公开(公告)号：US20140011134A1

公开(公告)日：2014-01-09

申请号：US14011837

申请日：2013-08-28

Applicant: Fujifilm Corporation

Inventor： Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Shohei KATAOKA ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO ,  Shoichi SAITOH

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括（i）通过含有（P）具有（a）由该具体式表示的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤，（B） 能够在用光化射线或辐射照射时产生有机酸的化合物; （ii）曝光该薄膜的步骤，（iii）通过使用含有机溶剂的显影剂来显影该薄膜以形成负图形的步骤。

公开(公告)号：US20230393472A1

公开(公告)日：2023-12-07

申请号：US18446045

申请日：2023-08-08

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Taro MIYOSHI

IPC: G03F7/039 ,  G03F7/004 ,  C08F212/14 ,  C08F232/08 ,  C08F220/18 ,  C08F220/58 ,  C08F220/38 ,  C08F220/28 ,  C08F220/36

CPC classification number: G03F7/039 ,  G03F7/0045 ,  C08F212/24 ,  C08F232/08 ,  C08F220/1806 ,  C08F220/1811 ,  C08F220/585 ,  C08F220/1809 ,  C08F220/1818 ,  C08F220/382 ,  C08F220/1808 ,  C08F220/282 ,  C08F220/365 ,  C08F220/283 ,  C08F220/281 ,  C08F212/30

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition having excellent temporal stability and excellent LWR suppression property of a pattern to be formed; a resist film; a positive tone pattern forming method; and a method for manufacturing an electronic device, which relate to the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a repeating unit (a) and a basic compound, a pKa of a conjugate acid of which is 13.00 or less, in which the repeating unit (a) has a non-ionic group which generates an acid in a case where a leaving group is eliminated by irradiation with an actinic ray or a radiation, in which a repeating unit obtained by replacing the leaving group with a hydrogen atom has a molecular weight of 300 or less, and the repeating unit (a) is a predetermined amount with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20160327862A1

公开(公告)日：2016-11-10

申请号：US15212552

申请日：2016-07-18

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA ,  Shuhei YAMAGUCHI ,  Natsumi YOKOKAWA

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F1/50

CPC classification number: G03F7/038 ,  C08F12/22 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08K5/13 ,  C09D125/18 ,  G03F1/50 ,  G03F7/004 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/322

Abstract: An actinic ray sensitive or radiation sensitive resin composition contains a polymer compound (A) having a phenolic hydroxyl group and satisfying the following (a) and (b), a compound (B) capable of generating an acid upon irradiation with actinic rays or radiation, and a crosslinking agent (C) for crosslinking the polymer compound (A) by the action of an acid and having a glass transition temperature (Tg) of 200° C. or higher: (a) the weight-average molecular weight is 3,000 or more and 6,500 or less, and (b) the glass transition temperature (Tg) is 140° C. or higher.

Abstract translation: 该活性光敏感性或辐射敏感性树脂组合物含有以下物质：含有酚羟基的高分子化合物（A），（a）重均分子量在3000〜6500以下，（b） 玻璃化转变温度（Tg）至少为140℃; 暴露于活性光或辐射时产生酸的化合物（B）; 和（C）通过上述酸的作用使高分子化合物（A）交联并且玻璃化转变温度（Tg）为至少200℃的交联剂。

公开(公告)号：US20160209746A1

公开(公告)日：2016-07-21

申请号：US15080714

申请日：2016-03-25

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Tomotaka TSUCHIMURA ,  Natsumi YOKOKAWA ,  Koutarou TAKAHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C07D487/04 ,  C07C275/24 ,  C07C233/36 ,  G03F7/32 ,  C07D239/10

CPC classification number: G03F7/038 ,  C07C233/36 ,  C07C271/16 ,  C07C271/24 ,  C07C271/34 ,  C07C275/10 ,  C07C275/24 ,  C07C275/26 ,  C07C323/60 ,  C07C2601/14 ,  C07D211/26 ,  C07D233/32 ,  C07D233/36 ,  C07D235/26 ,  C07D239/10 ,  C07D251/30 ,  C07D403/12 ,  C07D487/04 ,  G03F1/08 ,  G03F7/0382 ,  G03F7/0387 ,  G03F7/20 ,  G03F7/32

Abstract: There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).

Abstract translation: 提供了含有（A）碱溶性树脂和（C）由以下通式（1-0）表示的交联剂的活性光敏或辐射敏感性树脂组合物。

公开(公告)号：US20140349225A1

公开(公告)日：2014-11-27

申请号：US14456309

申请日：2014-08-11

Applicant: FUJIFILM Corporation

Inventor： Kei YAMAMOTO ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Junichi ITO

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0388 ,  G03F7/0048 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (A), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70° or more.

