公开(公告)号：US10192716B2

公开(公告)日：2019-01-29

申请号：US15245911

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Mark A. McCord ,  Richard R. Simmons ,  Rainer Knippelmeyer

IPC: H01J37/244 ,  H01J37/28

Abstract: Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.

公开(公告)号：US20170084421A1

公开(公告)日：2017-03-23

申请号：US15245765

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Richard R. Simmons ,  Doug K. Masnaghetti ,  Rainer Knippelmeyer

IPC: H01J37/04 ,  H01J37/244 ,  H01J37/09 ,  H01J37/22

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/057 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2805

Abstract: Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.

公开(公告)号：US10460905B2

公开(公告)日：2019-10-29

申请号：US15245765

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Richard R. Simmons ,  Doug K. Masnaghetti ,  Rainer Knippelmeyer

IPC: H01J37/244 ,  H01J37/04 ,  H01J37/28 ,  H01J37/317

Abstract: Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.

公开(公告)号：US20170084424A1

公开(公告)日：2017-03-23

申请号：US15272194

申请日：2016-09-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/06 ,  H01J37/153 ,  H01J37/10 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/153 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US20160372304A1

公开(公告)日：2016-12-22

申请号：US15079046

申请日：2016-03-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  G01N23/203 ,  G01N2223/6116 ,  H01J37/10 ,  H01J37/244 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/057 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

Abstract translation: 公开了一种具有改善的图像束稳定性的扫描电子显微镜系统。 该系统包括被配置为产生电子束的电子束源和一组电子 - 光学元件以将至少一部分电子束引导到样品的一部分上。 该系统包括发射体分析器组件。 该系统包括分配器元件，其被配置为将由样品的表面发射的至少一部分二次电子和/或反向散射电子引导到发射体分析器组件。 发射分析器组件被配置成对二次电子和/或后向散射电子中的至少一个进行成像。

公开(公告)号：US20170229279A1

公开(公告)日：2017-08-10

申请号：US15173144

申请日：2016-06-03

Applicant: KLA-Tencor Corporation

Inventor： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC: H01J37/12 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/12 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1207 ,  H01J2237/21 ,  H01J2237/2801 ,  H01J2237/2817

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.