Systems and methods for ion source control in ion implanters
    21.
    发明授权
    Systems and methods for ion source control in ion implanters 失效
    离子注入机离子源控制的系统和方法

    公开(公告)号:US4754200A

    公开(公告)日:1988-06-28

    申请号:US774110

    申请日:1985-09-09

    CPC classification number: H01J37/24 H01J27/022 H01J27/14 H01J37/08 H01J37/3171

    Abstract: A method for operating an ion source having a filament-cathode and an anode. The method includes supplying direct current electrical power between the anode and the filament-cathode characterized by substantially constant arc current there between and varying arc voltage on the filament-cathode. Direct current electrical power is also supplied across the filament-cathode. The value of the arc voltage is monitored and the magnitude of electrical power supplied to the filament-cathode is altered in response to detected changes in the arc voltage to return the arc voltage to substantially a preset reference value. The monitoring step and the altering step are carried out at regular preset intervals. The altering step includes deriving an filament power error signal as a prearranged function which includes the difference in values between the monitored arc voltage and the preset reference value multiplied by a predefined integral gain value. The altering step also includes altering the magnitude of electrical power supplied to the filament-cathode by the value of the filament power error signal.

    Abstract translation: 一种用于操作具有丝 - 阴极和阳极的离子源的方法。 该方法包括在阳极和灯丝阴极之间提供直流电力,其特征在于其上的基本恒定的电弧电流和灯丝阴极之间的电弧电压变化。 直流电功率也在灯丝阴极上提供。 监测电弧电压的值,并且响应于检测到的电弧电压的变化而改变提供给灯丝 - 阴极的电力的大小,以将电弧电压恢复到基本上预设的参考值。 监视步骤和改变步骤以规定的预设间隔进行。 改变步骤包括导出灯丝功率误差信号作为预定功能,其包括监视的电弧电压和预设参考值之间的值之差乘以预定的积分增益值。 改变步骤还包括通过灯丝功率误差信号的值来改变提供给灯丝 - 阴极的电力的大小。

    High voltage source providing continuously regulated output voltage,
preferably for supplying low-power ion and electron beam machining and
evaporating apparatuses
    22.
    发明授权
    High voltage source providing continuously regulated output voltage, preferably for supplying low-power ion and electron beam machining and evaporating apparatuses 失效
    高电压源提供连续调节的输出电压,优选用于供应低功率离子和电子束加工和蒸发装置

    公开(公告)号:US4739463A

    公开(公告)日:1988-04-19

    申请号:US943382

    申请日:1986-12-17

    CPC classification number: H02M3/28

    Abstract: The invention relates to a stabilized high voltage source the output voltage of which may be regulated in wide range, whereby the adjusted output current is constant at variable load. The high voltage supply source comprises a high voltage rectifier fed by a push-pull driving circuit, a control circuit supplying push-pull width modulated control signals of the driving circuit and an error signal processing circuit working up the divided voltage and current signals taken from the output of the high voltage source. The output signal of the error signal processing circuit is applied to the control circuit as a control signal. The supply voltage of auxiliary circuits of the supply source is provided by a stabilized low voltage supply unit.

    Abstract translation: 本发明涉及一种稳定的高压源,其输出电压可以在宽范围内调节,由此调整的输出电流在可变负载下是恒定的。 高压电源包括由推挽驱动电路馈送的高压整流器,提供驱动电路的推挽宽度调制控制信号的控制电路和处理分离的电压和电流信号的误差信号处理电路 输出高电压源。 误差信号处理电路的输出信号作为控制信号施加到控制电路。 供电源的辅助电路的电源电压由稳定的低压电源单元提供。

    Power source device for ion sources
    24.
    发明授权
    Power source device for ion sources 失效
    离子源电源装置

    公开(公告)号:US4454453A

    公开(公告)日:1984-06-12

    申请号:US386529

    申请日:1982-06-09

    Applicant: Toru Sugawara

    Inventor: Toru Sugawara

    CPC classification number: H01J27/08 H01J37/248

    Abstract: The invention provides a power source device for an ion source, including first to third power source units coupled to the anode, the cathode and the beam extraction electrode of the ion source. The second power source unit applies an alternating voltage across the cathode. An alternating heating current then flows through the cathode. Each cycle of the alternating voltage from the second power source unit has positive and negative components with preset levels which are generated with a predetermined time interval between them. The power source device further includes a control circuit for interrupting the operation of the first and third power source units during the predetermined time interval.

