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    Method and system for reducing curtaining in charged particle beam sample preparation
    33.
    发明授权
    Method and system for reducing curtaining in charged particle beam sample preparation 有权
    用于减少带电粒子束样品制备的方法和系统

    公开(公告)号：US09488554B2

    公开(公告)日：2016-11-08

    申请号：US14432711

    申请日：2013-10-07

    Applicant: FEI Company

    Inventor： Michael Schmidt ,  Hyun Hwa Kim ,  Sang Hoon Lee ,  Stacey Stone ,  Jeffrey Blackwood

    IPC: H01J37/00 ,  G01N1/32 ,  G01N1/28 ,  H01J37/20 ,  H01J37/305

    CPC classification number: G01N1/32 ,  G01N1/286 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/31745

    Abstract: A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.

    Abstract translation: 一种方法和系统，用于暴露用于在带电粒子束系统中观察的样品中的结构的一部分，包括从大量样品中提取样品; 确定减少绘制的样品的取向; 将样品安装到带电粒子束系统中的保持器上，使得保持器以样品取向使得当样品被研磨以暴露结构时减少绘制的取向; 通过在减少绘制的方向上研磨样品来暴露结构; 并对结构进行成像。

    AUTOMATED TEM SAMPLE PREPARATION
    34.
    发明申请
    AUTOMATED TEM SAMPLE PREPARATION 有权
    自动TEM样品制备

    公开(公告)号：US20160141147A1

    公开(公告)日：2016-05-19

    申请号：US14934837

    申请日：2015-11-06

    Applicant: FEI Company

    Inventor： Valerie Brogden ,  Jeffrey Blackwood ,  Michael Schmidt ,  Dhruti Trivedi ,  Richard J. Young ,  Thomas G. Miller ,  Brian Roberts Routh, JR. ,  Stacey Stone ,  Todd Templeton

    IPC: H01J37/302 ,  H01J37/28 ,  H01J37/31 ,  H01J37/285

    CPC classification number: H01J37/3023 ,  G01N1/286 ,  G01N2001/2873 ,  H01J37/28 ,  H01J37/285 ,  H01J37/3045 ,  H01J37/31 ,  H01J2237/208 ,  H01J2237/31745

    Abstract: Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition.

    Abstract translation: 描述了促进薄片的自动提取并将薄片附着到样品网格以便在透射电子显微镜上观察的技术。 本发明的一些实施例涉及使用机器视觉来确定薄片，探针和/或TEM网格的位置，以将探针附着到薄片并将薄片附接到TEM网格。 便于使用机器视觉的技术包括成形探针尖端，使得其位置可以被图像识别软件容易地识别。 图像减法技术可用于确定附着到探针上的薄片的位置，以将薄片移动到TEM网格以进行附着。 在一些实施例中，参考结构在探针上或在薄片上研磨以便于图像识别。

    Method for preparing thin samples for TEM imaging
    35.
    发明授权
    Method for preparing thin samples for TEM imaging 有权
    TEM成像薄样品的制备方法

    公开(公告)号：US09279752B2

    公开(公告)日：2016-03-08

    申请号：US14514199

    申请日：2014-10-14

    Applicant: FEI Company

    Inventor： Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

    IPC: H01J37/00 ,  G01N1/32 ,  G01N1/28 ,  H01J37/305 ,  H01L21/02 ,  H01J37/02

    CPC classification number: G01N1/32 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/02 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01L21/02318

    Abstract: A method and apparatus for preparing thin TEM samples in a manner that reduces or prevents bending and curtaining is realized. Embodiments of the present invention deposit material onto the face of a TEM sample during the process of preparing the sample. In some embodiments, the material can be deposited on a sample face that has already been thinned before the opposite face is thinned, which can serve to reinforce the structural integrity of the sample and refill areas that have been over-thinned due to a curtaining phenomena. In other embodiments, material can also be deposited onto the face being milled, which can serve to reduce or eliminate curtaining on the sample face.

