-
公开(公告)号:US06904073B2
公开(公告)日:2005-06-07
申请号:US10384967
申请日:2003-03-08
申请人: Thomas A. Yager , William N. Partio , Richard L. Sandstrom , Xiaojiang Pan , John T. Melchior , John Martin Algots , Matthew Ball , Alexander I. Ershov , Vladimir Fleurov , Walter D. Gillespie , Holger K. Glatzel , Leonard Lublin , Elizabeth Marsh , Richard G. Morton , Richard C. Ujazdowski , David J. Warkentin , R. Kyle Webb
发明人: Thomas A. Yager , William N. Partio , Richard L. Sandstrom , Xiaojiang Pan , John T. Melchior , John Martin Algots , Matthew Ball , Alexander I. Ershov , Vladimir Fleurov , Walter D. Gillespie , Holger K. Glatzel , Leonard Lublin , Elizabeth Marsh , Richard G. Morton , Richard C. Ujazdowski , David J. Warkentin , R. Kyle Webb
IPC分类号: G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号: H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.
摘要翻译: 本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。 本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。 实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲,平均输出脉冲强度大于1.75×6 /瓦/ cm 2,并且与 与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比,数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。 公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。 本说明书中描述的重要改进已分为以下主题类别:(1)由申请人发现的CaF 2 2表面损伤的解决方案,(2)高功率ArF MOPA激光系统的描述( 3)光束传输单元的描述,(4)偏振考虑(5)高速水冷自动快门能量检测器模块和(6)其他改进。
-
公开(公告)号:US06704339B2
公开(公告)日:2004-03-09
申请号:US10233253
申请日:2002-08-30
申请人: Leonard Lublin , David J. Warkentin , Palash P. Das , Brian C. Klene , R. Kyle Webb , Herve A. Besaucele , Ronald L. Spangler , Richard L. Sandstrom , Alexander I. Ershov , Shahryar Rokni
发明人: Leonard Lublin , David J. Warkentin , Palash P. Das , Brian C. Klene , R. Kyle Webb , Herve A. Besaucele , Ronald L. Spangler , Richard L. Sandstrom , Alexander I. Ershov , Shahryar Rokni
IPC分类号: H01S3101
CPC分类号: H01S3/005 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.
摘要翻译: 本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。 该系统包括具有光束指向控制的封闭和清除的光束路径,用于将激光束传送到期望的位置,例如生产线机器的入口。 在优选实施例中,生产线机器是光刻机,并且提供两个单独的放电室,其中之一是主振荡器的一部分,其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比,脉冲放大器使输出脉冲长度加倍,导致脉冲功率(mJ / ns)的降低。 该优选实施例能够在光刻系统晶片平面处提供照明,其在光刻系统的整个使用寿命期间大致恒定,尽管光学部件的实质性劣化。
-
公开(公告)号:US06563128B2
公开(公告)日:2003-05-13
申请号:US10074059
申请日:2002-02-11
IPC分类号: G01N2186
CPC分类号: F16F15/02 , F16F15/005 , F16F15/0275 , F16F2230/08 , G03F7/70725 , G03F7/70825 , G03F7/70833 , G03F7/709
摘要: A system that provides a base stabilization system for controlling motion of a controlled structure. The system includes a ground structure such as the floor of a fabrication facility and the controlled structure includes a base on which equipment is mounted. The system also includes at least three air mounts and a plurality of actuators all attached to the ground structure and to the base to isolate the base from the ground structure and to stabilize the base. The system includes a plurality of position and acceleration sensors each of which are co-located with a corresponding actuator. The system also includes a multi-input, multi output feedback control system comprising a computer processor programmed with a feedback control algorithm for controlling each of the actuators based on feedback signals from each of the sensors. The co-location of the sensors with the actuators avoids serious problems resulting from higher order vibration modes.
摘要翻译: 提供用于控制受控结构的运动的基本稳定系统的系统。 该系统包括诸如制造设备的底板的接地结构,并且受控结构包括安装设备的基座。 该系统还包括至少三个空气支架和多个致动器,所述致动器全部附接到地面结构和底座以将基座与地面结构隔离并稳定基座。 该系统包括多个位置和加速度传感器,每个位置和加速度传感器与相应的致动器共同定位。 该系统还包括多输入多输出反馈控制系统,其包括用基于来自每个传感器的反馈信号控制每个致动器的反馈控制算法编程的计算机处理器。 传感器与执行器的共同位置避免了由较高阶振动模式引起的严重问题。
-
公开(公告)号:US06791098B2
公开(公告)日:2004-09-14
申请号:US09803320
申请日:2001-03-09
申请人: Baruch Pletner , Richard Perkins , Leonard Lublin
发明人: Baruch Pletner , Richard Perkins , Leonard Lublin
IPC分类号: G01N2186
CPC分类号: G03F7/70725 , F16F15/005 , F16F15/02 , F16F15/0275 , F16F2230/08 , G03F7/70825 , G03F7/70833 , G03F7/709 , G05D19/02 , H04R17/08
摘要: A multi-input, multi-output vibration control system for a lithography system. The system provides an actuator, and a sensor useful for controlling vibrations in systems for fabricating electronics equipment. The system includes a processor programmed with a multi-input, multi-output control technique such as a linear quadratic Gaussian, H-infinity or mu synthesis. The actuator may comprise one or more plates or elements of electroactive material bonded to an electroded sheet.
摘要翻译: 一种用于光刻系统的多输入多输出振动控制系统。 该系统提供致动器和用于控制用于制造电子设备的系统中的振动的传感器。 该系统包括用多输入多输出控制技术编程的处理器,例如线性二次高斯,H无限或mu合成。 致动器可以包括结合到电镀片材上的电活性材料的一个或多个板或元件。
-
-
-