公开(公告)号：US20220334476A1

公开(公告)日：2022-10-20

申请号：US17591943

申请日：2022-02-03

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Aina Ushiyama ,  Akiyoshi Goto ,  Michihiro Shirakawa ,  Keita Kato ,  Kazuhiro Marumo ,  Hironori Oka

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C311/51 ,  C07C311/48 ,  C07C309/12 ,  C07C309/17

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a specific compound, in which the specific compound has two or more cationic moieties and the same number of anionic moieties as that of the cationic moieties, and at least one of the cationic moieties has a group represented by General Formula (I).

公开(公告)号：US20210286263A1

公开(公告)日：2021-09-16

申请号：US17320364

申请日：2021-05-14

Applicant: FUJIFILM Corporation

Inventor： Naohiro TANGO ,  Masafumi KOJIMA ,  Minoru UEMURA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin A having polarity that increases by an action of an acid; one or more resins B selected from the group consisting of a resin B1 including a fluorine atom and having polarity that increases by the action of an acid, a resin B2 including a fluorine atom and having polarity that increases by the action of an alkali, and a resin B3 including a fluorine atom and having polarity that increases by any of an action of an acid and an action of an alkali; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III), provided that the resin B1 to the resin B3 include no repeating unit including an ion-bonding group.

公开(公告)号：US20190294042A1

公开(公告)日：2019-09-26

申请号：US16432043

申请日：2019-06-05

Applicant: FUJIFILM Corporation

Inventor： Keita KATO ,  Kyohei SAKITA ,  Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Masafumi KOJIMA

IPC: G03F7/038 ,  G03F7/004

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which satisfies a relational expression represented by a specific formula in a case where an exposure latitude is represented by EL and an normalized image log slope is represented by NILS, in which the actinic ray-sensitive or radiation-sensitive resin composition can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern (for example, a contact hole pattern having a hole diameter of 45 nm or less, or a line-and-space pattern having a line width of 45 nm or less); and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20170199455A1

公开(公告)日：2017-07-13

申请号：US15470003

申请日：2017-03-27

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Akiyoshi GOTO ,  Akinori SHIBUYA ,  Keita KATO ,  Keiyu OU

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/16 ,  H01L21/027 ,  G03F7/38 ,  G03F7/09 ,  G03F7/32 ,  G03F7/30 ,  C08F220/18 ,  G03F7/20

CPC classification number: G03F7/038 ,  C08F220/12 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/3021 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  H01L21/0274 ,  H01L21/0276

Abstract: The present invention has an object to provide a method for forming a negative tone pattern in which DOF of a resist composition used is high and shrinkage of a film in post exposure bake is suppressed; a method for manufacturing an electronic device including the pattern forming method; and an active-light-sensitive or radiation-sensitive resin composition. The method for forming a negative tone pattern of the present invention including: a film formation step of forming a resist film on a substrate, using a resist composition; an exposing step of irradiating the film with active light or radiation; a heating treatment step of performing a heating treatment on the film irradiated with active light or radiation; and a developing step of developing the heating-treated film using a developer including an organic solvent, in which the resist composition includes a resin A having a repeating unit A with a group represented by a specific formula, a resin B having a repeating unit B with a group represented by a specific formula, and a compound that generates an acid upon irradiation with active light or radiation.

公开(公告)号：US20160347897A1

公开(公告)日：2016-12-01

申请号：US15234489

申请日：2016-08-11

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi GOTO ,  Masafumi KOJIMA ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Keiyu OU

IPC: C08F224/00 ,  G03F7/32 ,  G03F7/20 ,  C08F220/68 ,  G03F7/038

CPC classification number: G03F7/0397 ,  C08F22/10 ,  C08F220/68 ,  C08F224/00 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/2053 ,  G03F7/26 ,  G03F7/30 ,  G03F7/325

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.

Abstract translation: 本发明提供一种焦点宽度大的光化射线敏感性或辐射敏感性树脂组合物，即使形成微细图案，也抑制图案的塌陷。 图案形成方法，电子装置制造方法和使用该组合物的电子装置。 该光化射线敏感性或辐射敏感性树脂组合物含有包含具有通过通式（1）表示的酸的作用而分解的自由基的重复单元（i）的树脂（P）。

公开(公告)号：US20160327866A1

公开(公告)日：2016-11-10

申请号：US15216777

申请日：2016-07-22

Applicant: FUJIFILM Corporation

Inventor： Hajime FURUTANI ,  Michihiro SHIRAKAWA ,  Akiyoshi GOTO ,  Masafumi KOJIMA

IPC: G03F7/16

CPC classification number: G03F7/16 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/26 ,  G03F7/325 ,  G03F7/38

Abstract: A pattern forming method includes, in this order: a step (1) of forming a film on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition containing at least a resin having a group that is decomposed due to an action of an acid so as to generate a polar group; a step (2) of exposing the film; a step (3) of causing the exposed film to come into contact with a component that performs any one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction with a polar group generated in the exposed film without substantially dissolving the exposed film; and a step (4) of forming a pattern by developing the exposed film by using a developer including an organic solvent and removing an area of the film having a small exposure amount.

