利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

40 条记录 (耗时 0.027 秒)

    ENHANCED LOW ENERGY ION BEAM TRANSPORT IN ION IMPLANTATION
    21.
    发明申请
    ENHANCED LOW ENERGY ION BEAM TRANSPORT IN ION IMPLANTATION 有权
    在离子植入中增强低能量离子束运输

    公开(公告)号：US20100181499A1

    公开(公告)日：2010-07-22

    申请号：US12357973

    申请日：2009-01-22

    申请人： Bo H. Vanderberg ,  William F. DiVergilio

    发明人： Bo H. Vanderberg ,  William F. DiVergilio

    IPC分类号： A61N5/00 ,  H01J27/00 ,  H01J49/00

    CPC分类号： H01J37/3171 ,  H01J37/026 ,  H01J37/05 ,  H01J2237/0041 ,  H01J2237/055

    摘要： An ion implantation method and system that incorporate beam neutralization to mitigate beam blowup, which can be particularly problematic in low-energy, high-current ion beams. The beam neutralization component can be located in the system where blowup is likely to occur. The neutralization component includes a varying energizing field generating component that generates plasma that neutralizes the ion beam and thereby mitigates beam blowup. The energizing field is generated with varying frequency and/or field strength in order to maintain the neutralizing plasma while mitigating the creation of plasma sheaths that reduce the effects of the neutralizing plasma.

    摘要翻译： 一种离子注入方法和系统，其结合光束中和以减轻光束吹胀，这在低能量，高电流离子束中可能是特别有问题的。 光束中和组件可以位于可能发生喷射的系统中。 中和组件包括变化的激励场产生组件，其产生中和离子束的等离子体，从而减轻光束吹胀。 产生具有变化的频率和/或场强的激励场，以便维持中和等离子体，同时减轻等离子体护套的产生，从而降低中和等离子体的影响。

    Unipolar electrostatic quadrupole lens and switching methods for charged beam transport
    23.
    发明授权
    Unipolar electrostatic quadrupole lens and switching methods for charged beam transport 有权
    单极静电四极杆透镜和带电束传输的切换方法

    公开(公告)号：US06949895B2

    公开(公告)日：2005-09-27

    申请号：US10654168

    申请日：2003-09-03

    申请人： William F. DiVergilio ,  Youngzhang Huang

    发明人： William F. DiVergilio ,  Youngzhang Huang

    IPC分类号： H01J37/12 ,  H01J37/153 ,  H01J37/317 ,  H06H9/00

    CPC分类号： H01J37/12 ,  H01J37/153 ,  H01J37/3171 ,  H01J2237/04735 ,  H01J2237/04737 ,  H01J2237/04924

    摘要： A linear acceleration system comprises one or more accelerating stages along an axis and a unipolar electrostatic quadruple lens in series with the one or more accelerating stages. The unipolar electrostatic quadruple lens focuses an ion beam in a direction transverse to the axis. The unipolar electrostatic quadruple lens includes a switching circuit, a first pair of electrodes, and a second pair of electrodes. The switching circuit controllably connects to ground and a first voltage potential. The electrodes of the first pair are located opposite each other and are connected to the switching circuit. The electrodes of the second pair are also located opposite each other and connected to the switching circuit. The second pair of electrodes are biased to a second voltage potential.

    摘要翻译： 线性加速系统包括沿轴线的一个或多个加速级和与一个或多个加速级串联的单极静电四极透镜。 单极静电四极透镜在垂直于轴线的方向上聚焦离子束。 单极静电四极透镜包括开关电路，第一对电极和第二对电极。 开关电路可控地连接到地和第一电压电位。 第一对的电极彼此相对定位并且连接到开关电路。 第二对的电极也彼此相对并且连接到开关电路。 第二对电极被偏压到第二电压电位。

    RF Coupled Plasma Abatement System Comprising an Integrated Power Oscillator
    24.
    发明申请
    RF Coupled Plasma Abatement System Comprising an Integrated Power Oscillator 有权
    RF耦合等离子体消除系统，包括集成功率振荡器

    公开(公告)号：US20120279657A1

    公开(公告)日：2012-11-08

    申请号：US13102206

    申请日：2011-05-06

    申请人： Aseem K. Srivastava ,  William F. DiVergilio

    发明人： Aseem K. Srivastava ,  William F. DiVergilio

    IPC分类号： H01L21/306

    CPC分类号： A61H35/006 ,  C23C16/4401 ,  C23C16/4412 ,  C23C16/50 ,  H01J37/32128 ,  H01J37/32174 ,  H01J37/32844 ,  Y02C20/30

    摘要： The present disclosure is directed towards a method and apparatus for generating an abatement plasma downstream of a processing chamber using an RF plasma ignited and sustained with an integrated power oscillator circuit driven by feedback based upon a load of the abatement plasma. In one embodiment, a plasma ashing system includes an abatement system configured to receive an effluent byproduct from an upstream processing chamber containing a workpiece. The effluent byproduct is provided along an exhaust conduit to a downstream afterburner unit having an integrated power oscillator, that relies upon an oscillating circuit operatively coupled to an antenna to ignite the abatement plasma within the exhaust conduit. The antenna, together with the plasma load, form a resonant tank circuit, which provides a feedback that drives operation of the oscillating circuit, thereby allowing the oscillating circuit to vary its output based upon changes in the abatement plasma load.

