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    INKJET PRINTER WITH SUBSTRATE HEIGHT POSITION CONTROL
    12.
    发明公开
    INKJET PRINTER WITH SUBSTRATE HEIGHT POSITION CONTROL 审中-公开

    公开(公告)号：US20230331008A1

    公开(公告)日：2023-10-19

    申请号：US18337702

    申请日：2023-06-20

    申请人： Kateeva, Inc.

    发明人： Digby Pun ,  Alexander Sou-Kang Ko ,  David C. Donovan

    IPC分类号： B41J11/58

    CPC分类号： B41J11/58 ,  F16M11/18

    摘要： An inkjet printer is described. The inkjet printer has a substrate holder assembly that includes a base member having a long axis in a first direction and a short axis in a second direction perpendicular to the first direction; a contact member coupled to the base member, the contact member having a long axis in the first direction and a short axis in the second direction; a holder carriage coupled to the base member; a linear extender coupled between the base member and the contact member and extending in a third direction intersecting with the first direction and the second direction from the base member toward the contact member; and a flex member coupled to the base member, extending in the second direction between the linear extender and the contact member, and having a flex direction in a direction perpendicular to the first direction and the second direction.

    High resolution organic light-emitting diode devices, displays, and related methods
    16.
    发明授权
    High resolution organic light-emitting diode devices, displays, and related methods 有权

    公开(公告)号：US11489019B2

    公开(公告)日：2022-11-01

    申请号：US17301128

    申请日：2021-03-25

    申请人： Kateeva, Inc.

    发明人： Conor F. Madigan

    IPC分类号： H01L27/32 ,  H01L51/56 ,  H01L51/00 ,  H01L51/50 ,  H01L51/52

    摘要： A method of manufacturing an organic light-emitting diode display comprising a substrate having a well-defined by a confinement structure, the well containing a first electrode and a second electrode spaced from each other, wherein the method may comprise depositing a light-emissive material in the well via ink-jet printing, thereby forming a substantially continuous light-emissive material layer in the well from the deposited light-emissive material, the light-emissive material layer spanning and contained within boundaries of the well, wherein a surface of the light-emissive material layer that faces away from the substrate has a non-planar topography. The method may further comprise positioning a common electrode over the light-emissive material layer.

    GRIPPING FOR PRINT SUBSTRATES
    18.
    发明申请
    GRIPPING FOR PRINT SUBSTRATES 有权

    公开(公告)号：US20220143991A1

    公开(公告)日：2022-05-12

    申请号：US17648266

    申请日：2022-01-18

    申请人： Kateeva, Inc.

    发明人： Digby Pun

    IPC分类号： B41J11/00 ,  B41J11/06 ,  B41J13/00 ,  B41J13/30 ,  B41J11/22

    摘要： A holder assembly includes a base, a drive assembly coupled to the base, a motive source connected to the drive assembly, a vertical force applicator connected to the drive assembly along a connection edge thereof, and a gripping member coupled to the base, the gripping member having a contact surface coupled to a vacuum source, wherein the drive assembly has a first position with the flattening member engaged with the contact surface and a second position with the flattening member positioned away from the contact surface.

    METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE
    19.
    发明申请
    METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE 有权

    公开(公告)号：US20220136113A1

    公开(公告)日：2022-05-05

    申请号：US17647756

    申请日：2022-01-12

    申请人： Kateeva, Inc.

    发明人： Nava Shpaisman ,  Moshe Frenkel

    IPC分类号： C23F1/02 ,  H05K3/00 ,  C09D11/101 ,  H05K3/06 ,  G03F7/20 ,  C09D11/30 ,  G03F1/50 ,  H01L51/00 ,  B41M5/00 ,  C23F1/00

    摘要： A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface-activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch-resist mask.

    Drop characteristic measurement
    20.
    发明授权
    Drop characteristic measurement 有权

    公开(公告)号：US11318738B2

    公开(公告)日：2022-05-03

    申请号：US16719666

    申请日：2019-12-18

    申请人： Kateeva, Inc.

    发明人： Eashwer Chandra Vidhya Sagar Kollata ,  Timothy Walter Dion ,  Tze Hwei Tseeng

    IPC分类号： B41J2/045 ,  G02B26/08 ,  G01B11/28 ,  G02B27/30

    摘要： An inkjet printing system with a droplet measurement apparatus is described herein. The droplet measurement apparatus has a light source with a collimating optical system, an imaging device disposed along an optical path of the collimating optical system, and a droplet illumination zone in the optical path of the collimating optical system, the droplet illumination zone having a varying droplet illumination location, wherein the light source, the imaging device, or both are adjustable to place a focal plane of the imaging device at the droplet illumination location. The droplet measurement apparatus is structured to accommodate at least a portion of a dispenser of the printing system within the droplet illumination zone.