Charged particle beam apparatus and automatic astigmatism adjustment method
    21.
    发明授权
    Charged particle beam apparatus and automatic astigmatism adjustment method 有权
    带电粒子束装置和自动散光调节方法

    公开(公告)号:US07348558B2

    公开(公告)日:2008-03-25

    申请号:US11404610

    申请日:2006-04-13

    IPC分类号: G01N23/00

    摘要: According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

    摘要翻译: 根据本发明,用于自动调整带电粒子束装置中的像散的技术。 根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法,其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点 来自相对较少数量的二维图像的单一操作。 具体实施例可以执行这种自动聚焦,同时最小化对受试样品造成的损害。 实施例包括用于通过使用带电粒子束来进行检查,测量和以相对高的精度制造的带电粒子光学系统。

    Charged particle beam apparatus and automatic astigmatism adjustment method
    22.
    发明授权
    Charged particle beam apparatus and automatic astigmatism adjustment method 有权
    带电粒子束装置和自动散光调节方法

    公开(公告)号:US07030394B2

    公开(公告)日:2006-04-18

    申请号:US10980096

    申请日:2004-11-02

    IPC分类号: G01B11/00

    摘要: According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

    摘要翻译: 根据本发明,用于自动调整带电粒子束装置中的像散的技术。 根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法,其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点 来自相对较少数量的二维图像的单一操作。 具体实施例可以执行这种自动聚焦,同时最小化对受试样品造成的损害。 实施例包括用于通过使用带电粒子束来进行检查,测量和以相对高的精度制造的带电粒子光学系统。

    Inspection method and inspection apparatus using electron beam
    23.
    发明申请
    Inspection method and inspection apparatus using electron beam 失效
    使用电子束的检查方法和检查装置

    公开(公告)号:US20060076490A1

    公开(公告)日:2006-04-13

    申请号:US11234313

    申请日:2005-09-26

    IPC分类号: G21K7/00

    摘要: An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.

    摘要翻译: 使用电子束的检查方法和检查装置能够在高通量水平下进行更详细和定量的评估。 该方法包括以预定间隔以电子束多次照射预先准备的关于样品表面上的缺陷位置的信息,缺陷及其附近的信息的步骤; 通过电子束检测从样品表面二次产生的电子信号; 对由先前指定的第n或更晚的电子束照射检测的电子信号成像; 并且通过基于电子束图像信息监测样品表面的电荷弛豫状态,根据电荷弛豫程度来测量样品表面的缺陷部分的电阻或泄漏量。

    Electron beam inspection system and an image generation method for an electron beam inspection system
    28.
    发明授权
    Electron beam inspection system and an image generation method for an electron beam inspection system 失效
    电子束检查系统和电子束检查系统的图像生成方法

    公开(公告)号:US08086022B2

    公开(公告)日:2011-12-27

    申请号:US12179272

    申请日:2008-07-24

    IPC分类号: G06K9/00 G06K9/40 G01N23/00

    摘要: An inspection system uses a scanning electron microscope that detects a high-precision electron beam image, and at the same time removes restrictions for a low sampling rate. A sampled signal is obtained by sampling an analog brightness signal generated by a secondary electron detector at a predetermined sampling rate, and contiguous digital values contained in the sampled signal are added on an N by N digital value basis to generate a digital brightness signal whose frequency is equal to 1/N of the sampling frequency. Each, digital value contained in the digital brightness signal is divided by N to generate a digital signal made of digital values having a number of bits equal to that of the sampled signal and to generate an image signal in which each digital value of the digital signal forms one pixel data.

    摘要翻译: 检查系统使用检测高精度电子束图像的扫描电子显微镜,同时消除对低采样率的限制。 通过以预定的采样率对由二次电子检测器产生的模拟亮度信号进行采样来获得采样信号,并且以N×N数值为基础相加在采样信号中包含的连续数字值,以产生数字亮度信号,其频率 等于采样频率的1 / N。 将包含在数字亮度信号中的每个数字值除以N,以产生由具有与采样信号的位数相等的位数的数字值构成的数字信号,并产生其中数字信号的每个数字值 形成一个像素数据。

    Inspection apparatus and inspection method using electron beam
    29.
    发明授权
    Inspection apparatus and inspection method using electron beam 有权
    使用电子束的检查装置和检查方法

    公开(公告)号:US07999565B2

    公开(公告)日:2011-08-16

    申请号:US12348586

    申请日:2009-01-05

    IPC分类号: G01R31/305

    摘要: A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed.

    摘要翻译: 公开了使用扫描电子显微镜的目视检查装置和方法。 在样品上重复扫描电子束,并且由从样品或反射电子产生的二次电子产生检查和参考图像。 根据检查图像与参考图像之间的差分图像,确定缺陷。 可以改变沿电子束的重复扫描方向产生的图像中的像素数。

    CHARGED PARTICLE BEAM DEVICE
    30.
    发明申请
    CHARGED PARTICLE BEAM DEVICE 有权
    充电颗粒光束装置

    公开(公告)号:US20110163230A1

    公开(公告)日:2011-07-07

    申请号:US13061031

    申请日:2009-08-28

    IPC分类号: G01N23/04

    摘要: There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format.

    摘要翻译: 提供了一种使用带电粒子束的衬底检查装置,并且能够比以前更快地提取缺陷候选物。 基板检查装置的结构使得具有电路图案的基板被初级带电粒子束照射,基板以恒定速度或增加或降低的速度移动,监视由运动产生的位置 ,根据基板的坐标来控制与初级带电粒子束的照射位置,以低于移动速度的速度捕获基板上的部分区域中的图像,基于 捕获的图像和检测到的缺陷候选以地图格式显示。