公开(公告)号：US10283366B2

公开(公告)日：2019-05-07

申请号：US15284231

申请日：2016-10-03

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Vladimir Dribinski

IPC: H01L21/30 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/95 ,  G01N21/88 ,  H01L21/322 ,  H01S3/02 ,  H01S3/094 ,  H01S3/109 ,  H01S3/16 ,  G01N21/35 ,  G01N21/84

Abstract: A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.

公开(公告)号：US20180108514A1

公开(公告)日：2018-04-19

申请号：US15605308

申请日：2017-05-25

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Yinying Xiao-Li ,  Xuefeng Liu ,  John Fielden

IPC: H01J37/317 ,  H01J37/20 ,  H01J37/244 ,  H01J37/10 ,  H01J37/147 ,  H01J37/04 ,  H01J37/073

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0435

Abstract: A multi-column electron beam device includes an electron source comprising multiple field emitters fabricated on a surface of a silicon substrate. To prevent oxidation of the silicon, a thin, contiguous boron layer is disposed directly on the output surface of the field emitters. The field emitters can take various shapes including a pyramid, a cone, or a rounded whisker. Optional gate layers may be placed on the output surface near the field emitters. The field emitter may be p-type or n-type doped. Circuits may be incorporated into the wafer to control the emission current. A light source may be configured to illuminate the electron source and control the emission current. The multi-column electron beam device may be a multi-column electron beam lithography system configured to write a pattern on a sample.

公开(公告)号：US09935421B2

公开(公告)日：2018-04-03

申请号：US15344383

申请日：2016-11-04

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: H01S3/10 ,  H01S3/30 ,  G02B17/08 ,  H01S3/00 ,  G01N21/95 ,  H01S3/067 ,  H01S3/23 ,  H01S3/16 ,  H01S3/11 ,  G02F1/35 ,  G02F1/39

CPC classification number: H01S3/302 ,  G01N21/9501 ,  G02B17/0892 ,  G02F1/353 ,  G02F1/395 ,  G02F2001/354 ,  H01S3/005 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/06754 ,  H01S3/10053 ,  H01S3/11 ,  H01S3/16 ,  H01S3/1643 ,  H01S3/1666 ,  H01S3/23 ,  H01S3/2308

Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

公开(公告)号：US20170356854A1

公开(公告)日：2017-12-14

申请号：US15671703

申请日：2017-08-08

Applicant: KLA-Tencor Corporation

Inventor： Yujun Deng ,  Yung-Ho Chuang ,  John Fielden

IPC: G01N21/95 ,  G01N21/88 ,  G02F1/39 ,  H01S3/094 ,  G02F1/35 ,  H01S3/00

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G02F1/3534 ,  G02F1/39 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/094015

Abstract: A DUV laser includes an optical bandwidth filtering device, such as etalon, which is disposed outside of the laser oscillator cavity of the fundamental laser, and which directs one range of wavelengths into one portion of a frequency conversion chain and another range of wavelengths into another portion of the frequency conversion train, thereby reducing the bandwidth of the DUV laser output while maintaining high conversion efficiency in the frequency conversion chain.

公开(公告)号：US09660409B2

公开(公告)日：2017-05-23

申请号：US15017839

申请日：2016-02-08

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang

IPC: H01S3/00 ,  G02F1/37 ,  G01N21/95 ,  G02F1/35 ,  G01N21/33 ,  G01N21/956

CPC classification number: H01S3/0092 ,  G01N21/33 ,  G01N21/9501 ,  G01N2021/95676 ,  G01N2201/067 ,  G02F1/35 ,  G02F1/37 ,  G02F2201/16 ,  H01S3/0085

Abstract: A laser for generating deep ultra-violet (DUV) continuous wave (CW) light includes a second-harmonic generator and a fourth-harmonic generator. The fourth-harmonic generator includes a plurality of mirrors as well as a first non-linear optical (NLO) crystal and a pair of tilted plates. The first NLO crystal generates the light having the fourth harmonic wavelength and a first astigmatism, and is placed in operative relation to the plurality of mirrors. The pair of tilted plates is placed in operative relation to the first NLO crystal such that the light having the second harmonic wavelength passes through both of the tilted plates. Notably, the pair of tilted plates are disposed at substantially equal and opposite angles about respective parallel axes such that they introduce a second astigmatism that corrects for the first astigmatism while minimizing displacement of the circulated light.