    摘要翻译： 本公开涉及一种用于使用使用基于消除等离子体的负载的反馈驱动的集成功率振荡器电路点燃和维持的RF等离子体来产生处理室下游的减排等离子体的方法和装置。 在一个实施例中，等离子体灰化系统包括被配置为从包含工件的上游处理室接收流出物副产物的减排系统。 流出物副产物沿着排气管道被提供到具有集成功率振荡器的下游后燃器单元，其依赖于可操作地耦合到天线的振荡电路以点燃排气管道内的消除等离子体。 天线与等离子体负载一起形成谐振回路，其提供驱动振荡电路的操作的反馈，从而允许振荡电路基于消除等离子体负载的变化来改变其输出。

    MICROWAVE PLASMA ELECTRON FLOOD
    25.
    发明申请
    MICROWAVE PLASMA ELECTRON FLOOD 有权
    MICROWAVE PLASMA电子洪水

    公开(公告)号：US20120187842A1

    公开(公告)日：2012-07-26

    申请号：US13010888

    申请日：2011-01-21

    申请人： William F. DiVergilio ,  Bo Vanderberg

    发明人： William F. DiVergilio ,  Bo Vanderberg

    IPC分类号： H05H1/46

    CPC分类号： H05H1/46 ,  H01J37/026 ,  H01J37/3171 ,  H05H2001/4622

    摘要： A method and apparatus is provided for generating a plasma electron flood using microwave radiation. In one embodiment, a microwave PEF apparatus is configured to generate a magnetic field that rapidly decays over a PEF cavity, resulting in a static magnetic field having a high magnetic field strength near one side (e.g., “bottom”) of the PEF cavity and a low magnetic field strength (e.g., substantially zero) near the opposite side (e.g., “top”) of the PEF comprising an elongated extraction slit. In one particular embodiment, the one or more permanent magnets are located at a position that is spatially opposed to the location of the elongated extraction slit to achieve the rapidly decaying magnetic field.The magnetic field results in an electron cyclotron frequency in a region of the cavity equal to or approximately equal to a microwave radiation frequency so that plasma is generated to diffuse through the extraction apertures.

    摘要翻译： 提供了一种使用微波辐射产生等离子体电子泛洪的方法和装置。 在一个实施例中，微波PEF装置被配置为产生在PEF空腔上快速衰减的磁场，导致在PEF空腔的一侧（例如“底部”）附近具有高磁场强度的静态磁场， 靠近PEF的相对侧（例如，“顶部”）附近的低磁场强度（例如，基本为零），包括细长的提取狭缝。 在一个特定实施例中，一个或多个永磁体位于与细长抽取狭缝的位置空间相对的位置，以实现快速衰减的磁场。 磁场导致在空腔区域中的电子回旋加速器频率等于或近似等于微波辐射频率，使得产生等离子体以扩散通过提取孔径。

    WIDE AREA RADIO FREQUENCY PLASMA APPARATUS FOR PROCESSING MULTIPLE SUBSTRATES
    26.
    发明申请
    WIDE AREA RADIO FREQUENCY PLASMA APPARATUS FOR PROCESSING MULTIPLE SUBSTRATES 审中-公开
    用于处理多个基板的宽带无线电等离子体设备

    公开(公告)号：US20110036500A1

    公开(公告)日：2011-02-17

    申请号：US12910096

    申请日：2010-10-22

    申请人： William F. DiVergilio ,  Aseem K. Srivastava

    发明人： William F. DiVergilio ,  Aseem K. Srivastava

    IPC分类号： H01Q1/40 ,  H01Q1/36 ,  H01Q1/12 ,  H01L21/02

    CPC分类号： H01Q1/364 ,  H01J37/321 ,  H01Q21/061 ,  H05H1/46

    摘要： An antenna array for a radio frequency plasma process chamber including, an array of electrodes, an array of dielectric tubes concentrically disposed about each electrode tube to define a chamber configured to be at atmospheric pressure between an outer surface of each electrode tube and an inner surface of the corresponding dielectric tube, and a hermetic seal between each dielectric tube and the plasma process chamber configured to allow a vacuum or low pressure environment in the plasma process chamber.