Abstract translation: 提供了一种图案形成方法，其包括：（a）通过光化射线敏感或辐射敏感性树脂组合物形成膜，所述树脂组合物包含：（A）能够通过酸的作用增加极性的树脂，以降低溶解度 含有有机溶剂的显影剂，（B）能够以光化射线或辐射照射后能够产生酸的化合物，（C）溶剂，（D）基本上不含氟原子和硅原子的树脂， 比树脂（A），（b）曝光该膜; 和（c）使用含有机溶剂的显影剂进行显影以形成负型图案，其中由（a）形成的膜上的水的后退接触角为70°以上。

公开(公告)号：US20130122427A1

公开(公告)日：2013-05-16

申请号：US13725483

申请日：2012-12-21

Applicant: FUJIFILM CORPORATION

Inventor： Shohei KATAOKA ,  Kaoru IWATO ,  Kana FUJII ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Keita KATO ,  Shuhei YAMAGUCHI

IPC: G03F7/004

CPC classification number: G03F7/004 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/10 ,  C07C309/12 ,  C07C309/13 ,  C07C309/14 ,  C07D211/96 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0755 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

Abstract translation: 图案形成方法包括：（i）由光化学射线敏感或辐射敏感的树脂组合物形成膜，所述树脂组合物含有（A）在用光化射线或辐射照射时能够产生酸的化合物，并通过 酸降低化合物（A）对有机溶剂的溶解度的作用; （ii）曝光胶片; 和（iii）通过使用含有有机溶剂的显影剂进行显影。

公开(公告)号：US20240210826A1

公开(公告)日：2024-06-27

申请号：US18586593

申请日：2024-02-26

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Shuhei YAMAGUCHI ,  Tomoaki YOSHIOKA ,  Eiji FUKUZAKI ,  Yuka KAMINO

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition including: a resin (A) that is decomposed by the action of an acid and thereby increased in polarity; and a compound (C) that generates an acid upon irradiation with actinic rays or radiation and that is represented by a specific formula. The resin (A) includes a specific repeating unit represented by specific general formula (AI).

公开(公告)号：US20230384674A1

公开(公告)日：2023-11-30

申请号：US18448505

申请日：2023-08-11

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Taro Miyoshi ,  Tomoaki Yoshioka ,  Eiji Fukuzaki

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14 ,  C08F220/18 ,  C08F220/30

CPC classification number: G03F7/039 ,  G03F7/038 ,  G03F7/0045 ,  C08F212/24 ,  C08F220/1818 ,  C08F220/301 ,  C08F220/302 ,  C08F220/303 ,  C08F212/30

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition with which LWR of a pattern to be formed can be reduced; a resist film; a pattern forming method; and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit (a), in which the repeating unit (a) is a repeating unit having an ionic group which generates an acid in a case where a leaving group is eliminated by irradiation with an actinic ray or a radiation, in which a repeating unit obtained by replacing the leaving group with a hydrogen atom has a molecular weight of 300 or less, and the repeating unit (a) is a predetermined amount or more with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20170351176A1

公开(公告)日：2017-12-07

申请号：US15685499

申请日：2017-08-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI ,  Toshiaki FUKUHARA ,  Shuji HIRANO

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/16 ,  G03F7/30 ,  G03F1/50

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

公开(公告)号：US20160320700A1

公开(公告)日：2016-11-03

申请号：US15205250

申请日：2016-07-08

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI

IPC: G03F7/038 ,  C08F116/10 ,  G03F7/32 ,  C08F224/00 ,  C08F214/18 ,  G03F7/20 ,  C08F216/10 ,  C08F220/16

CPC classification number: G03F7/038 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  C08F12/18 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F112/14 ,  C08F116/10 ,  C08F214/186 ,  C08F216/10 ,  C08F220/16 ,  C08F220/20 ,  C08F220/28 ,  C08F220/30 ,  C08F224/00 ,  C09D125/18 ,  G03F7/0015 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2059 ,  G03F7/2065 ,  G03F7/322 ,  G03F7/325 ,  H01L21/0274 ,  C08F212/14 ,  C08F212/32 ,  C08F212/34

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin (A) containing a repeating unit represented by General Formula (4) and a crosslinking agent (C) containing a polar group, in which the crosslinking agent (C) is a compound represented by General Formula (1) or a compound in which two to five structures represented by General Formula (1) are connected via a linking group or a single bond represented by L1 in General Formula (3).