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175 条记录 (耗时 0.032 秒)

    Laser system
    11.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号：US20080165337A1

    公开(公告)日：2008-07-10

    申请号：US11981450

    申请日：2007-10-30

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Ivan Lalovic

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Ivan Lalovic

    IPC分类号： G03B27/54 ,  G03F7/26

    CPC分类号： G03F7/70625 ,  G03F7/70025 ,  G03F7/70583 ,  G03F7/70616 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2308

    摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

    摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。

    Drive laser for EUV light source
    12.
    发明申请
    Drive laser for EUV light source 有权
    驱动激光用于EUV光源

    公开(公告)号：US20070291350A1

    公开(公告)日：2007-12-20

    申请号：US11452558

    申请日：2006-06-14

    申请人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Jerzy R. Hoffman ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Jerzy R. Hoffman ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： H01S3/00

    CPC分类号： H01S3/2316 ,  H01S3/0057 ,  H01S3/11 ,  H01S3/2232 ,  H01S3/225 ,  H05G1/54 ,  H05G2/008

    摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.

    摘要翻译： 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源极，第一放大器可以具有以饱和能量（E S，S 1）和小信号增益（g 1，...）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（E SUB，2 N）和小信号增益（g 0，o 2）的增益介质，其中（g < （o，SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB >）。 在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。 模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。

    Collector for EUV light source
    13.
    发明授权
    Collector for EUV light source 失效
    EUV光源收集器

    公开(公告)号：US07288777B2

    公开(公告)日：2007-10-30

    申请号：US11603471

    申请日：2006-11-21

    申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

    发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

    IPC分类号： H01J35/20

    CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

    摘要： An apparatus/method is disclosed that may comprise an EUV light source which may comprise a collector which may comprise an elliptical collector mirror having a first focus at a plasma initiation point and a second focus at an intermediate focus of the EUV light source; a debris shield intermediate the plasma initiation point and the elliptical collector mirror comprising a plurality of radially extending channels extending from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the elliptical collector mirror. The plurality of channels may be formed between a plurality of generally planer foils extending radially from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the collector mirror.

    摘要翻译： 公开了一种可以包括EUV光源的装置/方法，该EUV光源可以包括收集器，该收集器可以包括在EUV光源的中间焦点处具有等离子体起始点的第一焦点和第二焦点的椭圆形收集器反射镜; 位于等离子体起始点之间的碎片屏蔽和椭圆形收集器镜，其包括从第一焦点延伸并对准到第二焦点并围绕穿过第一焦点的旋转轴对称的多个径向延伸的通道，并且对准纵向轴线 的椭圆收集镜。 多个通道可以形成在从第一焦点径向延伸并与第二焦点对准的多个大致平面的箔片之间并且围绕穿过第一焦点的旋转轴线对称并且与收集器反射镜的纵向轴线对准。

    High resolution etalon-grating spectrometer
    15.
    发明授权
    High resolution etalon-grating spectrometer 有权

    公开(公告)号：US06538737B2

    公开(公告)日：2003-03-25

    申请号：US10003513

    申请日：2001-10-31

    申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

    发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

    IPC分类号： G01J314

    CPC分类号： G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

    摘要： A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

    Laser-produced-plasma EUV light source
    18.
    发明授权
    Laser-produced-plasma EUV light source 有权
    激光产生的等离子体EUV光源

    公开(公告)号：US08785892B2

    公开(公告)日：2014-07-22

    申请号：US13493871

    申请日：2012-06-11

    申请人： Alexander I. Ershov ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  Igor V. Fomenkov

    IPC分类号： H05H1/00 ,  H05H1/24 ,  G21K5/04

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008 ,  Y10S422/906

    摘要： Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.

    摘要翻译： 本文描述了设备和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。