公开(公告)号：US20170025281A1

公开(公告)日：2017-01-26

申请号：US15284231

申请日：2016-10-03

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Vladimir Dribinski

IPC: H01L21/30 ,  H01S3/109 ,  H01S3/02 ,  H01L21/322 ,  G01N21/88 ,  G01N21/3563 ,  G01N21/95 ,  H01S3/094 ,  H01S3/16

CPC classification number: H01L21/3003 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/3595 ,  G01N2021/8477 ,  G01N2021/8822 ,  G01N2201/06113 ,  H01L21/322 ,  H01S3/027 ,  H01S3/094 ,  H01S3/109 ,  H01S3/1666

Abstract: A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.

Abstract translation: 激光系统包括非线性光学（NLO）晶体，其中NLO晶体在选定的温度范围内退火。 将NLO晶体与氢，氘，含氢化合物或含氘化合物中的至少一种钝化至所选择的钝化水平。 该系统还包括至少一个光源，其中至少一个光源被配置为产生所选波长的光，并且至少一个光源被配置为透射通过NLO晶体的光。 该系统还包括构造成容纳NLO晶体的晶体容纳单元。

公开(公告)号：US09426400B2

公开(公告)日：2016-08-23

申请号：US14096911

申请日：2013-12-04

Applicant: KLA-Tencor Corporation

Inventor： David L. Brown ,  Yung-Ho Chuang ,  Yury Yuditsky

IPC: H04N5/374 ,  H04N5/225 ,  G01N21/956

CPC classification number: H04N5/3742 ,  G01N21/8851 ,  G01N2021/8896 ,  G01N2021/95676 ,  H04N5/2256 ,  H04N5/3743

Abstract: A method of operating an image sensor with a continuously moving object is described. In this method, a timed delay integration mode (TDI-mode) operation can be performed during an extended-time illumination pulse. During this TDI-mode operation, charges stored by pixels of the image sensor are shifted only in a first direction, and track the image motion. Notably, a split-readout operation is performed only during non-illumination. During this split-readout operation, first charges stored by first pixels of the image sensor are shifted in the first direction and second charges stored by second pixels of the image sensor are concurrently shifted in a second direction, the second direction being opposite to the first direction.

Abstract translation: 描述了一种使用连续移动物体操作图像传感器的方法。 在该方法中，可以在扩展时间照明脉冲期间执行定时延迟积分模式（TDI模式）操作。 在该TDI模式操作期间，图像传感器的像素存储的电荷仅在第一方向移动，并且跟踪图像运动。 值得注意的是，仅在非照明期间执行分离读出操作。 在该分离读出操作期间，图像传感器的第一像素存储的第一电荷在第一方向上移动，并且第二方向上的图像传感器的第二像素存储的第二电荷同时移位，第二方向与第一方向相反 方向。

公开(公告)号：US09077862B2

公开(公告)日：2015-07-07

申请号：US14058061

申请日：2013-10-18

Applicant: KLA-Tencor Corporation

Inventor： David L. Brown ,  Yung-Ho Chuang

IPC: H04N7/18 ,  G01N21/95 ,  H04N5/369 ,  G01N21/88 ,  G01N21/956 ,  H04N5/372

CPC classification number: H04N7/18 ,  G01N21/9501 ,  G01N2021/8887 ,  G01N2021/95676 ,  H04N5/3694 ,  H04N5/372

