公开(公告)号：US08723144B2

公开(公告)日：2014-05-13

申请号：US11119230

申请日：2005-04-28

Applicant: Eitan Kidron ,  Dror Shemesh

Inventor： Eitan Kidron ,  Dror Shemesh

IPC: H01J37/08

CPC classification number: G01N1/32 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An apparatus is disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a means is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

Abstract translation: 公开了一种用于形成物体样品的装置，从物体中提取样品，并对该样品进行微量分析，包括真空室中的表面分析和电子透过度分析。 在一些实施例中，提供了用于对提取的样品的物体横截面进行成像的装置。 任选地，将样品迭代地稀释并在真空室内成像。 在一些实施例中，样品位于包括任选孔的样品支架上。 可选地，样品位于样品载体的表面上，使得物体横截面基本上平行于样品载体的表面。 一旦安装在样品支架上，样品就可以在真空室中进行微量分析，或者加载到装载站上。 在一些实施例中，用基本上正常地入射到物体横截面表面的电子束成像样品。

公开(公告)号：US07838830B2

公开(公告)日：2010-11-23

申请号：US11923407

申请日：2007-10-24

Applicant: Juergen Frosien ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

Inventor： Juergen Frosien ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

IPC: G01N23/00

CPC classification number: H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/2448 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

Abstract translation: 提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。 偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。 检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。

公开(公告)号：US07659506B2

公开(公告)日：2010-02-09

申请号：US11861206

申请日：2007-09-25

Applicant: Michal Avinun-Kalish ,  Jacob Levin ,  Dror Shemesh

Inventor： Michal Avinun-Kalish ,  Jacob Levin ,  Dror Shemesh

IPC: G01N23/22

CPC classification number: G01N23/2202 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/245 ,  H01J2237/2802 ,  H01J2237/2803 ,  H01J2237/31745

Abstract: A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed. A system and method for inspecting a thin sample, the method includes: A method for inspecting a thin sample, the method comprising: illuminating, by a charged particle beam, a tilted upper portion of a thin sample that is connected, via a milled intermediate section, to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed; and collecting particles and photons resulting from the illumination.

Abstract translation: 一种用于产生薄样品的系统和方法，所述方法包括：铣削薄样品的中间部分，使得薄样品的上部相对于薄样品的下部倾斜; 其中下部连接到形成薄样品的晶片。 一种用于检查薄样品的系统和方法，所述方法包括：一种用于检查薄样品的方法，所述方法包括：通过带电粒子束照射经过研磨的中间体连接的薄样品的倾斜上部分 到薄样品的下部; 其中所述下部连接到形成所述薄样品的晶片; 并收集由照明产生的颗粒和光子。

公开(公告)号：US20090078867A1

公开(公告)日：2009-03-26

申请号：US11861206

申请日：2007-09-25

Applicant: Michal Avinun-Kalish ,  Jacob Levin ,  Dror Shemesh

Inventor： Michal Avinun-Kalish ,  Jacob Levin ,  Dror Shemesh

IPC: H01J37/26

CPC classification number: G01N23/2202 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/245 ,  H01J2237/2802 ,  H01J2237/2803 ,  H01J2237/31745

Abstract: A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed. A system and method for inspecting a thin sample, the method includes: A method for inspecting a thin sample, the method comprising: illuminating, by a charged particle beam, a tilted upper portion of a thin sample that is connected, via a milled intermediate section, to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed; and collecting particles and photons resulting from the illumination.

Abstract translation: 一种用于产生薄样品的系统和方法，所述方法包括：铣削薄样品的中间部分，使得薄样品的上部相对于薄样品的下部倾斜; 其中下部连接到形成薄样品的晶片。 一种用于检查薄样品的系统和方法，所述方法包括：一种用于检查薄样品的方法，所述方法包括：通过带电粒子束照射通过研磨的中间体连接的薄样品的倾斜上部 到薄样品的下部; 其中所述下部连接到形成所述薄样品的晶片; 并收集由照明产生的颗粒和光子。

公开(公告)号：US07365320B2

公开(公告)日：2008-04-29

申请号：US10530178

申请日：2003-10-08

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/153 ,  G01N23/00 ,  G21K7/00

CPC classification number: G01N23/2252

Abstract: Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions include a system and method for process monitoring that analyze a cavity before being filled and then analyze emitted X-rays from the cavity after the cavity has been filled with a conductive material. Also included are system and methods for process monitoring that apply a quantitative analysis correction technique on detected X-ray emissions.

Abstract translation: 基于由诸如电子或离子的带电粒子束引起的X射线发射的过程监测的系统和方法包括用于过程监测的系统和方法，其在填充之前分析空腔，然后分析来自腔的发射的X射线 空腔已经填充有导电材料。 还包括用于过程监测的系统和方法，其应用定量分析校正技术检测X射线发射。

公开(公告)号：US07271396B2

公开(公告)日：2007-09-18

申请号：US10492574

申请日：2002-10-04

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，光束被消除到光圈的两个边缘。 根据获得消光所需的信号，计算校正偏转场。 Furter提供了一种用于将带电粒子束自动对准光轴的方法。 从而引入散焦，并将基于引入的图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正像散的方法。 因此，对于在将信号改变为瞄准器的同时测量的帧序列来评估锐度。

公开(公告)号：US20070114404A1

公开(公告)日：2007-05-24

申请号：US11532465

申请日：2006-09-15

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: G21K7/00

CPC classification number: H01J37/28 ,  H01J2237/057

Abstract: A method for detecting hidden defects and patterns, the method includes: receiving an object that comprises an opaque layer positioned above an intermediate layer; defining an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illuminating the object with a primary electron beam; and generating images from electrons that arrive to a spectrometer having an energy within the energy band. A scanning electron microscope that includes a stage for supporting an object that comprises an opaque layer positioned above an intermediate layer; a controller, adapted to receive or define an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illumination optics adapted to illuminate the object with a primary electron beam; an electron spectrometer, controlled by the controller such as to selectively reject electrons in response to the defined energy band; and a processor, coupled to the spectrometer, adapted to generate images from detection signals provided by the spectrometer.

