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公开(公告)号:US20180005684A1
公开(公告)日:2018-01-04
申请号:US15389751
申请日:2016-12-23
Applicant: STMicroelectronics S.r.l. , STMicroelectronics (Crolles 2) SAS , STMicroelectronics (Rousset) SAS
Inventor: Antonino Conte , Enrico Castaldo , Raul Andres Bianchi , Francesco La Rosa
IPC: G11C11/24
Abstract: A reading circuit for a charge-retention circuit stage is provided with a storage capacitor coupled between a first biasing terminal and a floating node, and a discharge element coupled between the floating node and a reference terminal. The reading circuit further has an operational amplifier having a first input terminal that is coupled to the floating node and receives a reading voltage, a second input terminal receives a reference voltage, and an output terminal on which it supplies an output voltage, the value of which is a function of the comparison between the reading voltage and the reference voltage and indicative of a residual charge in the storage capacitor. A shifting stage shifts the value of the reading voltage of the floating node, before the comparison is made between the reading voltage and the reference voltage for supplying the output voltage.
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公开(公告)号:US20250023569A1
公开(公告)日:2025-01-16
申请号:US18899458
申请日:2024-09-27
Inventor: Francesco La Rosa , Marco Bildgen
IPC: H03K19/17768 , H03K19/08 , H03K19/1776
Abstract: In an embodiment an integrated device includes a first physical unclonable function module configured to generate an initial data group and management module configured to generate an output data group from at least the initial data group, authorize only D successive deliveries of the output data group on a first output interface of the device, D being a non-zero positive integer, and prevent any new generation of the output data group.
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公开(公告)号:US12001593B2
公开(公告)日:2024-06-04
申请号:US17199438
申请日:2021-03-12
Applicant: STMicroelectronics (Rousset) SAS
Inventor: Francesco La Rosa
IPC: G06F21/75 , G06F21/72 , G11C11/4096 , H01L27/088 , H03K19/17768
CPC classification number: G06F21/75 , G06F21/72 , G11C11/4096 , H01L27/0883 , H03K19/17768
Abstract: An embodiment system comprises a physical unclonable function device, wherein the device comprises a first assembly of non-volatile memory cells each having a selection transistor embedded in a semiconductor substrate and a depletion-type state transistor having a control gate and a floating gate that are electrically connected, the state transistors having respective effective threshold voltages belonging to a common random distribution, and a processing circuit configured to deliver, to an output interface of the device, a group of output data based on a reading of the effective threshold voltages of the state transistors of the memory cells of the first assembly.
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公开(公告)号:US11056180B2
公开(公告)日:2021-07-06
申请号:US16853036
申请日:2020-04-20
Applicant: STMicroelectronics (Rousset) SAS
Inventor: Francesco La Rosa
IPC: G11C11/4094 , G11C11/408 , G11C11/4091 , G11C11/4099 , G11C5/02
Abstract: A non-volatile memory integrated circuit has a memory plane organized into rows and into columns containing bit lines. The read amplifiers for each bit line are configured to generate an output signal on a read data channel. The read data channels respectively run through the memory plane along each bit line. Each read data channel is connected to all of the read amplifiers of the respective bit line.
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公开(公告)号:US20210066510A1
公开(公告)日:2021-03-04
申请号:US16560810
申请日:2019-09-04
Applicant: STMicroelectronics (Rousset) SAS
Inventor: Francesco La Rosa , Stephan Niel , Arnaud Regnier
IPC: H01L29/861 , H01L27/07 , H01L29/66 , H01L29/788
Abstract: In accordance with an embodiment of the present invention, a method of making a semiconductor device includes simultaneously etching a semiconductor layer and a conductive layer to form a self-aligned diode region disposed on an insulating layer, where the semiconductor layer has a first conductivity type. The method further includes etching through first openings of a mask layer to form first implantation surfaces on the semiconductor layer and to form a plurality of projecting regions including conductive material of the conductive layer over the semiconductor layer. The method further includes using the plurality of projecting regions as a part of a first implantation mask, performing a first implantation of dopants having a second conductivity type into the semiconductor layer, to form a sequence of PN junctions forming diodes in the semiconductor layer. The diodes vertically extend from an upper surface of the semiconductor layer to the insulating layer.
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26.
