摘要:
A method of forming a semiconductor thin layer on a silicon substrate comprising the steps of depositing a first amorphous layer of a compound semiconductor (e.g., GaAs) on the silicon substrate, and growing a first epitaxial layer of the compound semiconductor on the amorphous layer, characterized in that the method comprises the steps of: after the epitaxial growth step, depositing a second amorphous layer of the compound semiconductor on the first epitaxial layer, and growing a second epitaxial layer of the compound semiconductor on the second amorphous layer. The obtained GaAs/Si substrate has a reduced dislocation density.
摘要:
The present disclosure generally describes radio frequency (RF) particles and an RF powder-containing base including a plurality of such RF particles. The RF particles may include an antenna element and an integrated circuit element coupled together by at least one interconnection. The base may be formed from sheet-like subjects, such as various kinds of cards, bills, and documents. Methods of forming the RF powder-containing base are also generally disclosed.
摘要:
The present invention provides an RF powder-containing base including functional components, wherein forged cards, documents, bills, or the like are hard to be produced with respect to sheet-like subjects with high proprietary nature, such as various kinds of cards, bills, and securities, and each of a large number of particles can memorize information such as an identification number or the like. An RF powder-containing base 10 contains an RF powder (particles 11, 12, and 13), in which each particle of the RF powder provides an integrated circuit 15 formed on a substrate 14, an insulating layer 16 formed on the integrated circuit, and an antenna element 17 formed on the insulating layer, wherein each of the particles of the RF powder contained in the base has sensitivity to an electromagnetic waves having any of a plurality of different frequencies.
摘要:
A heating apparatus for use in heating a substrate comprises an electric heater and a power supply part. The electric heater is made up of an approximately columnar body which is made of graphite, and this columnar body has a top with a flat surface part on which the substrate is placed and a pair of legs which extend downwardly from the flat surface part. The legs are defined by an opening in the columnar body. The power supplying part is coupled to the electric heater and supplies a voltage across the legs of the columnar body so that a current flows from one leg to the other, thereby generating heat at the flat surface part to heat the substrate.
摘要:
A method for producing a semiconductor device includes the steps of forming a patterned wiring line on a first insulating layer, and depositing a second insulating layer on the patterned wiring line and the first insulating layer by a plasma-assisted CVD process in which a pulse-modulated plasma is generated and a gas containing hydrogen is used.
摘要:
A bipolar transistor includes a base region made of silicon crystal doped with a first impurity to a first level so as to establish a first carrier concentration in the base region and an emitter region made of silicon crystal doped with a second impurity to a second level substantially larger than the first level by a predetermined factor so as to establish a second carrier concentration in the emitter region, in which the second impurity exceeds the solubility limit of the second impurity in silicon crystal. The first and second levels are chosen in such a range that a difference in the carrier concentrations between the emitter region and the base region decreases substantially with increasing impurity level in the base region.
摘要:
For a multilayer insulating film of a semiconductor device, the distributed quantity of carbon or fluorine is maximized at the interface between insulating films. The concentration of carbon present at the interface is 1.times.10.sup.20 atoms/cm.sup.3 or more.
摘要:
A bipolar transistor includes a base region made of silicon crystal doped with a first impurity to a first level so as to establish a first carrier concentration in the base region and an emitter region made of silicon crystal doped with a second impurity to a second level substantially larger than the first level by a predetermined factor so as to establish a second carrier concentration in the emitter region, in which the second impurity exceeds the solubility limit of the second impurity in silicon crystal. The first and second levels are chosen in such a range that a difference in the carrier concentrations between the emitter region and the base region decreases substantially with increasing impurity level in the base region.
摘要:
A multilayer insulating film of a semiconductor device, where the distributed quantity of carbon or fluorine is maximized at the interface between insulating films. The concentration of carbon present at the interface is 1.times.10.sup.20 atoms/cm.sup.3 or more.
摘要:
A metal-insulator-semiconductor (MIS) device comprising a MIS transistor and a MIS input element which are fabricated apart from each other on a semiconductor substrate. The MIS transistor is provided with source and drain regions as well as a channel region between the source and drain regions, a gate insulating layer on the channel region and a gate on the insulating layer. The MIS input element is provided with an input region of the same conductive type as the channel region, an insulating layer on the input region and an electrode on the insulating layer. The electrode and insulating layer of the input element are made of the same material in the same thickness as the gate and insulating layer of the MIS transistor, and the gate of the MIS transistor is exclusively electrically interconnected to the electrode of the MIS input element.