摘要:
An apparatus and system of establishing receive timing difference (RTD) for high subcarrier spacing (SCS) are described. The RTD is dependent on whether carrier aggregation (CA) or dual connectivity (DC) is used. For CA, RTD reflects the entire time difference between carriers caused by a Timing Alignment Error (TAE) and propagation delay difference between slots aligned at transmission. For DC, RTD is between the closest slot boundaries and reflects only slot boundary misalignment without considering the slot index.
摘要:
An apparatus of a New Radio (NR) Node B (gNB), a method, and a storage medium. One or more processors of the apparatus are to: encode for transmission to a user equipment (UE) a message to configure the UE with a measurement gap pattern for positioning reference signal (PRS) measurements; and set a gap pattern length of a measurement gap corresponding to the measurement gap pattern depending on whether an overlap exists between a PRS to be measured and one or more other NR data scheduled to be received by the UE.
摘要:
An apparatus for use in a UE includes processing circuitry coupled to a memory. To configure the UE for Reference Signal Time Difference (RSTD)-based 5G-NR positioning. The processing circuitry is to determine a first PRS BW associated with a first PRS received from a first gNB associated with a first cell. A second PRS BW is determined, which is associated with a second PRS received from a second gNB of a second cell. An RSTD report resolution is determined based on the first PRS BW and the second PRS BW. A receive (Rx) timing difference between the first cell and the second cell is measured based on reception times of the first PRS and the second PRS. The measured Rx timing difference is mapped into an RSTD report for transmission to the first gNB, based on the RSTD report resolution.
摘要:
A semiconductor device has a substrate containing a transparent or translucent material. A spacer is mounted to the substrate. A first semiconductor die has an active region and first conductive vias electrically connected to the active region. The active region can include a sensor responsive to light received through the substrate. The first die is mounted to the spacer with the active region positioned over an opening in the spacer and oriented toward the substrate. An encapsulant is deposited over the first die and substrate. An interconnect structure is formed over the encapsulant and first die. The interconnect structure is electrically connected through the first conductive vias to the active region. A second semiconductor die having second conductive vias can be mounted to the first die with the first conductive vias electrically connected to the second conductive vias.
摘要:
A delegate-based group channel access method is disclosed for machine-to-machine (M2M) communication. The delegate-based group channel access method groups M2M devices having common characteristics together, assigns a single delegate or multiple delegates from the group according to some criteria, and uses the assigned delegate to perform channel access. This method avoids unnecessary peer-to-peer communication between M2M devices reduces the probability of collision on the channel during initial channel access, and reduces the control signaling overhead. The, delegate-based group channel access method also coordinates the number of slots to backoff so that all M2M devices in the group keep pace with the delegate.
摘要:
Provided is a method for preparing sulfuric acid by using hydrogen sulfide. The method comprises the following steps: (1) performing a reduction-oxidation reaction between an H2S feed gas and oxygen comprised in an oxygen-rich air to prepare SO2, controlling residual oxygen after the reduction-oxidation reaction step at a molar percentage of ≧2%; (2) cooling the product acquired in step (1) to a temperature between 390° C. and 430° C., and then performing a catalyzed oxidation reaction with oxygen, wherein the catalyzed oxidation reaction is performed in stages until the conversion rate of SO2 is ≧98.7% or the outlet concentration of SO2 is ≦550 mg/Nm3; and (3) cooling the product acquired in step (2) to a temperature ≧10° C. over the dew point temperature of H2SO4, then further cooling to a temperature between 60° C. and 120° C., collecting H2SO4 product, and subjecting the gas acquired after cooling to a coalescent separation before discharging directly into the atmosphere. Also provided is a heat exchanger, comprising a housing and several glass pipes, wherein the glass pipes are arranged within the housing along the direction of a long axis of the housing, arching between two lateral walls thereof, and used for circulating cooling medium; the adjacent glass pipes are connected head-to-tail, thereby forming at least one cooling medium flow path of unidirectional flow. The method for preparing sulfuric acid provides high removal efficiency of hydrogen sulfide, simple process flow, and allows for economic efficiency of apparatus and reasonable utilization of energy.
摘要:
Systems and techniques for wireless device-to-device (D2D) communication are provided herein. A D2D group identifier may be included in wireless transmissions within D2D groups. D2D interference mitigation processes may be initiated when a D2D group identifier is detected by a wireless device outside the D2D group.
摘要:
Embodiments of the invention include a fast network re-entry system that optimizes the network re-entry and bandwidth request process for wireless communications between a base station and a mobile or fixed station. In one embodiment a mobile station, in idle mode, transmits a single communication, including both control information and bandwidth request information, to a base station. The communication may proceed via an uncontested communication slot. Other embodiments are described herein.
摘要:
The present disclosure relates to a surface structure control and preparation process for a metal nanocatalyst involving a metal nanocatalyst. The present disclosure provides a surface structure control and continuous preparation system for a metal nanocatalyst, a metal nanocatalyst having an open surface structure and high surface energy, and a surface structure control and a preparation process thereof. The system is provided with a nucleation electrolytic cell, a distribution valve, at least two growth electrolytic cells, with two ends of the distribution valve being connected to an output port of the nucleation electrolytic cell and to input port of all the growth electrolytic cells, respectively. The metal nanocatalyst having an open surface structure is a single metal nanoscale crystal and has a high density of terrace atoms or active sites on the surface thereof. The precursor reaction solution is injected into the nucleation electrolytic cell, and a nucleation programmed potential is applied to one pair of electrodes in the nucleation electrolytic cell to obtain a nucleation reaction solution having the metal crystal nucleus formed, which is conveyed to the growth electrolytic cell through the distribution valve, a growth programmed potential is applied to one pair of electrodes in the growth electrolytic cell to obtain a metal nanoscale crystal having an open surface structure; controlling the growth time to obtain a reaction solution, and collecting a product by centrifugation.
摘要:
A semiconductor device includes conductive pillars disposed vertically over a seed layer, a conformal insulating layer formed over the conductive pillars, and a conformal conductive layer formed over the conformal insulating layer. A first conductive pillar, the conformal insulating layer, and the conformal conductive layer constitute a vertically oriented integrated capacitor. The semiconductor device further includes a semiconductor die or component mounted over the seed layer, an encapsulant deposited over the semiconductor die or component and around the conformal conductive layer, and a first interconnect structure formed over a first side of the encapsulant. The first interconnect structure is electrically connected to a second conductive pillar, and includes an integrated passive device. The semiconductor device further includes a second interconnect structure formed over a second side of the encapsulant opposite the first side of the encapsulant.