公开(公告)号：US20170283943A1

公开(公告)日：2017-10-05

申请号：US15467564

申请日：2017-03-23

Applicant: SILCOTEK CORP.

Inventor： David A. SMITH

IPC: C23C16/30 ,  B32B15/18 ,  B32B15/20 ,  C22C38/58 ,  C22C38/44 ,  C22C38/00 ,  C22C38/42 ,  C22C38/02 ,  C22C38/06 ,  C22C38/50 ,  C22C38/04 ,  C22C38/46 ,  C22C21/08 ,  C22C19/05 ,  B32B15/04

CPC classification number: C23C16/30 ,  B05D1/60 ,  B05D3/044 ,  B05D5/083 ,  B05D7/146 ,  B05D2202/00 ,  B05D2506/10 ,  B05D2518/10 ,  B32B15/04 ,  B32B15/18 ,  B32B15/20 ,  C22C19/056 ,  C22C21/08 ,  C22C38/001 ,  C22C38/002 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/42 ,  C22C38/44 ,  C22C38/46 ,  C22C38/50 ,  C22C38/58 ,  C23C12/00 ,  C23C12/02

Abstract: Treated articles and a process of producing the treated articles, systems having treated articles, and processes incorporating treated articles are disclosed. The treated articles include a metal or metallic substrate, and a surface treatment of the metal or metallic substrate, the surface treatment having fluorine, silicon, and carbon. The systems include a flow path, with the surface treatment being within the flow path. The processes include flowing a fluid through the flow path.

公开(公告)号：US20170211180A1

公开(公告)日：2017-07-27

申请号：US15004455

申请日：2016-01-22

Applicant: SILCOTEK CORP.

Inventor： Thomas F. VEZZA ,  Steven A. CONDO ,  Nicholas Peter DESKEVICH ,  James B. MATTZELA ,  Paul H. SILVIS

IPC: C23C16/455 ,  C23C16/46

CPC classification number: C23C16/455 ,  C23C16/24 ,  C23C16/45502 ,  C23C16/46

Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species.

公开(公告)号：US20160289585A1

公开(公告)日：2016-10-06

申请号：US14675823

申请日：2015-04-01

Applicant: SILCOTEK CORP.

Inventor： James B. MATTZELA ,  Min YUAN ,  David A. SMITH ,  Paul H. SILVIS

IPC: C10M105/76 ,  C23C16/44 ,  C23C16/30

CPC classification number: C10M105/76 ,  C10M2227/045 ,  C10N2230/06 ,  C10N2250/14 ,  C10N2260/04 ,  C23C16/325 ,  C23C16/56

Abstract: Thermal chemical vapor deposition coated product and uses of such products are disclosed. A thermal chemical vapor deposition coated product includes a threaded substrate and a lubricious coating on the threaded substrate, the lubricious coating having a coefficient of friction of between 0.05 and 0.58 and being a thermal chemical vapor deposition. A process includes engaging the thermal chemical vapor deposition coated product with a material having mating threads, and applying pressure to the thermal chemical vapor deposition coated product while engaged with the material.

Abstract translation: 公开了热化学气相沉积涂覆产品和这些产品的用途。 热化学气相沉积涂覆产品包括螺纹基底和在螺纹基底上的润滑涂层，该润滑涂层的摩擦系数在0.05和0.58之间，并且是热化学气相沉积。 一种方法包括使热化学气相沉积涂覆的产品与具有配合螺纹的材料接合，并在与材料接合的同时向热化学气相沉积涂覆的产品施加压力。

公开(公告)号：US20160060763A1

公开(公告)日：2016-03-03

申请号：US14821949

申请日：2015-08-10

Applicant: SILCOTEK CORP.

Inventor： Min YUAN ,  David A. SMITH ,  Paul H. SILVIS ,  James B. MATTZELA

IPC: C23C16/52 ,  C23C16/22

CPC classification number: C23C16/52 ,  C23C16/22 ,  C23C16/30 ,  C23C16/46 ,  C23C16/56

Abstract: A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.

Abstract translation: 公开了一种化学气相沉积工艺和涂覆制品。 化学气相沉积工艺包括将物品定位在化学气相沉积室中，然后将沉积气体以低于沉积气体的热分解温度的分解温度引入化学气相沉积室，然后加热室 达到等于或高于沉积气体的热分解温度的超分解温度，从沉积气体的引入导致在制品的至少一个表面上沉积的涂层。 化学气相沉积工艺保持在0.01psia和200psia的压力范围内和/或沉积气体是二甲基硅烷。 涂覆制品包括经受腐蚀的基材和在基材上沉积的涂层，沉积的涂层具有硅，并具有耐腐蚀性。

公开(公告)号：US20150298165A1

公开(公告)日：2015-10-22

申请号：US14381616

申请日：2013-03-26

Applicant: SILCOTEK CORP.

