Processing chamber with wave reflector
    28.
    发明申请
    Processing chamber with wave reflector 审中-公开
    带反射镜的加工室

    公开(公告)号:US20060032447A1

    公开(公告)日:2006-02-16

    申请号:US11074632

    申请日:2005-03-09

    IPC分类号: C23C16/00

    摘要: The processing chamber comprises an energy wave source and a curved spherical surface, wherein the curved spherical surface of the chamber is composed of at least a Fresnel reflector for reflecting the energy wave discharged from the energy wave source and projecting the same onto a platform as the energy wave source is operating in coordination with the curved spherical surface. In addition, the energy wave source can be a microwave source or a light source. It is noted that the curved spherical surface can be a Fresnel reflector, a wave spherical surface with a portion thereof being replaced by a Fresnel reflector, a curved spherical surface with a portion therof being replaced by at least two Fresnel reflectors, and a surface entirely formed of a plurality of Fresnel reflectors. The processing chamber disclosed in the present invention significantly increases energy density, area, and energy uniformity of the projection region so as to diminish required space of equipment and costs of equipment and manufacture.

    摘要翻译: 所述处理室包括能量波源和弯曲球形表面,其中所述腔室的弯曲球形表面由至少一个菲涅尔反射器组成,用于反射从能量波源放出的能量波,并将其投射到平台上作为 能量波源与曲面球面协调工作。 此外,能量波源可以是微波源或光源。 要注意的是,弯曲的球面可以是菲涅耳反射器,波面球形表面的一部分被菲涅耳反射器代替,弯曲的球形表面具有由至少两个菲涅尔反射器代替的部分,并且完全表面的表面 由多个菲涅耳反射器形成。 本发明公开的处理室显着地增加了投影区域的能量密度,面积和能量均匀性,从而减少了设备所需的空间和设备和制造成本。

    Methods of bonding caps for MEMS devices
    29.
    发明授权
    Methods of bonding caps for MEMS devices 有权
    MEMS器件封装方法

    公开(公告)号:US08790946B2

    公开(公告)日:2014-07-29

    申请号:US13365043

    申请日:2012-02-02

    IPC分类号: H01L21/52

    CPC分类号: B23K20/002 B23K20/023

    摘要: A method includes bonding a first bond layer to a second bond layer through eutectic bonding. The step of bonding includes heating the first bond layer and the second bond layer to a temperature higher than a eutectic temperature of the first bond layer and the second bond layer, and performing a pumping cycle. The pumping cycle includes applying a first force to press the first bond layer and the second bond layer against each other. After the step of applying the first force, a second force lower than the first force is applied to press the first bond layer and the second bond layer against each other. After the step of applying the second force, a third force higher than the second force is applied to press the first bond layer and the second bond layer against each other.

    摘要翻译: 一种方法包括通过共晶接合将第一接合层结合到第二接合层。 接合步骤包括将第一接合层和第二接合层加热至高于第一接合层和第二接合层的共晶温度的温度,并进行泵送循环。 泵送循环包括施加第一力以将第一接合层和第二接合层相互挤压。 在施加第一力的步骤之后,施加比第一力小的第二力以将第一接合层和第二接合层相互挤压。 在施加第二力的步骤之后,施加比第二力高的第三力以将第一接合层和第二接合层相互挤压。