公开(公告)号：US06956223B2

公开(公告)日：2005-10-18

申请号：US10119290

申请日：2002-04-10

申请人： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

发明人： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

IPC分类号： H01J37/04 ,  H01J37/18 ,  H01J37/317 ,  H01L21/265 ,  H01L21/68 ,  B05C5/00

CPC分类号： H01J37/20 ,  H01J37/18 ,  H01J37/3171 ,  H01J2237/20 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20228 ,  H01J2237/20278 ,  H01L21/682 ,  H01L21/6835

摘要： Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant. The Faraday 450 can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.

摘要翻译： 公开了半导体处理装置，其提供基板或晶片保持器180的扫描臂60在至少两个大致正交的方向（所谓的X-Y扫描）上的移动。 沿着第一方向进行的扫描纵向地穿过真空室壁中的孔口55。 臂60由一个或多个线性电动机90A，90B往复运动。臂60相对于滑块100被支撑，使用支撑的空气轴承，以便相对于滑块100为臂提供悬臂支撑。 进入用于臂60的真空室中的柔性馈通件130然后用作真空密封和引导件，但本身不需要提供轴承支撑件。 法拉第450附接到靠近基板保持器180的臂60，以允许在植入之前和期间执行光束轮廓。 法拉第450可以替代地或附加地安装在靠近衬底保持器的后部或与其相邻的90°处，以允许在植入之前执行光束轮廓，其中衬底支撑件反向或水平并且离开光束线。

公开(公告)号：US06555832B1

公开(公告)日：2003-04-29

申请号：US09686092

申请日：2000-10-12

申请人： Geoffrey Ryding ,  Theodore H. Smick ,  John Ruffell ,  Marvin Farley ,  Peter Rose

发明人： Geoffrey Ryding ,  Theodore H. Smick ,  John Ruffell ,  Marvin Farley ,  Peter Rose

IPC分类号： H01J37317

CPC分类号： H01J37/1471 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/1501

摘要： A back scattered ion receiver is mounted on the process chamber of an ion implanter to receive beam ions back scattered from a wafer mounted on the wafer holder in the chamber. Minima in the intensity of back scattered ions as the wafer on the holder is moved relative to the beam direction, can be used to obtain an accurate calibration of the true beam direction. Beam direction error can then be compensated for when operating holder tilt and twist mechanisms so as to bring a process wafer accurately into the required orientation relative to the true beam. If the crystallographic alignment and orientation of process wafers has been precharacterised, this data can be used to control the wafer holder to align process wafers crystallographically to the process beam.

摘要翻译： 背散射离子接收器安装在离子注入机的处理室中，以接收从安装在腔室中的晶片保持器上的晶片反向散射的束离子。 在保持器上的晶片相对于光束方向移动时，背散射离子的强度的最小值可用于获得真正的光束方向的精确校准。 然后可以在操作支架倾斜和扭转机构时补偿光束方向误差，以便使处理晶片相对于真实光束精确地进入所需的方向。 如果处理晶片的晶体取向和取向已经被预先表征，则该数据可用于控制晶片保持器以将工艺晶片在晶体学上与工艺光束对准。

公开(公告)号：US06437351B1

公开(公告)日：2002-08-20

申请号：US09684993

申请日：2000-10-10

申请人： Theodore H. Smick ,  Geoffrey Ryding ,  Marvin Farley

发明人： Theodore H. Smick ,  Geoffrey Ryding ,  Marvin Farley

IPC分类号： H01J3700

CPC分类号： H01L21/68 ,  H01J37/3171 ,  H01J2237/20228

摘要： An apparatus used to control a workpiece inside a vacuum chamber. The workpiece is supported on a workpiece holder in the vacuum chamber. The workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and an integral air bearing support. The differentially pumped vacuum seals and integral air bearing support allow for multiple independent motions to be transmitted to the workpiece supported by the workpiece holder. The workpiece holder motions provided are (1) rotation about the X axis, (2) translation back and forth along the Y direction of an X-Y plane on the surface of the workpiece holder, and (3) rotation of the workpiece in the X-Y plane about its Z axis. Concentric seals, oval for the translation motion and circular for the rotational motion, are differentially pumped through common ports to provide successively decreasing pressure and gas flow in order to reduce the gas load into the vacuum vessel to a negligible rate.

