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公开(公告)号:US20220254957A1
公开(公告)日:2022-08-11
申请号:US17614269
申请日:2020-05-19
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Philipp Kreuter , Andreas Biebersdorf , Christoph Klemp , Jens Ebbecke , Ines Pietzonka , Petrus Sundgren
Abstract: In an embodiment a method for manufacturing a semiconductor device include providing a growth substrate, depositing an n-doped first layer, depositing an active region on the n-doped first layer, depositing a second layer onto the active region, depositing magnesium (Mg) in the second layer and subsequently to depositing Mg, depositing zinc (Zn) in the second layer such that a concentration of Zn in the second layer decreases from a first value to a second value in a first area of the second layer adjacent to the active region, the first area being in a range of 5 nm to 200 nm.
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公开(公告)号:US20220238752A1
公开(公告)日:2022-07-28
申请号:US17615487
申请日:2020-05-19
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Jens Ebbecke , Philipp Kreuter , Christoph Klemp , Andreas Biebersdorf , Ines Pietzonka , Petrus Sundgren
IPC: H01L33/00
Abstract: Embodiments provide a method for treating a semiconductor wafer comprising a set of aluminum gallium indium phosphide light emitting diodes (AlGaInP-LEDs) to increase a light generating efficiency of the AlGaInP-LEDs, wherein each AlGaInP-LED includes a core active layer for light generation sandwiched between two outer layers, the core active layer having a central light generating area and a peripheral edge surrounding the central light generating area, wherein the method includes treating the peripheral edge of the core active layer of each AlGaInP-LED with a laser beam thereby increasing a minimum band gap in each peripheral edge to such an extent that, during operation of the AlGaInP-LED, an electron-hole recombination is essentially confined to the central light generating area.
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公开(公告)号:US20170271553A1
公开(公告)日:2017-09-21
申请号:US15532236
申请日:2015-11-25
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Andreas Rudolph , Petrus Sundgren , Ivar Tangring
Abstract: An optoelectronic semiconductor chip is disclosed. In an embodiment the optoelectronic semiconductor chip includes a p-type semiconductor region, an n-type semiconductor region, and an active layer arranged between the p-type semiconductor region and the n-type semiconductor region. The active layer is designed as a multiple quantum well structure, wherein the multiple quantum well structure has a first region of alternating first quantum well layers and first barrier layers and a second region having at least one second quantum well layer and at least one second barrier layer. The at least one second quantum well layer has an electronic band gap (EQW2) that is less than the electronic band gap (EQW1) of the first quantum well layers, and the at least one second barrier layer has an electronic band gap (EB2) that is greater than the electronic band gap (EB1) of the first barrier layers.
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公开(公告)号:US12249672B2
公开(公告)日:2025-03-11
申请号:US17614269
申请日:2020-05-19
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Philipp Kreuter , Andreas Biebersdorf , Christoph Klemp , Jens Ebbecke , Ines Pietzonka , Petrus Sundgren
Abstract: In an embodiment a method for manufacturing a semiconductor device include providing a growth substrate, depositing an n-doped first layer, depositing an active region on the n-doped first layer, depositing a second layer onto the active region, depositing magnesium (Mg) in the second layer and subsequently to depositing Mg, depositing zinc (Zn) in the second layer such that a concentration of Zn in the second layer decreases from a first value to a second value in a first area of the second layer adjacent to the active region, the first area being in a range of 5 nm to 200 nm.
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公开(公告)号:US11764339B2
公开(公告)日:2023-09-19
申请号:US17645637
申请日:2021-12-22
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Andreas Biebersdorf , Laura Kreiner , Stefan Illek , Ines Pietzonka , Petrus Sundgren , Christoph Klemp , Felix Feix , Christian Berger , Ana Kanevce
CPC classification number: H01L33/52 , H01L25/0753 , H01L33/04 , H01L33/502 , H01L33/60 , B60K35/00 , B60K2370/1523
Abstract: The invention relates to various aspects of a μ-LED or a μ-LED array for augmented reality or lighting applications, in particular in the automotive field. The μ-LED is characterized by particularly small dimensions in the range of a few μm.
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公开(公告)号:US20220181308A1
公开(公告)日:2022-06-09
申请号:US17600668
申请日:2020-03-06
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Petrus Sundgren , Andreas Biebersdorf
IPC: H01L25/075 , H01L33/60
Abstract: The invention relates to a composite component made of a plurality of components, a modified sacrificial layer and a common intermediate carrier, in which the components each have a semiconductor body with an active zone, the semiconductor bodies being arranged on the intermediate carrier and being laterally spaced apart from one another by means of isolating trenches. The sacrificial layer is arranged in the vertical direction between the intermediate carrier and the semiconductor bodies, the sacrificial layer having a plurality of retaining elements between the semiconductor bodies and the common intermediate carrier, and the semiconductor bodies being mechanically connected to the intermediate carrier only by means of the retaining elements. The retaining elements are surrounded by cavities in lateral directions. The semiconductor bodies are designed to be detachable from the intermediate carrier, wherein the retaining elements release the semiconductor bodies from the intermediate carrier under mechanical strain or by means of irradiation or by means of etching. The invention further relates to a component having a semiconductor body which is detached from a composite component of this type, and to a method for producing a plurality of components of this type.
