Novel Level Shifter
    27.
    发明申请

    公开(公告)号:US20170272075A1

    公开(公告)日:2017-09-21

    申请号:US15073948

    申请日:2016-03-18

    CPC classification number: H03K19/018521

    Abstract: A circuit is disclosed. The circuit includes eight MOD transistors and a capacitor, the first MOS transistor having a source coupled to a first predetermined supply voltage (VDDM), a second MOS transistor having a source coupled to a first predetermined supply voltage VDDM, a third MOS transistor having a source coupled to a drain of the first MOS transistor, a fourth MOS transistor having a source coupled to a drain of the second MOS transistor, a fifth MOS transistor having a source coupled to a drain of the third MOS transistor and a gate of the second MOS transistor, and a gate coupled to a gate of the third MOS transistor and an input node, and a drain coupled to ground, a sixth MOS transistor having a source coupled to a drain of the fourth MOS transistor and a gate of the first MOS transistor and an output node.

    Memory device
    28.
    发明授权
    Memory device 有权
    内存设备

    公开(公告)号:US09552873B2

    公开(公告)日:2017-01-24

    申请号:US15016172

    申请日:2016-02-04

    CPC classification number: G11C11/419 G11C7/14

    Abstract: A device includes memory cells, reference memory cells, and a sensing unit. The reference memory cells are configured to store first bit data, second bit data, third bit data, and fourth bit data, in which the first bit data and the fourth bit data are configured to be a high logic state, and the second bit data and the third bit data are configured to be a low logic state. The sensing unit is configured to read bit data stored in one of the memory cells according to the first bit data, the second bit data, the third bit data, and the fourth bit data.

    Abstract translation: 一种设备包括存储单元,参考存储单元和感测单元。 参考存储单元被配置为存储第一位数据和第四位数据被配置为高逻辑状态的第一位数据,第二位数据,第三位数据和第四位数据,并且第二位数据 并且第三位数据被配置为低逻辑状态。 感测单元被配置为根据第一位数据,第二位数据,第三位数据和第四位数据读取存储在一个存储器单元中的位数据。

    Method of forming edge devices for improved performance
    30.
    发明授权
    Method of forming edge devices for improved performance 有权
    形成边缘装置以提高性能的方法

    公开(公告)号:US09064799B2

    公开(公告)日:2015-06-23

    申请号:US14079671

    申请日:2013-11-14

    Abstract: A method includes forming a first plurality of fingers over an active area of a semiconductor substrate. Each of the first plurality of fingers has a respective length that extends in a direction that is parallel to width direction of the active area. The first plurality of fingers form at least one gate of at least one transistor having a source and a drain formed by a portion of the active area. A first dummy polysilicon structure is formed over a portion of the active area between an outer one of the first plurality of fingers and a first edge of the semiconductor substrate. A second dummy polysilicon structure is over the semiconductor substrate between the first dummy polysilicon structure and the first edge of the semiconductor substrate.

    Abstract translation: 一种方法包括在半导体衬底的有效区域上形成第一多个指状物。 第一多个指状物中的每一个具有在与有源区域的宽度方向平行的方向上延伸的相应长度。 第一多个指状物形成至少一个晶体管的至少一个栅极,该晶体管具有由有源区域的一部分形成的源极和漏极。 第一虚设多晶硅结构形成在第一多个指状物的外部之一和半导体衬底的第一边缘之间的有源区域的一部分上。 第二虚设多晶硅结构在第一虚设多晶硅结构和半导体衬底的第一边缘之间的半导体衬底之上。

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