    Abstract translation: 本发明提供了一种用于离子源的电源装置,包括耦合到阳极的第一至第三电源单元,离子源的阴极和光束提取电极。 第二电源单元跨越阴极施加交流电压。 然后交替的加热电流流过阴极。 来自第二电源单元的交流电压的每个周期具有正和负分量,其中预设电平以它们之间的预定时间间隔产生。 电源装置还包括用于在预定时间间隔期间中断第一和第三电源单元的操作的控制电路。

    Protection circuit for electron gun
    25.
    发明授权
    Protection circuit for electron gun 失效
    电子枪保护电路

    公开(公告)号:US3938001A

    公开(公告)日:1976-02-10

    申请号:US445955

    申请日:1974-02-26

    CPC classification number: H01J37/241 H01J37/073 H01J37/248

    Abstract: An electron gun comprising a changeover chamber and changeover circuit between the gun chamber and the insulated cable which connects the power supply circuits to the electrodes which enables adjustment of electrode potentials to accomplish electrode treatment without excessive gun currents.

    Abstract translation: 一种电子枪,包括转换室和枪室和绝缘电缆之间的转换电路,其将电源电路连接到电极,其能够调节电极电位以在没有过多的枪电流的情况下实现电极处理。

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

    公开(公告)号:US20230360882A1

    公开(公告)日:2023-11-09

    申请号:US18350207

    申请日:2023-07-11

    CPC classification number: H01J37/32082 H01J37/248 H01J37/32568

    Abstract: A plasma processing method according to an exemplary embodiment includes preparing a substrate in a chamber of a plasma processing apparatus. The substrate is disposed on a substrate support in the chamber. The substrate support includes a lower electrode and an electrostatic chuck. The electrostatic chuck is provided on the lower electrode. The plasma processing method further includes applying a positive voltage to a conductive member when plasma is being generated in the chamber for plasma processing on the substrate. The conductive member extends closer to a grounded side wall of the chamber than the substrate.

    DC High-Voltage Source Device and Charged Particle Beam Device

    公开(公告)号:US20230353056A1

    公开(公告)日:2023-11-02

    申请号:US18016989

    申请日:2020-07-22

    Inventor: Tomoyo SASAKI

    CPC classification number: H02M3/28 H01J37/248 H02M1/0043 H02M1/14

    Abstract: This DC high-voltage source device comprises a first voltage source including: a first variable DC voltage source; a second variable DC voltage source; a first switching circuit that generates an AC voltage from the DC voltage of the first variable DC voltage source; a second switching circuit that generates an AC voltage from the DC voltage of the second variable DC voltage source; a first transformer that transforms the AC voltage generated by the first switching circuit; a second transformer that transforms the AC voltage generated by the second switching circuit; a DC high-voltage generation circuit that generates a DC high voltage on the basis of a transformed AC voltage supplied from the first transformer and a transformed AC voltage supplied from the second transformer; and a computer system. The computer system independently adjusts the DC voltage value of the first variable DC voltage source, the DC voltage value of the second variable DC voltage source, the switching timing of the first switching circuit, and the switching timing of the second switching circuit.

    Nanosecond pulser bias compensation

    公开(公告)号:US11222767B2

    公开(公告)日:2022-01-11

    申请号:US16722115

    申请日:2019-12-20

    Abstract: A high voltage power system is disclosed. In some embodiments, the high voltage power system includes a high voltage pulsing power supply; a transformer electrically coupled with the high voltage pulsing power supply; an output electrically coupled with the transformer and configured to output high voltage pulses with an amplitude greater than 1 kV and a frequency greater than 1 kHz; and a bias compensation circuit arranged in parallel with the output. In some embodiments, the bias compensation circuit can include a blocking diode; and a DC power supply arranged in series with the blocking diode.

    Filament power supply for electron accelerator and electron accelerator

    公开(公告)号:US10694616B2

    公开(公告)日:2020-06-23

    申请号:US16667849

    申请日:2019-10-29

    Abstract: The present disclosure provides a filament power supply for an electron accelerator and an electron accelerator. The filament power supply includes: a rectifier circuit configured to convert a power frequency AC voltage signal into a DC voltage signal; an inverter circuit configured to convert the DC voltage signal into an AC voltage signal; a sampling circuit configured to sample the AC voltage signal to obtain a current sampling signal or a voltage sampling signal; a pulse width modulation control chip configured to adjust a pulse width modulation signal until a voltage of the current sampling signal is equal to that of a reference current signal, or a voltage of the voltage sampling signal is equal to that of a reference voltage signal; a modulation circuit configured to modulate the power frequency AC voltage signal to obtain a modulation signal and output the pulse width modulation signal and the modulation signal.

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