公开(公告)号:US20200274723A1
公开(公告)日:2020-08-27
申请号:US16784495
申请日:2020-02-07
Applicant: STMicroelectronics (Rousset) SAS
Inventor: Francesco La Rosa
Abstract: In accordance with an embodiment, a physically unclonable function device includes a set of floating gate transistor pairs, floating gate transistors of the set of floating gate transistor pairs having a randomly distributed effective threshold voltage belonging to a common random distribution; a differential read circuit configured to measure a threshold difference between the effective threshold voltages of floating gate transistors of floating gate transistor pairs of the set of floating gate transistor pairs, and to identify a floating gate transistor pair in which the measured threshold difference is smaller than a margin value as being an unreliable floating gate transistor pair; and a write circuit configured to shift the effective threshold voltage of a floating gate transistor of the unreliable floating gate transistor pair to be inside the common random distribution.
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公开(公告)号:US10677839B2
公开(公告)日:2020-06-09
申请号:US15604145
申请日:2017-05-24
Applicant: STMicroelectronics (Rousset) SAS
Inventor: Francesco La Rosa
IPC: G01R31/00 , G01R31/28 , G06F21/55 , G11C11/417 , G06F21/77 , G01R31/40 , G11C5/06 , G11C11/412
Abstract: A device for detecting a fault attack, including: a circuit for detecting an interruption of a power supply; a circuit for comparing the duration of the interruption with a first threshold; and a counter of the number of successive interruptions of the power supply having a duration which does not exceed the first threshold.
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公开(公告)号:US10147733B2
公开(公告)日:2018-12-04
申请号:US15364603
申请日:2016-11-30
Applicant: STMicroelectronics (Rousset) SAS
Inventor: Francesco La Rosa , Stephan Niel , Arnaud Regnier
IPC: H01L29/66 , H01L27/11531 , H01L29/739 , H01L27/08 , H01L27/11526 , G11C16/04 , H01L21/265 , H01L21/266 , H01L21/28 , H01L27/11521 , H01L29/788 , H01L29/861 , H01L29/16 , H01L27/06 , H01L27/12 , H01L29/36 , H01L27/11536
Abstract: A method can be used to make a semiconductor device. A number of projecting regions are formed over a first semiconductor layer that has a first conductivity type. The first semiconductor layer is located on an insulating layer that overlies a semiconductor substrate. The projecting regions are spaced apart from each other. Using the projecting regions as an implantation mask, dopants having a second conductivity type are implanted into the first semiconductor layer, so as to form a sequence of PN junctions forming diodes in the first semiconductor layer. The diodes vertically extend from an upper surface of the first semiconductor layer to the insulating layer.
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公开(公告)号:US09825186B2
公开(公告)日:2017-11-21
申请号:US15365433
申请日:2016-11-30
Applicant: STMicroelectronics (Rousset) SAS
Inventor: Francesco La Rosa , Stephan Niel , Arnaud Regnier
IPC: H01L29/788 , G11C16/34 , G11C16/04 , G11C16/26 , G11C16/10 , G11C16/08 , H01L27/11556 , H01L27/11582 , H01L27/1157 , H01L27/11524 , H01L29/792
CPC classification number: H01L29/7889 , G11C16/0433 , G11C16/0466 , G11C16/08 , G11C16/10 , G11C16/26 , G11C16/3427 , H01L27/11524 , H01L27/11556 , H01L27/1157 , H01L27/11582 , H01L28/00 , H01L29/788 , H01L29/792
Abstract: The non-volatile memory device comprises memory cells each comprising a selectable state transistor having a floating gate and a control gate. The state transistor is of the depletion-mode type and is advantageously configured so as to have a threshold voltage that is preferably negative when the memory cell is in a virgin state. When the memory cell is read, a read voltage of zero may then be applied to the control gate and also to the control gates of the state transistors of all the memory cells of the memory device.
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公开(公告)号:US09691866B2
公开(公告)日:2017-06-27
申请号:US15252090
申请日:2016-08-30
Applicant: STMicroelectronics (Rousset) SAS
Inventor: Arnaud Regnier , Jean-Michel Mirabel , Stephan Niel , Francesco La Rosa
IPC: H01L29/423 , H01L27/11524 , H01L29/788 , H01L29/78 , G11C16/04 , H01L29/66 , H01L27/11521
CPC classification number: H01L29/42336 , G11C16/0433 , H01L27/11521 , H01L27/11524 , H01L29/42324 , H01L29/42328 , H01L29/66825 , H01L29/7831 , H01L29/7881 , H01L29/7885 , H01L29/7889
Abstract: A memory cell formed in a semiconductor substrate, includes a selection gate extending vertically in a trench made in the substrate, and isolated from the substrate by a first layer of gate oxide, a horizontal floating gate extending above the substrate and isolated from the substrate by a second layer of gate oxide, and a horizontal control gate extending above the floating gate. The selection gate covers a lateral face of the floating gate. The floating gate is separated from the selection gate only by the first layer of gate oxide, and separated from a vertical channel region, extending in the substrate along the selection gate, only by the second layer of gate oxide.
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