公开(公告)号：US20150168834A1

公开(公告)日：2015-06-18

申请号：US14625897

申请日：2015-02-19

Applicant: FUJIFILM CORPORATION

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  C08F14/18 ,  C08F16/10 ,  G03F7/20 ,  C08F24/00

CPC classification number: G03F7/0388 ,  C08F14/185 ,  C08F16/10 ,  C08F24/00 ,  C08F220/18 ,  C08F220/20 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/325 ,  H01L21/0273 ,  H01L21/0274

Abstract: There is provided a pattern forming method, including: (a) forming a film by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition containing a resin (A) having a repeating unit represented by Formula (1-0) and a repeating unit represented by Formula (1-2); (b) exposing the film by using an electron beam or extreme ultraviolet ray; and (c) developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein a content of the repeating unit represented by Formula (1-0) is 45 mol % or more based on a whole repeating units in the resin (A).

Abstract translation: 提供了一种图案形成方法，包括：（a）通过使用含有具有由式（1-0）表示的重复单元的树脂（A）的电子束敏感或极紫外线敏感性树脂组合物形成膜和 由式（1-2）表示的重复单元; （b）通过使用电子束或极紫外线曝光该膜; 和（c）通过使用含有有机溶剂的显影剂显影曝光的薄膜以形成负图案，其中由式（1-0）表示的重复单元的含量相对于全部重复单元为45摩尔％以上 树脂（A）。

公开(公告)号：US20150010857A1

公开(公告)日：2015-01-08

申请号：US14476936

申请日：2014-09-04

Applicant: FUJIFILM CORPORATION

Inventor： Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0392 ,  C08F8/02 ,  C08F8/12 ,  C08F8/14 ,  C08F8/34 ,  C08F8/36 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08F216/10 ,  C08F216/38 ,  C08F220/18 ,  C08F220/20 ,  C08F220/30 ,  C08F232/08 ,  C08F2800/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/30 ,  G03F7/322 ,  C08F112/14 ,  C08F120/20 ,  C08F2220/283 ,  C08F2220/382 ,  C08F2220/305 ,  C08F2220/301

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

公开(公告)号：US20140212811A1

公开(公告)日：2014-07-31

申请号：US14228894

申请日：2014-03-28

Applicant: FUJIFILM CORPORATION

Inventor： Naoki INOUE ,  Hiroo TAKIZAWA ,  Shuji HIRANO ,  Hideaki TSUBAKI

IPC: G03F7/20 ,  G03C1/73

CPC classification number: G03F7/2002 ,  C08F12/24 ,  C08F212/14 ,  G03C1/733 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2039 ,  G03F7/2041 ,  G03F7/325 ,  C08F212/32

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (C) a resin having one or more groups selected from the specific group as defined in the specification and (D) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.

Abstract translation: 图案形成方法包括以下顺序：用电子束敏感或极紫外线辐射敏感性树脂组合物形成膜的步骤（1），其包含（A）具有酸分解重复单元并能够降低的树脂 树脂（A）在含有有机溶剂的显影剂中的溶解度，（B）在电子束或极紫外线照射时能够产生酸的化合物，（C）具有一个 或更多选自本说明书中定义的特定基团的基团和（D）溶剂; 步骤（2），用电子束或极紫外线辐射曝光胶片; 以及在暴露之后用含有机溶剂的显影剂显影该膜以形成负图案的步骤（4）。

公开(公告)号：US20140193749A1

公开(公告)日：2014-07-10

申请号：US14207867

申请日：2014-03-13

Applicant: Fujifilm Corporation

Inventor： Hiroo TAKIZAWA ,  Hideaki TSUBAKI ,  Shuji HIRANO

IPC: G03F7/004 ,  G03F7/20 ,  H01J37/317

CPC classification number: G03F7/0041 ,  C08F12/20 ,  C08F12/24 ,  C08F212/14 ,  C08F212/32 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2037 ,  G03F7/2059 ,  G03F7/325 ,  H01J37/3174

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation and (C) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of forming a negative pattern by development of the film with a developer containing an organic solvent after the exposing of the film, wherein a content of the compound (B) is 21% by mass to 70% by mass on the basis of all solids content of the composition.

Abstract translation: 图案形成方法包括以下顺序：用电子束敏感或极紫外线辐射敏感性树脂组合物形成膜的步骤（1），其包含（A）具有酸分解重复单元并能够降低的树脂 （A）在含有有机溶剂的显影剂中的溶解度，（B）在电子束或极紫外线照射下能够产生酸的化合物和（C）溶剂; 步骤（2），用电子束或极紫外线辐射曝光胶片; 和步骤（4），通过在所述膜暴露之后用含有机溶剂的显影剂显影所述膜形成负图案，其中化合物（B）的含量为21质量％至70质量％ 组合物的所有固体含量的基础。

公开(公告)号：US20140030643A1

公开(公告)日：2014-01-30

申请号：US14039435

申请日：2013-09-27

Applicant: FUJIFILM Corporation

Inventor： Toshiya TAKAHASHI ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI ,  Shuji HIRANO ,  Tomotaka TSUCHIMURA

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.

