Field-effect-controllable semiconductor component and method for producing the semiconductor component
    22.
    发明申请
    Field-effect-controllable semiconductor component and method for producing the semiconductor component 有权
    场效应可控半导体元件及其制造方法

    公开(公告)号:US20050029581A1

    公开(公告)日:2005-02-10

    申请号:US10654683

    申请日:2003-09-04

    摘要: A semiconductor component has at least one first terminal zone of a first conductivity type in a semiconductor body. The first terminal zone is contact-connected by a first terminal electrode. A drift zone of the first conductivity type is adjoined by a second terminal zone of the second conductivity type. A channel zone of a second conductivity type is formed between the at least one first terminal zone and the drift zone. A control electrode is insulated from the semiconductor body and adjacent to the channel zone. A first channel is formed by the channel zone in a region adjacent to the control electrode, the first channel conducts only upon application of a control voltage that is not equal to zero between the control electrode and the first terminal zone. The first terminal electrode is connected to the drift zone via at least one second channel of the first conductivity type, which already conducts in the event of a control voltage equal to zero.

    摘要翻译: 半导体部件在半导体本体中具有至少一个第一导电类型的第一端子区域。 第一端子区由第一端子电极接触连接。 第一导电类型的漂移区由第二导电类型的第二端区连接。 在所述至少一个第一端子区域和所述漂移区域之间形成第二导电类型的沟道区域。 控制电极与半导体本体绝缘并且与沟道区相邻。 第一通道由与控制电极相邻的区域中的通道区形成,第一通道仅在控制电极和第一端子区域之间施加不等于零的控制电压时才导通。 第一端子电极经由至少一个第一导电类型的第二沟道连接到漂移区,其在控制电压等于零的情况下已经导通。

    Semiconductor Devices Including Superjunction Structure and Method of Manufacturing
    25.
    发明申请
    Semiconductor Devices Including Superjunction Structure and Method of Manufacturing 审中-公开
    包括超结构结构和制造方法的半导体器件

    公开(公告)号:US20130307058A1

    公开(公告)日:2013-11-21

    申请号:US13475302

    申请日:2012-05-18

    IPC分类号: H01L29/78 H01L29/06 H01L21/20

    摘要: A semiconductor device includes a semiconductor body having a first surface and a second surface opposite to the first surface. A superjunction structure in the semiconductor body includes drift regions of a first conductivity type and compensation structures alternately disposed in a first direction parallel to the first surface. Each of the charge compensation structures includes a first semiconductor region of a second conductivity type complementary to the first conductivity type and a first trench including a second semiconductor region of the second conductivity type adjoining the first semiconductor region. The first semiconductor region and the first trench are disposed one after another in a second direction perpendicular to the first surface.

    摘要翻译: 半导体器件包括具有第一表面和与第一表面相对的第二表面的半导体本体。 半导体主体中的超结构结构包括第一导电类型的漂移区域和在与第一表面平行的第一方向上交替设置的补偿结构。 每个电荷补偿结构包括与第一导电类型互补的第二导电类型的第一半导体区域和包括与第一半导体区域相邻的第二导电类型的第二半导体区域的第一沟槽。 第一半导体区域和第一沟槽在垂直于第一表面的第二方向上依次布置。

    Power Semiconductor Component with Plate Capacitor Structure Having an Edge Plate Electrically Connected to Source or Drain Potential
    29.
    发明申请
    Power Semiconductor Component with Plate Capacitor Structure Having an Edge Plate Electrically Connected to Source or Drain Potential 有权
    具有板电容结构的功率半导体元件,其边缘板电连接到源极或漏极电位

    公开(公告)号:US20110115007A1

    公开(公告)日:2011-05-19

    申请号:US12962791

    申请日:2010-12-08

    IPC分类号: H01L29/78

    摘要: A lateral power semiconductor component has a front side, a rear side and a lateral edge. The component further includes a drift zone of a first conductivity type, a source zone of the first conductivity type, a body zone of a second conductivity type opposite the first conductivity type, and a drain zone of the first conductivity type. A gate forms a MOS structure with the drift zone, the source zone and the body zone. A horizontally extending field plate above each semiconductor region of the power semiconductor component forms a plate capacitor structure with an edge plate lying under the field plate. The edge plate includes a highly doped semiconductor material and is electrically connected to one of a source potential and a drain potential of the power semiconductor component.

    摘要翻译: 横向功率半导体部件具有前侧,后侧和侧边。 该部件还包括第一导电类型的漂移区,第一导电类型的源区,与第一导电类型相反的第二导电类型的体区和第一导电类型的漏区。 门形成具有漂移区,源区和体区的MOS结构。 在功率半导体部件的每个半导体区域上方的水平延伸的场板形成板状电容器结构,边缘板位于场板下。 边缘板包括高度掺杂的半导体材料,并且电连接到功率半导体部件的源极电位和漏极电位之一。

    Lateral SOI component having a reduced on resistance
    30.
    发明授权
    Lateral SOI component having a reduced on resistance 有权
    具有降低导通电阻的横向SOI元件

    公开(公告)号:US07554157B2

    公开(公告)日:2009-06-30

    申请号:US11527760

    申请日:2006-09-26

    IPC分类号: H01L27/12 H01L29/76

    摘要: An SOI semiconductor component comprises a semiconductor substrate having a basic doping, a dielectric layer arranged on the semiconductor substrate, and a semiconductor layer arranged on the dielectric layer. The semiconductor layer includes a drift zone of a first conduction type, a junction between the drift zone and a further component zone which is configured in such a way that a space charge zone is formed in the drift zone when a reverse voltage is applied to the junction, and a terminal zone adjacent to the drift zone. A first terminal electrode is connected to the further component zone, and a second terminal electrode is connected to the terminal zone. In the semiconductor substrate a first semiconductor zone is doped complementarily with respect to a basic doping of the semiconductor substrate, and the first terminal electrode is connected to the first semiconductor zone. A rectifier element is connected between the first terminal electrode and the first semiconductor zone.

    摘要翻译: SOI半导体部件包括具有基本掺杂的半导体衬底,布置在半导体衬底上的电介质层和布置在电介质层上的半导体层。 半导体层包括第一导电类型的漂移区域,漂移区域和另一组件区域之间的结,该区域构造成使得当反向电压施加到漂移区域时在漂移区域中形成空间电荷区域 结和与漂移区相邻的终端区。 第一端子电极连接到另一组件区域,并且第二端子电极连接到端子区域。 在半导体衬底中,第一半导体区相对于半导体衬底的基本掺杂互补地掺杂,并且第一端电极连接到第一半导体区。 整流元件连接在第一端子电极和第一半导体区域之间。