2237/281

    Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces. A charged particle beam device includes: an electron source configured to generate a primary electron beam; an objective lens configured to focus the primary electron beam; a deflector configured to deflect the primary electron beam; a detector configured to detect a secondary electron or a reflection electron generated from a sample by irradiation of the primary electron beam; an electrode having a hole through which the primary electron beam passes; a voltage control power supply configured to apply a negative voltage to the electrode; and a retarding voltage control power supply configured to generate an electric field, which decelerates the primary electron beam, on the sample by applying the negative voltage to the sample, wherein the charged particle beam device performs focus adjustment while an offset between the voltage applied to the electrode and the voltage applied to the sample is being kept constant.

    Abstract translation: 当通过组合并控制用于观察深孔等的延迟和升压来进行能量选择来检测信号电子时，聚焦调整的唯一方式是使用物镜的磁场变化。 然而，由于磁场变化的响应性差，吞吐量降低。 带电粒子束装置包括：电子源，被配置为产生一次电子束; 配置成聚焦一次电子束的物镜; 偏转器，被配置为偏转所述一次电子束; 检测器，被配置为通过一次电子束的照射来检测从样品产生的二次电子或反射电子; 具有一次电子束通过的孔的电极; 电压控制电源，被配置为向所述电极施加负电压; 以及延迟电压控制电源，被配置为通过向样本施加负电压来产生使样品上的一次电子束减速的电场，其中带电粒子束装置执行焦点调整，同时施加到 施加到样品的电极和电压保持恒定。

    CHARGED PARTICLE BEAM DEVICE
    94.
    发明申请
    CHARGED PARTICLE BEAM DEVICE 有权
    充电颗粒光束装置

    公开(公告)号：US20150357153A1

    公开(公告)日：2015-12-10

    申请号：US14410999

    申请日：2013-06-10

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Hiroshi MAKINO ,  Hideyuki KAZUMI ,  Minoru YAMAZAKI ,  Yuzuru MIZUHARA ,  Miki ISAWA

    IPC: H01J37/147 ,  H01J37/28

    CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2806 ,  H01J2237/281

    Abstract: An objective of the present invention is to provide a charged particle beam device with which information based on a charged particle which is discharged from a bottom part of high-aspect structure is revealed more than with previous technology. To achieve the objective, proposed is a charged particle beam device comprising: a first orthogonal electromagnetic field generator which deflects charged particles which are discharged from a material; a second orthogonal electromagnetic field generator which further deflects the charged particles which are deflected by the first orthogonal electromagnetic field generator; an aperture forming member having a charged particle beam pass-through aperture; and a third orthogonal electromagnetic field generator which deflects the charged particles which have passed through the aperture forming member.

    Abstract translation: 本发明的目的是提供一种带电粒子束装置，与先前的技术相比，显示出从高方面结构的底部排出的基于带电粒子的信息。 为了实现该目的，提出了一种带电粒子束装置，包括：第一正交电磁场发生器，其偏转从材料排出的带电粒子; 第二正交电磁场发生器，其进一步偏转由第一正交电磁场发生器偏转的带电粒子; 具有带电粒子束直通孔的孔形成构件; 以及第三正交电磁场发生器，其使穿过孔形成构件的带电粒子偏转。

    CHARGED PARTICLE BEAM APPARATUS
    95.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号：US20140014836A1

    公开(公告)日：2014-01-16

    申请号：US13939767

    申请日：2013-07-11

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Miki ISAWA ,  Minoru YAMAZAKI ,  Yuzuru MIZUHARA ,  Hiroshi MAKINO ,  Hideyuki KAZUMI

    IPC: G01N23/225

    CPC classification number: G01N23/2258 ,  G01B2210/56 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1508 ,  H01J2237/2448 ,  H01J2237/281 ,  H01J2237/2816

    Abstract: The charged particle beam apparatus having an opening formation member formed with an opening for passage of a charged particle beam emitted from a charged particle source, and either a detector adapted to detect charged particles having passed through the passage opening or a detector adapted to detect charged particles resulting from bombardment on another member of the charged particles having passed through the opening, comprises an aligner for aligning charged particles discharged from the sample and a control unit for controlling the aligner, wherein the control unit controls the aligner to cause it to shift trajectories of the charged particles discharged from the sample so that length measurement may be executed on the basis of detection signals before and after the alignment by the aligner.