    Abstract translation: 实现了以减少或防止弯曲和卷曲的方式制备薄TEM样品的方法和装置。 在制备样品的过程中，本发明的实施方案将材料沉积在TEM样品的表面上。 在一些实施例中，材料可以沉积在样品面上，该样品表面在相对面变薄之前已经变薄，这可以用于增强样品的结构完整性并且由于存在现象而已经被过度稀释的区域 。 在其他实施例中，材料也可以沉积到被研磨的面上，这可以用于减少或消除样品面上的绘制。

    DEPOSITING MATERIAL INTO HIGH ASPECT RATIO STRUCTURES
    36.
    发明申请
    DEPOSITING MATERIAL INTO HIGH ASPECT RATIO STRUCTURES 审中-公开
    沉积材料进入高比例比例结构

    公开(公告)号：US20150340235A1

    公开(公告)日：2015-11-26

    申请号：US14758043

    申请日：2013-12-30

    Applicant: FEI COMPANY

    Inventor： Sang Hoon Lee ,  Jeffrey Blackwood ,  Stacey Stone

    IPC: H01L21/26 ,  H01L21/285 ,  H01L21/768 ,  H01L21/02

    CPC classification number: H01L21/2605 ,  C23C16/045 ,  C23C16/047 ,  H01L21/02115 ,  H01L21/02277 ,  H01L21/0243 ,  H01L21/0262 ,  H01L21/02636 ,  H01L21/28556 ,  H01L21/76879 ,  H01L21/76898

    Abstract: A method is provided, along with a corresponding apparatus, for filling a high aspect ratio hole without voids or for producing high aspect ratio structures without voids. A beam having a diameter smaller than the diameter of the hole is directed into the hole to induced deposition beginning in the center region of the hole bottom. After an elongated structure is formed in the hole by the beam-induced deposition, a beam can then be scanned in a pattern at least as large as the hole diameter to fill the remainder of the hole. The high aspect ratio hole can then be cross-sectioned using an ion beam for observation without creating artefacts. When electron-beam-induced deposition is used, the electrons preferably have a high energy to reach the bottom of the hole, and the beam has a low current, to reduce spurious deposition by beam tails.

    Abstract translation: 提供了一种方法，连同相应的装置，用于填充没有空隙的高纵横比孔或用于产生没有空隙的高纵横比结构。 直径小于孔直径的梁被引导到孔中以在孔底的中心区域开始诱导沉积。 在通过光束沉积在孔中形成细长结构之后，可以以至少与孔直径一样大的图案扫描光束，以填充孔的其余部分。 然后可以使用离子束对高纵横比孔进行横截面观察而不产生伪影。 当使用电子束感应沉积时，电子优选具有高能量以到达孔的底部，并且光束具有低电流，以减少光束尾部的杂散沉积。

    Method and System for Reducing Curtaining in Charged Particle Beam Sample Preparation
    37.
    发明申请
    Method and System for Reducing Curtaining in Charged Particle Beam Sample Preparation 审中-公开
    降低带电粒子束样品制备的方法和系统

    公开(公告)号：US20150276567A1

    公开(公告)日：2015-10-01

    申请号：US14432711

    申请日：2013-10-07

    Applicant: FEI COMPANY

    Inventor： Michael Schmidt ,  Hyun Hwa Kim ,  Sang Hoon Lee ,  Stacey Stone ,  Jeffrey Blackwood

    IPC: G01N1/32 ,  H01J37/305 ,  H01J37/20

    CPC classification number: G01N1/32 ,  G01N1/286 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/31745

    Abstract: A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.

    Abstract translation: 一种方法和系统，用于暴露用于在带电粒子束系统中观察的样品中的结构的一部分，包括从大量样品中提取样品; 确定减少绘制的样品的取向; 将样品安装到带电粒子束系统中的保持器上，使得保持器以样品取向使得当样品被研磨以暴露结构时减少绘制的取向; 通过在减少绘制的方向上研磨样品来暴露结构; 并对结构进行成像。

    METHOD FOR PREPARING SAMPLES FOR IMAGING
    39.
    发明申请
    METHOD FOR PREPARING SAMPLES FOR IMAGING 有权
    制备图像样本的方法

    公开(公告)号：US20150179402A1

    公开(公告)日：2015-06-25

    申请号：US14572626

    申请日：2014-12-16

    Applicant: FEI Company

    Inventor： Ronald Kelley ,  Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

    IPC: H01J37/305 ,  C23C14/30

    CPC classification number: H01J37/3053 ,  B05D3/044 ,  C23C14/30 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2886 ,  H01J37/265 ,  H01J37/3056 ,  H01J2237/31745 ,  H01J2237/3348 ,  H01L21/02318

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

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