摘要:
Methods of fabricating a base layer circuit structure are provided. One fabrication method includes: providing an alignment carrier having a support surface; forming a plurality of electrically conductive structures above the support surface of the alignment carrier; disposing a structural material around and physically contacting the side surfaces of the electrically conductive structures formed above the support surface, the structural material having an upper surface coplanar with or parallel to the upper surface of one or more of the electrically conductive structures; exposing, if covered, the upper surfaces of the electrically conductive structures to facilitate electrical connection to the structures; and separating the alignment carrier from the base layer circuit structure. The base layer circuit structure includes the plurality of electrically conductive structures and the structural material surrounding and physically contacting the electrically conductive structures.
摘要:
Stackable circuit structures and methods of fabrication are provided employing first level metallization directly on a chips-first layer(s), which includes: a chip(s), each with a pad mask over its upper surface and openings exposing its contact pads; electrically conductive structures; and structural dielectric material surrounding the side surfaces of the chips and the conductive structures. Each chips-first layer further includes a metallization layer on the front surface of the layer, residing at least partially on the pad mask and extending over an edge of the chip. Together, the pad mask and the structural material electrically isolate the metallization layer from the chip. Input/output interconnect structures physically and electrically contact the metallization layer over the front surface and/or the lower surfaces of the electrically conductive structures at the back surface of the chips-first layer, to facilitate input/output connection to chips of the layers in a stack.
摘要:
Electronic modules and methods of fabrication are provided implementing a first metallization level directly on a chips-first chip layer. The chips-first layer includes chips, each with a pad mask over an upper surface and openings to expose chip contact pads. Structural dielectric material surrounds and physically contacts the side surfaces of the chips, and has an upper surface which is parallel to an upper surface of the chips. A metallization layer is disposed over the front surface of the chips-first layer, residing at least partially on the pad masks of the chips, and extending over one or more edges of the chips. Together, the pad masks of the chips, and the structural dielectric material electrically isolate the metallization layer from the edges of the chips, and from one or more electrical structures of the chips in the chips-first layer.
摘要:
Structures and methods are provided for electrically interconnecting and absorbing stress between a first electrical structure and a second electrical structure. In one embodiment, non-conductive compliant bumps are disposed on at least one of the structures and a metal layer is provided over a surface of the non-conductive compliant bumps. The metal layer facilitates electrical coupling of the metal on the surfaces of the compliant bumps with multiple contact pads of the structure supporting the bumps. The non-conductive compliant bumps can be fabricated of a low modulus material which has a high ultimate elongation property (LMHE dielectric). The LMHE dielectric can have a Young's modulus of less than 50,000 psi and an ultimate elongation property of at least twenty percent. In an alternate embodiment, at least one mushroom-shaped conductive bump is disposed above a compliant dielectric layer on one of the first electrical structure or the second electrical structure. The mushroom-shaped conductive bumps are employed to electrically interconnect the first and second electrical structures. The compliant dielectric layer can be a LMHE dielectric.
摘要:
A piezoelectric relay requiring less piezoelectric material than conventional piezoelectric relays is disclosed. The relay differs from conventional relays in that the contacts are touching with essentially no force applied between the contacts when no power is applied to the relay.
摘要:
An area saving dielectrically isolated semiconductor structure is disclosed which allows for the merger of a plurality of active devices, which share a common terminal, in a single dielectrically isolated (DI) island, or tub. In particular, an isolation groove is formed in the bottom of the DI tub and extends upwards toward the top surface of the semiconductor structure. The common diffusion region associated with the common terminal is located in the DI tub directly over the isolation groove. The isolation groove and common diffusion region thus separate the single DI tub into isolated sections, where a separate active device can be formed in each section. Isolation is achieved through the interaction of the groove with the common diffusion region to "pinch off" the conductive channel between devices in the DI tub. In a preferred embodiment, an inverted V-shaped isolation groove is utilized so as not to complicate the fabrication process. In order to merge a large plurality of devices in a single DI tub, a plurality of isolation grooves may be utilized to divide the single DI tub into a number of separate isolated sections.
摘要:
High voltage semiconductor devices include a drift layer region underlying a field gate electrode, the drift layer region having a selected charge density of lesser magnitude than the charge density of the remainder of the drift layer. This tailoring of the charge density of the drift layer region lowers the pinch-off voltage of a MOSFET inherent in the drift layer region. This lower pinch-off voltage decreases the potential of a device buried-layer when the device is in a reverse blocking mode of operation.
摘要:
The present invention relates to an improved Schottky barrier device wherein the leakage current present in the reverse bias mode attributed to the presence of an electric field at the Schottky barrier (18) is significantly reduced by the inclusion of one or more field shields (22), P.sup.+ -type diffusions located under the metal anode (16) of the Schottky barrier device at the Schottky barrier (18). The P.sup.+ -type field shields, which are disposed in a pattern on the surface of the Schottky barrier, reduce the surface electric field present, thereby significantly reducing the leakage current related thereto.