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公开(公告)号:US20220102941A1
公开(公告)日:2022-03-31
申请号:US17596642
申请日:2020-07-09
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Martin Hetzl , Petrus Sundgren , Jens Ebbecke , Uwe Strauß
Abstract: In an embodiment, an edge-emitting semiconductor laser diode includes a growth substrate, a semiconductor layer sequence located on the growth substrate, the semiconductor layer sequence having an active layer and an etch stop layer and two facets located opposite each other, wherein the facets bound the semiconductor layer sequence in a lateral direction, wherein the semiconductor layer sequence includes two edge regions adjoining the facets and a central region directly adjoining both edge regions, wherein, within each of the edge regions, a volume fraction of the active layer in the semiconductor layer sequence is smaller than in the central region, wherein the active layer is spaced apart from one facet, wherein a distance of the active layer to the facet varies along a direction parallel to this facet, and wherein the etch stop layer is arranged between the growth substrate and the active layer.
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公开(公告)号:US20210005786A1
公开(公告)日:2021-01-07
申请号:US16499490
申请日:2018-05-17
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Petrus Sundgren , Wolfgang Schmid
Abstract: An optoelectronic component includes first and second semiconductor layers and an active layer that generates electromagnetic radiation, wherein the active layer is disposed between the first and second semiconductor layers, a recess in the first semiconductor layer, a front side provided for coupling out the electromagnetic radiation, a first electrical connection layer and a second electrical connection layer disposed on a rear side opposite the front side, wherein the first electrical connection layer is arranged at least partially in the recess, and a contact zone with a dopant of a second conductivity type different from the first conductivity type, wherein the contact zone adjoins the recess, and the first semiconductor layer and the second semiconductor layer are highly doped to prevent diffusion of the dopant from the contact zone into the first semiconductor layer and diffusion of the dopant from the contact zone into the second semiconductor layer.
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公开(公告)号:US09685584B2
公开(公告)日:2017-06-20
申请号:US15034919
申请日:2014-11-13
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Ivar Tångring , Petrus Sundgren
IPC: H01L33/04 , H01L33/02 , H01L33/30 , H01L33/44 , H01L33/36 , H01L33/58 , H01L33/60 , H01L33/62 , H01L33/50 , H01L33/06
CPC classification number: H01L33/04 , H01L33/02 , H01L33/06 , H01L33/30 , H01L33/36 , H01L33/44 , H01L33/50 , H01L33/58 , H01L33/60 , H01L33/62
Abstract: A radiation-emitting semiconductor device includes a semiconductor body with a semiconductor layer sequence, wherein the semiconductor layer sequence has an active region that generates radiation having a peak wavelength in the near-infrared spectral range and an absorptive region, and the absorption region at least partially absorbs a shortwave radiation component having a cut-off wavelength shorter than the peak wavelength.
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20.
公开(公告)号:US20150357516A1
公开(公告)日:2015-12-10
申请号:US14830616
申请日:2015-08-19
Applicant: OSRAM Opto Semiconductors GmbH
Inventor: Petrus Sundgren , Elmar Baur , Martin Hohenadler , Clemens Hofmann
CPC classification number: H01L33/14 , H01L31/112 , H01L33/02 , H01L33/30 , H01L33/305 , H01L33/382 , H01L33/40 , H01L33/486 , H01L33/60 , H01L2924/0002 , H01L2924/00
Abstract: A light-emitting diode chip includes a semiconductor layer sequence having a phosphide compound semiconductor material. The semiconductor layer sequence contains a p-type semiconductor region, an n-type semiconductor region, and an active layer arranged between the p-type semiconductor region and the n-type semiconductor region. The active region serves to emit electromagnetic radiation. The n-type semiconductor region faces a radiation exit area of the light-emitting diode chip, and the p-type semiconductor region faces a carrier of the light-emitting diode chip. A current spreading layer having a thickness of less than 500 nm is arranged between the carrier and the p-type semiconductor region. The current spreading layer has one or a plurality of p-doped AlxGa1-xAs layers with 0.5
Abstract translation: 发光二极管芯片包括具有磷化物半导体材料的半导体层序列。 半导体层序列包含p型半导体区域,n型半导体区域和布置在p型半导体区域和n型半导体区域之间的有源层。 有源区域用于发射电磁辐射。 n型半导体区域面向发光二极管芯片的辐射出射区域,p型半导体区域面向发光二极管芯片的载体。 在载体和p型半导体区域之间布置有厚度小于500nm的电流扩散层。 电流扩散层具有一个或多个p掺杂的Al x Ga 1-x As层,其具有0.5
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