Abstract: An inspection system for inspecting a surface of a wafer/mask/reticle can include a modular array. The modular array can include a plurality of time delay integration (TDI) sensor modules, each TDI sensor module having a TDI sensor and a plurality of localized circuits for driving and processing the TDI sensor. At least one of the localized circuits can control a clock associated with the TDI sensor. At least one light pipe can be used to distribute a source illumination to the plurality of TDI sensor modules. The plurality of TDI sensor modules can be positioned capture a same inspection region or different inspection regions. The plurality of TDI sensor modules can be identical or provide for different integration stages. Spacing of the modules can be arranged to provide 100% coverage of the inspection region in one pass or for fractional coverage requiring two or more passes for complete coverage.

Abstract translation: 用于检查晶片/掩模/掩模版的表面的检查系统可以包括模块阵列。 模块化阵列可以包括多个时间延迟积分（TDI）传感器模块，每个TDI传感器模块具有TDI传感器和用于驱动和处理TDI传感器的多个局部电路。 至少一个局部电路可以控制与TDI传感器相关的时钟。 可以使用至少一个光管来将源照明分配给多个TDI传感器模块。 多个TDI传感器模块可以被定位成捕获相同的检查区域或不同的检查区域。 多个TDI传感器模块可以相同或提供不同的集成阶段。 可以设置模块的间隔，以便在一次通过中提供100％的检查区域覆盖，或者为了完全覆盖而需要两次或更多次通过的分数覆盖。

公开(公告)号：US20140217299A1

公开(公告)日：2014-08-07

申请号：US14242802

申请日：2014-04-01

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Richard W. Solarz ,  David R. Shafer ,  Bin-Ming Benjamin Tsai ,  David L. Brown

IPC: G01N21/95

CPC classification number: G01N21/95 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/068 ,  G03F1/84 ,  G03F7/70616 ,  H05G2/008

Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.

Abstract translation: 对EUV图案化掩模，空白掩模和由EUV图案化掩模生成的图案化晶片的检查需要高倍率和在图像平面上的大视场。 EUV检查系统可以包括指向检查表面的光源，用于检测从被检查表面偏转的光的检测器和用于将来自被检查表面的光引导到检测器的光学配置。 特别地，检测器可以包括多个传感器模块。 另外，光学配置可以包括在小于5米长的光路内提供至少100倍的放大倍数的多个反射镜。 在一个实施例中，光路大约2-3米长。

公开(公告)号：US20140158864A1

公开(公告)日：2014-06-12

申请号：US14096911

申请日：2013-12-04

Applicant: KLA-Tencor Corporation

Inventor： David L. Brown ,  Yung-Ho Chuang ,  Yury Yuditsky

IPC: H04N3/14

CPC classification number: H04N5/3742 ,  G01N21/8851 ,  G01N2021/8896 ,  G01N2021/95676 ,  H04N5/2256 ,  H04N5/3743

Abstract: A method of operating an image sensor with a continuously moving object is described. In this method, a timed delay integration mode (TDI-mode) operation can be performed during an extended-time illumination pulse. During this TDI-mode operation, charges stored by pixels of the image sensor are shifted only in a first direction, and track the image motion. Notably, a split-readout operation is performed only during non-illumination. During this split-readout operation, first charges stored by first pixels of the image sensor are shifted in the first direction and second charges stored by second pixels of the image sensor are concurrently shifted in a second direction, the second direction being opposite to the first direction.

Abstract translation: 描述了一种使用连续移动物体操作图像传感器的方法。 在该方法中，可以在扩展时间照明脉冲期间执行定时延迟积分模式（TDI模式）操作。 在该TDI模式操作期间，图像传感器的像素存储的电荷仅在第一方向移动，并且跟踪图像运动。 值得注意的是，仅在非照明期间执行分离读出操作。 在该分离读出操作期间，图像传感器的第一像素存储的第一电荷在第一方向上移动，并且第二方向上的图像传感器的第二像素存储的第二电荷同时移位，第二方向与第一方向相反 方向。