Abstract:
A calibration method for radiometric imaging systems that relies on an absolute measurement of scene radiance (thereby requiring a baseline measurement of zero radiance), and a shutter assembly for taking the baseline measurement of zero radiance which is operable under cryogenic temperatures as low as 80.5K (−192.65° C.) in vacuums measuring
Abstract:
A method and apparatus for laser light pulse stretching is disclosed which may comprise a beam splitter in the path of a laser output light pulse beam; selected to pass a first percent of the energy of a first input pulse of the laser output light pulse beam along a laser output light pulse beam output path as a first output pulse and to reflect a second percent of the energy of the laser output light pulse beam into a first delayed beam; an optical delay path receiving the first delayed beam and returning the first delayed beam to the beam splitter in an orientation such that a third percent of the first delayed beam is reflected into the output path as a second output pulse and a fourth percent is passed into the optical delay path as a second delayed beam; the optical delay path receiving the second delayed beam and returning the second delayed beam to the beam splitter in an orientation such that the third percent of the second delayed beam is reflected into the output path as a third output pulse and the fourth percent of the second delayed beam is passed into the optical delay path as a third delayed beam; the optical delay path receiving the third delayed beam and returning the third delayed beam to the beam splitter in an orientation such that the third percent of the third delayed beam is reflected into the output path as a fourth output pulse; the first input pulse being a first pulse in a plurality of pulses output from a prior pulse stretcher, each of a plurality of succeeding input pulses comprising the output of the prior pulse stretcher resulting from the stretching of a narrow band laser light output pulse, forming successive first, second, third and fourth output pulses, the combination of which forms a pulse stretcher having an output with TIS of at least 200 ns. The optical delay path may be formed of a plurality of at least eight reflecting mirrors and contained in an elongated enclosure having first and second end plates mounting a first group of at least four of the at least eight reflecting mirrors mounted on the first mounting surface symmetrically about a center axis of the optical delay path and a second group of at least four of the at least eight reflecting mirrors mounted on the second mounting surface symmetrically about the center axis. The mirrors may be staggered in a predefined pattern, e.g., a circular pattern. The delay path may lie in a plurality of planes. The apparatus may be part of a laser system, part of a beam delivery system or an interface between the two.
Abstract:
A closed-loop focusing system and method positions a focusing assembly to a desired positioned. A feedback positioning device, such as a linear encoder, provides an actual or “read” value for the linear movement of the focusing assembly. The desired position is compared to the actual position of the focusing assembly. If the two values are outside of a predetermined tolerance or valid range, then an audible or visual warning will be given. Furthermore, when a laser source is utilized with the focusing system, then laser operation will be prevented where the two values are outside of tolerance.
Abstract:
A blower assembly for circulating gases in a laser chamber. The blower assembly includes a driving assembly operatively engaged to a drive side shaft for rotating a fan assembly. A first bearing assembly supports the drive side shaft. The blower assembly may further include an idle side shaft for supporting the fan assembly and a second bearing assembly circumscribing the idle side shaft. The driving assembly includes a motor disposed over a rotor. The fan assembly includes a pair of hubs supporting a plurality of blades. The first and second bearing assemblies comprise a ceramic compound, such as silicon nitride (Si3N4), and are lubricated with a synthetic oil, such as perfluoropolyalkylether (PFPE).
Abstract:
A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.
Abstract:
A method for applanating an anterior surface of a cornea and coupling the eye to a surgical laser is disclosed. A interface is provided which has a central orifice and top and bottom surfaces. A suction ring is removably coupled to the bottom surface of the interface. The interface is positioned over an operative area of an eye, such that the suction ring comes into proximate contact with the surface of the eye. A suction is applied to the suction ring to stabilize the position of the interface relative to the operative area of the eye. An applanation lens is positioned in proximate contact with the operative area of the eye. Finally, the applanation lens is coupled to the interface to stabilize the position of the lens relative to the operative area of the eye.
Abstract:
The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation. In other embodiments the gas flow between the electrodes is increased sufficiently to permit 10,000 Hz operation with a discharge region width of 3 mm. To provide these substantial increased gas flow rates, Applicants have disclosed preferred embodiments utilize tangential forms of the prior art but with improved and more powerful motors and novel bearing designs. New bearing designs include both ceramic bearings and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided with a blower located outside the laser chamber. The outside blower can be located in the laser cabinet or in separate location.
Abstract:
The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.
Abstract translation:本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。 本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。 实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲,平均输出脉冲强度大于1.75×6 /瓦/ cm 2,并且与 与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比,数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。 公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。 本说明书中描述的重要改进已分为以下主题类别:(1)由申请人发现的CaF 2 2表面损伤的解决方案,(2)高功率ArF MOPA激光系统的描述( 3)光束传输单元的描述,(4)偏振考虑(5)高速水冷自动快门能量检测器模块和(6)其他改进。