Abstract translation: 本发明提供了包含含有酸分解性重复单元（A）的树脂（P）的光化学射线或辐射敏感性树脂组合物，该树脂在被酸作用时增加其在碱性显影剂中的溶解度，化合物 Q）当暴露于光化射线或辐射时，产生酸和由以下通式（1）或（2）表示的化合物（R）。

公开(公告)号：US20180175300A1

公开(公告)日：2018-06-21

申请号：US15897689

申请日：2018-02-15

Applicant: FUJIFILM Corporation

Inventor： Yosuke YAMAMOTO ,  Hiroo TAKIZAWA ,  Yuta SHIGENOI ,  Fumiko TAMAKUNI ,  Takashi GOTO ,  Tetsuya WATANABE

IPC: H01L51/00 ,  H01L51/05 ,  C08G61/12

CPC classification number: H01L51/0043 ,  C08G61/12 ,  H01L29/786 ,  H01L51/0003 ,  H01L51/0036 ,  H01L51/0038 ,  H01L51/0041 ,  H01L51/052 ,  H01L51/0529

Abstract: An object of the present invention is to provide an organic thin film transistor exhibiting high carrier mobility and a low threshold voltage and having excellent heat resistance, a method of manufacturing an organic thin film transistor, an organic semiconductor composition, an organic semiconductor film, and a method of manufacturing an organic semiconductor film. The organic thin film transistor according to the present invention includes, on a substrate, a gate electrode; an organic semiconductor layer containing an organic semiconductor compound; a gate insulating layer provided between the gate electrode and the organic semiconductor layer; and a source electrode and a drain electrode which are provided to be in contact with the organic semiconductor layer and are connected to each other via the organic semiconductor layer, in which the organic semiconductor layer is in contact with a block copolymer layer containing a block copolymer or further contains the block copolymer, and in which the organic semiconductor compound has a molecular weight of 2,000 or greater and has a repeating unit represented by Formula (1).

公开(公告)号：US20160147154A1

公开(公告)日：2016-05-26

申请号：US15011813

申请日：2016-02-01

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Toru FUJIMORI ,  Wataru NIHASHI ,  Shuji HIRANO ,  Natsumi YOKOKAWA

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2065 ,  G03F7/26 ,  G03F7/30 ,  G03F7/40

Abstract: There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).

Abstract translation: 提供了图案形成方法，其包括：（1）使用活性光敏或辐射敏感性树脂组合物形成膜; （2）将膜暴露于活性光或辐射; 和（3）使用包含有机溶剂的显影剂显影曝光的膜，其中活性光敏或辐射敏感性树脂组合物含有具有特定重复单元的树脂（A）和交联剂（C）。

公开(公告)号：US20150338736A1

公开(公告)日：2015-11-26

申请号：US14751669

申请日：2015-06-26

Applicant: FUJIFILM CORPORATION

Inventor： Takeshi KAWABATA ,  Hiroo TAKIZAWA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Keita KATO

IPC: G03F7/004 ,  C07C309/17 ,  C07D333/48 ,  C07D335/02 ,  C07D327/06 ,  C07C309/12 ,  C07D217/06 ,  G03F7/20 ,  C07D333/76

CPC classification number: G03F7/0045 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/29 ,  C07C311/48 ,  C07C317/04 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D217/06 ,  C07D295/185 ,  C07D327/06 ,  C07D333/46 ,  C07D333/48 ,  C07D333/76 ,  C07D335/02 ,  C07J9/005 ,  C07J17/00 ,  C07J31/006 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.)

Abstract translation: 本发明提供一种包含树脂（A）和下述通式（I）的任何化合物（B））的光化射线或辐射敏感性树脂组合物。 （通式（I）中，Rf表示氟原子或含有至少一个氟原子的一价有机基团; R1表示氢原子或不含氟原子的一价取代基; X1表示具有至少2个碳原子的1价有机基团 原子或其中任选地引入除氟原子以外的取代基的甲基，条件是X1可以与R 1键合，从而形成环; Z表示当暴露于光化射线或辐射时被转化为 磺酸基，亚氨基酸基或甲基酸基）。

公开(公告)号：US20150185610A1

公开(公告)日：2015-07-02

申请号：US14605292

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C08F212/32 ,  C08F212/14 ,  C08F222/14 ,  G03F7/30 ,  C08F220/28

CPC classification number: G03F7/0388 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F222/14 ,  C08F232/08 ,  C08F2220/281 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0274 ,  C08F2220/282 ,  C08F220/06 ,  C08F2220/1858 ,  C08F2220/283 ,  C08F2220/301 ,  C08F2220/302 ,  C08F220/10

Abstract: There is provided a pattern forming method comprising, in order, (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (Ab) a resin having specific repeating units, (2) a step of exposing the film by using an electron beam or an extreme-ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供一种图案形成方法，其顺序包括：（1）通过使用含有（Ab）具有特定重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤，（2）步骤 通过使用电子束或极紫外线曝光膜，以及（3）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。

公开(公告)号：US20140349224A1

公开(公告)日：2014-11-27

申请号：US14451901

申请日：2014-08-05

Applicant: FUJIFILM CORPORATION

Inventor： Hiroo TAKIZAWA ,  Tomotaka TSUCHIMURA ,  Takeshi KAWABATA ,  Takuya TSURUTA

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/325

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decomposing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供了一种图案形成方法，其包括（1）通过使用含有（A）含有酸可分解重复单元的树脂并且能够降低溶解度的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤 对于含有机溶剂的显影剂，通过酸的作用，（B）能够在用光化射线或辐射照射时能够产生酸的化合物，（C）能够通过酸的作用分解以产生酸的化合物， 酸，和（D）溶剂; （2）通过使用光化射线或辐射使膜曝光的步骤，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。