    Abstract translation: 带电粒子束装置具有开口形成构件，该开口形成构件形成有用于通过从带电粒子源发射的带电粒子束的开口，以及适于检测通过通道开口的带电粒子的检测器或适于检测带电粒子的检测器 通过对通过开口的带电粒子的另一个部件进行轰击而产生的粒子包括用于对准从样品排出的带电粒子的对准器和用于控制对准器的控制单元，其中控制单元控制对准器使其移动轨迹 从样品排出的带电粒子可以根据校准器对准前后的检测信号进行长度测量。

    SCANNING ELECTRON MICROSCOPE
    97.
    发明申请
    SCANNING ELECTRON MICROSCOPE 审中-公开
    扫描电子显微镜

    公开(公告)号：US20130306866A1

    公开(公告)日：2013-11-21

    申请号：US13981175

    申请日：2012-01-25

    Applicant: Shahedul Hoque ,  Hajime Kawano

    Inventor： Shahedul Hoque ,  Hajime Kawano

    IPC: H01J37/28

    CPC classification number: H01J37/28 ,  H01J37/1474 ,  H01J2237/004 ,  H01J2237/0048 ,  H01J2237/281

    Abstract: The present invention has an object to provide a scanning electron microscope which suppresses a potential gradient produced by preliminary charge without changing lens conditions of an electron microscope. As an aspect to achieve the above object, there is proposed a scanning electron microscope in which a scanning deflector is controlled so that a second beam is scanned to detect electrons released from a sample after scanning a first beam on the sample to charge the surface of the sample and the first beam is scanned so that charge density in a surrounding part within a scanned area by the first beam is increased relatively as compared with a center part within the scanned area by the first beam.

    Abstract translation: 本发明的目的是提供一种扫描电子显微镜，其在不改变电子显微镜的透镜条件的情况下抑制由预充电产生的电位梯度。 作为实现上述目的的一个方面，提出了一种扫描电子显微镜，其中扫描偏转器被控制，使得扫描第二光束以在扫描样品上的第一光束之后检测从样品释放的电子，从而对 对样品和第一光束进行扫描，使得与第一光束的扫描区域内的中心部分相比，第一光束在扫描区域内的周围部分的电荷密度相对增加。

    Scanning electron microscope and sample observation method
    98.
    发明授权
    Scanning electron microscope and sample observation method 有权
    扫描电子显微镜和样品观察法

    公开(公告)号：US08519334B2

    公开(公告)日：2013-08-27

    申请号：US13639999

    申请日：2011-04-20

    Applicant: Satoshi Tadaka ,  Naomasa Suzuki ,  Naoma Ban ,  Tatsuichi Kato

    Inventor： Satoshi Tadaka ,  Naomasa Suzuki ,  Naoma Ban ,  Tatsuichi Kato

    IPC: H01J37/28 ,  H01J37/256 ,  G01N23/00

    CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J2237/2594 ,  H01J2237/281 ,  H01J2237/2815

    Abstract: The present invention provides a contact hole observation technology for avoiding a situation in which it is difficult to observe a contact hole as a nonuniform charge is formed in the contact hole due to a tilted electron beam during a process for forming a preliminary charge on a sample. The present invention also provides a scanning electron microscope based on such a contact hole observation technology. During a preliminary charge process, an electron beam is allowed to become incident in a plurality of directions to perform a precharge, thereby reducing a region within the contact hole that is not irradiated with the electron beam. This reduces the number of secondary electrons that become lost on the wall surface of the contact hole, thereby making it possible to acquire information about the bottom of the contact hole. Further, the precharge is processed by dividing a precharge irradiation region into a plurality of ring-shaped regions concentric with an observation region and precharging each of the ring-shaped regions in a plurality of scanning directions.

    Abstract translation: 本发明提供一种接触孔观察技术，用于避免在样品中形成初步电荷的过程中由于倾斜的电子束在接触孔中形成不均匀电荷难以观察到接触孔的情况 。 本发明还提供了一种基于这种接触孔观察技术的扫描电子显微镜。 在预充电过程中，允许电子束在多个方向上入射以进行预充电，从而减少接触孔内未被电子束照射的区域。 这就减少了在接触孔的壁表面上损失的二次电子的数量，从而可以获得关于接触孔的底部的信息。 此外，通过将预充电照射区域划分成与观察区域同心的多个环状区域并且在多个扫描方向上对每个环状区域进行预充电来进行预充电。

    ELECTRON BEAM IRRADIATION METHOD AND SCANNING ELECTRONIC MICROSCOPE
    99.
    发明申请
    ELECTRON BEAM IRRADIATION METHOD AND SCANNING ELECTRONIC MICROSCOPE 有权
    电子束辐射方法和扫描电子显微镜

    公开(公告)号：US20130187045A1

    公开(公告)日：2013-07-25

    申请号：US13807577

    申请日：2011-06-08

    Applicant: Kinya Kobayashi ,  Toshiyuki Yokosuka ,  Chahn Lee

    Inventor： Kinya Kobayashi ,  Toshiyuki Yokosuka ,  Chahn Lee

    IPC: H01J37/28

    CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/244 ,  H01J2201/025 ,  H01J2237/24592 ,  H01J2237/281

    Abstract: Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electron microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.

    Abstract translation: 提供了一种电子束扫描方法，用于形成用于将从图案发射的电子适当地引导到图案的外部的电场，并且还提供了扫描电子显微镜。 当用于形成电荷的电子束照射到样品时，第一电子束被照射到第一位置（1）和第二位置（2），其具有形成在样品上的图案的中心（104）作为对称点 然后另外照射到第一和第二照射位置之间的两个中心位置（3,4），两个中心位置（3,4）处于与第一和第二位置对称的点对中的相同的半径上。 此外，在此之后，重复将第一电子束照射到半径上的现有扫描位置之间的中心位置。

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