Abstract translation: 图案形成方法依次包括：通过使用至少含有具有由于作用分解的基团的树脂的光化射线敏感或辐射敏感性树脂组合物在基材上形成膜的步骤（1） 的酸，以产生极性基团; 曝光胶片的步骤（2）; 使暴露的膜与在暴露的膜中产生的极性基团进行离子键，氢键，化学键和偶极相互作用的任何一个相互作用的组分接触的步骤（3） 溶解曝光胶片; 以及通过使用包含有机溶剂的显影剂使曝光的膜显影并除去具有小曝光量的膜的区域来形成图案的步骤（4）。

公开(公告)号：US20150338736A1

公开(公告)日：2015-11-26

申请号：US14751669

申请日：2015-06-26

Applicant: FUJIFILM CORPORATION

Inventor： Takeshi KAWABATA ,  Hiroo TAKIZAWA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Keita KATO

IPC: G03F7/004 ,  C07C309/17 ,  C07D333/48 ,  C07D335/02 ,  C07D327/06 ,  C07C309/12 ,  C07D217/06 ,  G03F7/20 ,  C07D333/76

CPC classification number: G03F7/0045 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/29 ,  C07C311/48 ,  C07C317/04 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D217/06 ,  C07D295/185 ,  C07D327/06 ,  C07D333/46 ,  C07D333/48 ,  C07D333/76 ,  C07D335/02 ,  C07J9/005 ,  C07J17/00 ,  C07J31/006 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.)

Abstract translation: 本发明提供一种包含树脂（A）和下述通式（I）的任何化合物（B））的光化射线或辐射敏感性树脂组合物。 （通式（I）中，Rf表示氟原子或含有至少一个氟原子的一价有机基团; R1表示氢原子或不含氟原子的一价取代基; X1表示具有至少2个碳原子的1价有机基团 原子或其中任选地引入除氟原子以外的取代基的甲基，条件是X1可以与R 1键合，从而形成环; Z表示当暴露于光化射线或辐射时被转化为 磺酸基，亚氨基酸基或甲基酸基）。

公开(公告)号：US20240329524A1

公开(公告)日：2024-10-03

申请号：US18737794

申请日：2024-06-07

Applicant: FUJIFILM Corporation

Inventor： Aina SHIBUYA ,  Minoru UEMURA ,  Akihiro KANEKO ,  Masafumi KOJIMA ,  Akiyoshi GOTO

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: a compound (N) having an anion and a cation represented by a formula (N1) below, and a resin (A) that is decomposed by an action of an acid to provide increased polarity,




wherein, in the formula (N1), RN1, RN2, and RN3 each independently represent a specified group, k1 to k6 each independently represents a specified integer, a plurality of RN1's may be the same or different, RN4, RN5, and RN6 each independently represent a specified substituent, and at least two among the aromatic rings in the formula (N1) may be bonded together via a single bond or a linking group.

公开(公告)号：US20230375925A1

公开(公告)日：2023-11-23

申请号：US18356701

申请日：2023-07-21

Applicant: FUJIFILM Corporation

Inventor： Tsutomu YOSHIMURA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Yuma KURUMISAWA

IPC: G03F7/029

CPC classification number: G03F7/029

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin which has a repeating unit derived from a compound represented by Formula (1) as defined herein; and (B) a compound which generates an acid by irradiation with an actinic ray or a radiation. The present invention also provides an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, a method for manufacturing an electronic device, a compound and a resin.

公开(公告)号：US20230185192A1

公开(公告)日：2023-06-15

申请号：US18157899

申请日：2023-01-23

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi GOTO ,  Masafumi KOJIMA ,  Michihiro SHIRAKAWA

IPC: G03F7/039 ,  C08F220/18 ,  G03F7/038

CPC classification number: G03F7/0395 ,  C08F220/1811 ,  G03F7/0382 ,  C08F2800/20

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition by which a pattern having excellent LWR performance can be formed. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including a resin of which polarity increases through decomposition by the action of an acid, and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (1) as a repeating unit having an acid-decomposable group, and the compound that generates an acid upon irradiation with actinic rays or radiation includes any one or more of a compound (I) or a compound (II).