Abstract translation: 一种用于检测隐藏的缺陷和图案的方法，所述方法包括：接收包含位于中间层上方的不透明层的对象; 响应于不透明层的至少一个特性和扫描电子显微镜的至少一个特征限定能带; 用一次电子束照射物体; 以及从到达具有能带内的能量的光谱仪的电子产生图像。 一种扫描电子显微镜，其包括用于支撑物体的台，所述台包括位于中间层上方的不透明层; 控制器，适于响应于所述不透明层的至少一个特性和扫描电子显微镜的至少一个特性接收或限定能带; 适于用一次电子束照射物体的照明光学器件; 由控制器控制的电子光谱仪，以便响应于限定的能带选择性地拒绝电子; 以及耦合到所述光谱仪的处理器，适于从由所述光谱仪提供的检测信号产生图像。

公开(公告)号：US20070090288A1

公开(公告)日：2007-04-26

申请号：US11533306

申请日：2006-09-19

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/28

CPC classification number: H01J37/28 ,  H01J2237/057 ,  H01J2237/2814

Abstract: A method for improving the resolution of a scanning electron microscope, the method includes: defining an energy band in response to an expected penetration depth of secondary electrons in an object; illuminating the object with a primary electron beam; and generating images from electrons that arrive to a spectrometer having an energy within the energy band. A scanning electron microscope that includes: a stage for supporting an object; a controller, adapted to receive or define an energy band an energy band in response to an expected penetration depth of secondary electrons in an object; illumination optics adapted to illuminate the object with a primary electron beam; a spectrometer, controlled by the controller such as to selectively reject electrons in response to the defined energy band; and a processor that is adapted to generate images from detection signals provided by the spectrometer.

Abstract translation: 一种用于提高扫描电子显微镜的分辨率的方法，所述方法包括：响应于物体中二次电子的预期穿透深度来定义能带; 用一次电子束照射物体; 以及从到达具有能带内的能量的光谱仪的电子产生图像。 一种扫描电子显微镜，包括：用于支撑物体的台; 控制器，适于响应于物体中二次电子的预期穿透深度而接收或限定能带的能带; 适于用一次电子束照射物体的照明光学器件; 由控制器控制的光谱仪，以便响应于限定的能带选择性地拒绝电子; 以及适于根据由该光谱仪提供的检测信号产生图像的处理器。

公开(公告)号：US20060054814A1

公开(公告)日：2006-03-16

申请号：US10502104

申请日：2003-10-22

Applicant: Dror Shemesh ,  Pavel Adamec

Inventor： Dror Shemesh ,  Pavel Adamec

IPC: G21K7/00

CPC classification number: H01J37/244 ,  G01N23/2251 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: A system and method for multi detector detection of electrons, the method includes the steps of directing a primary electron beam, through a column, to interact with an inspected object, directing, by introducing a substantial electrostatic field, electrons reflected or scattered from the inspected objects towards multiple interior detectors, whereas at least some of the directed electrons are reflected or scattered at small angle in relation to the inspected object; and receiving detection signals from at least one interior detector.

Abstract translation: 一种用于电子的多检测器检测的系统和方法，该方法包括以下步骤：通过列引导一次电子束与检测对象相互作用，通过引入实质的静电场来引导从检查的反射或散射的电子 物体朝向多个内部检测器，而至少一些定向电子相对于被检查物体以小角度反射或散射; 以及从至少一个内部检测器接收检测信号。

公开(公告)号：US06894294B2

公开(公告)日：2005-05-17

申请号：US10600886

申请日：2003-06-19

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: B08B7/00 ,  H01L21/306 ,  G21G5/00

CPC classification number: H01L21/02046 ,  B08B7/00 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31747

Abstract: A system and method for reducing ion contamination in an object, the ion contamination introduced by a contaminating ion beam milling step. The system includes means for defining a suspected ion contaminated area; and means for removing the suspected ion contaminated area by a non-contaminating process, which usually involves directing an electron beam towards the removed area while allowing the beam to interact with additional material. The method includes the steps of defining a suspected ion contaminated area; and removing the suspected ion contaminated area by non-contaminating process.

Abstract translation: 用于减少物体中的离子污染的系统和方法，通过污染离子束研磨步骤引入的离子污染物。 该系统包括用于定义可疑离子污染区域的装置; 以及用于通过非污染过程去除可疑离子污染区域的装置，其通常涉及将电子束引向去除区域，同时允许光束与附加材料相互作用。 该方法包括确定可疑离子污染区域的步骤; 并通过非污染过程去除可疑的离子污染区域。