Inventor： David A. SMITH

IPC: B05D1/00

Abstract: A coated article and a chemical vapor deposition process are disclosed. The coated article includes a functionalized layer applied to the coated article by chemical vapor deposition. The functionalized layer is a layer selected from the group consisting of an oxidized-then-functionalized layer, an organofluoro treated layer, a fluorosilane treated layer, a trimethylsilane treated surface, an organofluorotrialkoxysilanes treated layer, an organofluorosilylhydrides-treated layer, an organofluoro silyl treated layer, a tridecafluoro 1,1,2,2-tetrahydrooctylsilane treated layer, an organofluoro alcohol treated layer, a pentafluoropropanol treated layer, an allylheptafluoroisopropyl ether treated layer, a (perfluorobutyl) ethylene treated layer, a (perfluorooctyl) ethylene treated layer, and combinations thereof. The process includes applying the functionalized layer.

Abstract translation: 公开了涂覆制品和化学气相沉积工艺。 涂覆制品包括通过化学气相沉积施加到涂覆制品上的官能化层。 官能化层是选自氧化官能化层，有机氟处理层，氟硅烷处理层，三甲基硅烷处理表面，有机氟代三烷氧基硅烷处理层，有机氟代硅烷化处理层，有机氟甲硅烷基处理层 三氟代1,1,2,2-四氢辛基硅烷处理层，有机氟醇处理层，五氟丙醇处理层，烯丙基三氟异丙醚处理层，（全氟丁基）乙烯处理层，（全氟辛基）乙烯处理层，和 其组合。 该方法包括应用官能化层。

公开(公告)号：US20240327981A1

公开(公告)日：2024-10-03

申请号：US18743370

申请日：2024-06-14

Applicant: SILCOTEK CORP.

Inventor： Gary A. BARONE

IPC: C23C16/455 ,  C23C16/04 ,  C23C16/24

CPC classification number: C23C16/45523 ,  C23C16/24 ,  C23C16/045

Abstract: Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.

公开(公告)号：US11959894B2

公开(公告)日：2024-04-16

申请号：US16971216

申请日：2019-02-22

Applicant: SILCOTEK CORP.

Inventor： Jesse Bischof ,  Lucas D. Patterson ,  Gary Barone ,  Min Yuan ,  David A. Smith

IPC: G01N30/56 ,  B01D15/16 ,  B01D15/20 ,  B01D15/22 ,  B01D15/38 ,  G01N30/30 ,  G01N30/36 ,  B01J20/32 ,  G01N30/02 ,  G01N30/60

CPC classification number: G01N30/56 ,  B01D15/161 ,  B01D15/163 ,  B01D15/166 ,  B01D15/206 ,  B01D15/22 ,  B01D15/3828 ,  G01N30/30 ,  G01N30/36 ,  B01J20/3265 ,  G01N2030/027 ,  G01N2030/567 ,  G01N30/60

Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.

公开(公告)号：US20230258418A1

公开(公告)日：2023-08-17

申请号：US18018416

申请日：2021-06-16

Applicant: SILCOTEK CORP.

Inventor： Gary A. BARONE

IPC: F28F19/02

CPC classification number: F28F19/02 ,  F28F2265/20

Abstract: Heat exchanger processes are disclosed. A heat exchanger process uses a heat exchanger. The heat exchanger has a surface positioned to be contacted by a fluid. The heat exchanger process includes contacting the surface with the fluid by transporting the fluid through the heat exchanger and transferring heat between the surface and the fluid. The transporting is at a rate of less than 2 meters per second, the surface includes a fouling-resistant coating, the fluid includes particles known to cause fouling, or a combination thereof.

公开(公告)号：US20220025512A1

公开(公告)日：2022-01-27

申请号：US17297123

申请日：2019-11-29

Applicant: SILCOTEK CORP.

Inventor： Min YUAN

IPC: C23C16/02 ,  C22C21/00 ,  C23C16/56 ,  C23C16/18

Abstract: Fluid contact process, coated article, and coating processes are disclosed. The fluid contact process includes flowing a corrosive fluid to contact a coated article. The coated article includes an aluminum-containing substrate, a first region on the aluminum-containing substrate, the first region comprising carbon and silicon, a second region distal from the aluminum-containing substrate in comparison to the first region, the second region having oxygen at a greater concentration, by weight, than the first region, a third region distal from the first region in comparison to the second region, the third region comprising amorphous silicon. The coating process includes positioning the aluminum-containing substrate within an enclosed chamber, then, thermally decomposing dimethyl silane-and-silane-containing mixture within the enclosed chamber, then thermally oxidizing, and then, thermally decomposing silane.

公开(公告)号：US20210384601A1

公开(公告)日：2021-12-09

申请号：US17328317

申请日：2021-05-24

Applicant: SILCOTEK CORP.

Inventor： Min YUAN ,  Jesse BISCHOF

IPC: H01P3/08 ,  C23C16/24

Abstract: Dielectric coatings, articles having dielectric coatings, and systems including coating having dielectric coatings are disclosed. The dielectric article includes a substrate having hidden surfaces and a dielectric coating on the hidden surfaces of the substrate. The dielectric coating has a bulk resistivity of at least 108 Ω·cm and a thickness of between 30 nanometers and 3,000 nanometers.