摘要翻译： 用于控制真空室内的工件的装置。 工件被支撑在真空室中的工件支架上。 工件通过差分抽真空密封和一体式空气轴承支架与真空室外的大气隔离。 差分抽真空密封件和一体式空气轴承支撑件允许多个独立的运动传递到由工件支架支撑的工件。 所提供的工件保持器动作为（1）围绕X轴旋转，（2）沿着工件保持器表面上的XY平面的Y方向前后平移，以及（3）工件在XY平面中的旋转 关于它的Z轴。 用于平移运动的椭圆形和用于旋转运动的圆形的同心密封件通过公共端口差异泵送，以提供连续减小的压力和气体流量，以便将进入真空容器的气体负载降至可忽略的速率。

公开(公告)号：US20100181470A1

公开(公告)日：2010-07-22

申请号：US12357688

申请日：2009-01-22

申请人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

发明人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

IPC分类号： G01D18/00 ,  A61N5/00 ,  H01J5/18

CPC分类号： H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542

摘要： An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.

摘要翻译： 一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。 一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与 第一梁部分。 光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。 板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

公开(公告)号：US20090321631A1

公开(公告)日：2009-12-31

申请号：US12487229

申请日：2009-06-18

申请人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

发明人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

IPC分类号： H01J49/26

CPC分类号： H01J37/3171 ,  F16M11/123 ,  F16M11/18 ,  H01J37/20 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20278

摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.

摘要翻译： 提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。 可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。 机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。 每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。 每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

公开(公告)号：US07253424B2

公开(公告)日：2007-08-07

申请号：US11417027

申请日：2006-05-04

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： H01L21/26 ,  G21K5/10

CPC分类号： H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US20050191409A1

公开(公告)日：2005-09-01

申请号：US11029004

申请日：2005-01-05

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

IPC分类号： H01L21/265 ,  B05D1/00 ,  C23C14/00 ,  C23C16/00 ,  H01J27/00 ,  H01J37/244 ,  H01J37/304 ,  H01J37/317 ,  H01L21/425 ,  H01L21/66

CPC分类号： H01J37/3171 ,  H01J37/304 ,  H01J2237/30455 ,  H01J2237/31703

摘要： This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.

摘要翻译： 本发明涉及用于离子注入机的离子束监测装置，其中期望监测用于植入的离子束的通量和/或横截面轮廓。 通常期望在离子注入机中测量离子束的通量和/或横截面轮廓，以便改进对半导体晶片或类似物的离子注入的控制。 本发明描述了适配晶片保持器以允许执行这种光束轮廓。 衬底保持器可以逐渐地用于从下游通量监视器闭塞离子束，或者通量监视器可以位于设置有狭缝入口孔的晶片保持器上。

公开(公告)号：US06878946B2

公开(公告)日：2005-04-12

申请号：US10259827

申请日：2002-09-30

申请人： Marvin Farley ,  Takao Sakase ,  Shu Satoh ,  Geoffrey Ryding ,  Peter Rose ,  Christos Christou

发明人： Marvin Farley ,  Takao Sakase ,  Shu Satoh ,  Geoffrey Ryding ,  Peter Rose ,  Christos Christou

IPC分类号： H01J27/00 ,  H01J37/08

CPC分类号： H01J37/08 ,  H01J1/20 ,  H01J1/26 ,  H01J27/08 ,  H01J37/3171 ,  H01J2237/061 ,  H01J2237/082

摘要： An indirectly heated button cathode for use in the ion source of an ion implanter has a button member formed of a slug piece mounted in a collar piece. The slug piece is thermally insulated from the collar piece to enable it to operate at a higher temperature so that electron emission is enhanced and concentrated over the surface of the slug piece. The slug piece and collar piece can be both of tungsten. Instead the slug piece may be of tantalum to provide a lower thermionic work function. The resultant concentrated plasma in the ion source is effective to enhance the production of higher charge state ions, particularly P+++ for subsequent acceleration for high energy implantation.

摘要翻译： 用于离子注入机的离子源的间接加热纽扣阴极具有由安装在轴环件中的塞片形成的纽扣件。 芯块与套环件绝热，使其能够在更高的温度下工作，从而使电子发射增强并集中在芯块的表面上。 lug lug piece piece piece。。。。。。。。。。 替代地，块塞可以是钽以提供较低的热离子功能。 在离子源中产生的浓缩等离子体有效地增强高电荷状态离子的产生，特别是用于高能量注入的后续加速的P +++。

公开(公告)号：US08227768B2

公开(公告)日：2012-07-24

申请号：US12487229

申请日：2009-06-18

申请人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

发明人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

IPC分类号： G21K5/04

CPC分类号： H01J37/3171 ,  F16M11/123 ,  F16M11/18 ,  H01J37/20 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20278

摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.

摘要翻译： 提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。 可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。 机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。 每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。 每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

公开(公告)号：US08124946B2

公开(公告)日：2012-02-28

申请号：US12477631

申请日：2009-06-03

申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC分类号： H01J37/317 ,  H01J49/30 ,  H01J49/42

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。