    摘要翻译： 一种用于射频等离子体处理室的天线阵列，其包括电极阵列，同心地设置在每个电极管周围的介电管阵列，以限定被构造为在每个电极管的外表面之间的大气压力的腔室和内表面 并且每个电介质管和等离子体处理室之间的气密密封被配置为允许等离子体处理室中的真空或低压环境。

    Method and system for microwave excitation of plasma in an ion beam guide
    29.
    发明授权
    Method and system for microwave excitation of plasma in an ion beam guide 有权
    离子束引导中等离子体微波激发的方法和系统

    公开(公告)号：US06414329B1

    公开(公告)日：2002-07-02

    申请号：US09625153

    申请日：2000-07-25

    申请人： Victor M. Benveniste ,  William F. DiVergilio ,  Frank Sinclair

    发明人： Victor M. Benveniste ,  William F. DiVergilio ,  Frank Sinclair

    IPC分类号： H01J37317

    CPC分类号： H01J37/32623 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/32678

    摘要： An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, a power source adapted to provide an electric field in the passageway, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The power source and the magnets may cooperatively interact to provide an electron cyclotron resonance (ECR) condition along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway to interact with an electric field of a known RF or microwave frequency for a given low energy ion beam. The invention further comprises a mass analyzer waveguide adapted to couple the electric field to the beam plasma consistently along the length of the mass analyzer passageway to thereby improve the creation of the ECR condition. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.

    摘要翻译： 公开了一种用于提供用于离子注入应用的低能量高电流离子束的装置和方法。 该装置包括安装在沿着离子束的路径的通道中的质量分析磁体，适于在通道中提供电场的电源以及适于在通道中提供多通道磁场的磁性装置，其中 可以包括沿通道的至少一部分安装的多个磁体。 电源和磁体可以协同地相互作用以沿着通道的至少一部分提供电子回旋共振（ECR）状态。 多质量磁场可以在质量分析器通道的区域中以指定的场强叠加在偶极子场上，以与给定的低能离子束的已知RF或微波频率的电场相互作用。 本发明还包括质量分析器波导，其适于沿着质量分析器通道的长度一致地将电场耦合到束等离子体，从而改善ECR条件的产生。 因此，本发明在低能量离子束的质量分析器偶极磁场内提供束等离子体的增强，而不引入外部产生的等离子体。 本发明还包括一种在低能离子注入系统中提供离子束容纳的方法以及离子注入系统。

    Inline Capacitive Ignition of Inductively Coupled Plasma Ion Source
    30.
    发明申请
    Inline Capacitive Ignition of Inductively Coupled Plasma Ion Source 审中-公开
    电感耦合等离子体离子源的线性电容点火

    公开(公告)号：US20130305988A1

    公开(公告)日：2013-11-21

    申请号：US13475006

    申请日：2012-05-18

    申请人： William F. DiVergilio ,  William D. Lee ,  Mike Cristoforo ,  Walter Hrynyk ,  Robert L. Moffett ,  Tomoya Nakatsugawa

    发明人： William F. DiVergilio ,  William D. Lee ,  Mike Cristoforo ,  Walter Hrynyk ,  Robert L. Moffett ,  Tomoya Nakatsugawa

    IPC分类号： C23C16/50 ,  H05H1/46

    CPC分类号： H01J37/32091 ,  H01J37/3211 ,  H01J37/32412

    摘要： An ion source is disclosed that utilizes a capacitive discharge to produce ignition ions, which are subsequently used to ignite an inductively coupled plasma within a plasma chamber. In some embodiments, a capacitive discharge element is located along a gas feed line at a position that is upstream of a plasma chamber. The capacitive discharge element ignites a capacitive discharge within the gas feed line. The capacitive discharge contains ignition ions that are provided to a downstream plasma chamber. An inductively coupled plasma ignition element, in communication with the plasma chamber, ignites and sustains a high density inductively coupled plasma within the plasma chamber based upon ignition ions from the capacitive discharge. Due to the ignition ions, the inductively coupled plasma element can easily ignite the high density inductively coupled plasma, even at a low pressure.

    摘要翻译： 公开了一种利用电容放电来产生点火离子的离子源，其随后用于点燃等离子体室内的感应耦合等离子体。 在一些实施例中，电容放电元件沿着位于等离子体室上游的位置处的气体馈送线定位。 电容放电元件点燃气体馈送线中的电容放电。 电容放电包含提供给下游等离子体室的点火离子。 基于来自电容放电的点火离子，与等离子体室连通的电感耦合等离子体点火元件在等离子体室内点燃和维持高密度感应耦合等离子体。 由于点火离子，即使在低压下，电感耦合等离子体元件也可以容易地点燃高密度电感耦合等离子体。