公开(公告)号：US20210223683A1

公开(公告)日：2021-07-22

申请号：US17223568

申请日：2021-04-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minhyun LEE ,  Hyeonjin SHIN ,  Seongjun JEONG ,  Seongjun PARK

IPC: G03F1/62 ,  G03F1/64

Abstract: A pellicle configured to protecting a photomask from external contaminants may include a metal catalyst layer and a pellicle membrane including a 2D material on the metal catalyst layer, wherein the metal catalyst layer supports edge regions of the pellicle membrane and does not support a central region of the pellicle membrane. The metal catalyst layer may be on a substrate, such that the substrate and the metal catalyst layer collectively support the edge region of the pellicle membrane and do not support the central region of the pellicle membrane. The pellicle may be formed based on growing the 2D material on the metal catalyst layer and etching an inner region of the metal catalyst layer that supports the central region of the formed pellicle membrane.

公开(公告)号：US20200161432A1

公开(公告)日：2020-05-21

申请号：US16749367

申请日：2020-01-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinseong HEO ,  Kiyoung LEE ,  Seongjun PARK

IPC: H01L29/16 ,  H01L31/113 ,  H01L31/028 ,  H01L45/00 ,  H01L29/786 ,  H01L29/24 ,  H01L29/66 ,  H01L29/08 ,  H01L29/267 ,  H01L33/26 ,  H01L29/778

Abstract: Example embodiments relate to a graphene device, methods of manufacturing and operating the same, and an electronic apparatus including the graphene device. The graphene device is a multifunctional device. The graphene device may include a graphene layer and a functional material layer. The graphene device may have a function of at least one of a memory device, a piezoelectric device, and an optoelectronic device within the structure of a switching device/electronic device. The functional material layer may include at least one of a resistance change material, a phase change material, a ferroelectric material, a multiferroic material, multistable molecules, a piezoelectric material, a light emission material, and a photoactive material.

公开(公告)号：US20190016906A1

公开(公告)日：2019-01-17

申请号：US15944920

申请日：2018-04-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsu SEOL ,  Sangwon KIM ,  Hyeonjin SHIN ,  Dongwook LEE ,  Seongjun PARK ,  Yunseong LEE ,  Seongjun JEONG ,  Alum JUNG

IPC: C09D7/63 ,  C07F3/02 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  H01L21/311 ,  H01L21/3213

Abstract: Provided are a hardmask composition including a structure represented by Formula 1 and a solvent, a method of forming a pattern using the hardmask composition, and a hardmask formed from the hardmask composition. wherein in Formula 1, R1 to R8, X, and M are described in detail in the detailed description.

公开(公告)号：US20180151763A1

公开(公告)日：2018-05-31

申请号：US15825388

申请日：2017-11-29

Applicant: Samsung Electronics Co., Ltd. ,  Research & Business Foundation Sungkyunkwan University

Inventor： Jinseong HEO ,  Kiyoung LEE ,  Seongjun PARK ,  Yongseon SHIN ,  Woojong YU

IPC: H01L31/032 ,  H01L29/423 ,  H01L29/06 ,  H01L29/66

Abstract: Semiconductor devices including two-dimensional (2D) materials and methods of manufacturing the semiconductor devices are provided. A semiconductor device may include a semiconductor layer including layers of a 2D material, and an intercalation material between the layers of the 2D material. The semiconductor device may further include a first conductive layer on a first surface of the semiconductor layer and a second conductive layer on a second surface of the semiconductor layer that is opposite the first surface. A portion of the 2D material may have a first crystalline structure, and another portion of the 2D material may have a second crystalline structure that is different from the first crystalline structure. The 2D material may include a metal chalcogenide-based material.

公开(公告)号：US20180130843A1

公开(公告)日：2018-05-10

申请号：US15800229

申请日：2017-11-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sanghyun JO ,  Jaeho LEE ,  Eunkyu LEE ,  Seongjun PARK ,  Kiyoung LEE ,  Jinseong HEO

IPC: H01L27/146

CPC classification number: H01L27/14667 ,  B82Y15/00 ,  H01L27/14636 ,  H01L31/0264 ,  H01L31/074

Abstract: Example embodiments relate to an image sensor configured to achieve a high photoelectric conversion efficiency and a low dark current. The image sensor includes first and second electrodes, a plurality of photodetection layers provided between the first and second electrodes, and an interlayer provided between the photodetection layers. The photodetection layers convert incident light into an electrical signal and include a semiconductor material. The interlayer includes a metallic or semi metallic material having anisotropy in electrical conductivity.

公开(公告)号：US20180061490A1

公开(公告)日：2018-03-01

申请号：US15448998

申请日：2017-03-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minhyun LEE ,  Seunggeol NAM ,  Changhyun KIM ,  Hyeonjin SHIN ,  Yeonchoo CHO ,  Jinseong HEO ,  Seongjun PARK

IPC: G11C13/00 ,  H01L45/00 ,  H01L27/24

CPC classification number: G11C13/0004 ,  G11C13/0069 ,  G11C13/0097 ,  H01L27/24 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/1253 ,  H01L45/141 ,  H01L45/142 ,  H01L45/143 ,  H01L45/144 ,  H01L45/1641

Abstract: A phase change memory device may include a phase change layer that includes a two-dimensional (2D) material. The phase change layer may include a layered structure that includes one or more layers of 2D material. The phase change layer may be provided between a first electrode and a second electrode, and the phase of at least a portion of one or more of the layers of 2D material may be changed based on an electrical signal applied to the phase change layer through the first electrode and the second electrode. The 2D material may include a chalcogenide-based material or phosphorene. The 2D material may be associated with a phase change temperature that is greater than or equal to about 200° C. and lower than or equal to about 500° C.

公开(公告)号：US20180047818A1

公开(公告)日：2018-02-15

申请号：US15439031

申请日：2017-02-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seunggeol NAM ,  Hyeonjin SHIN ,  Yeonchoo CHO ,  Minhyun LEE ,  Changhyun KIM ,  Seongjun PARK

IPC: H01L29/40 ,  H01L29/78

CPC classification number: H01L29/408 ,  H01L21/283 ,  H01L29/41725 ,  H01L29/456 ,  H01L29/66568 ,  H01L29/78 ,  H01L29/7839 ,  H01L29/786

Abstract: A semiconductor device includes a silicon semiconductor layer including at least one region doped with a first conductive type dopant, a metal material layer electrically connected to the doped region, and a self-assembled monolayer (SAM) between the doped region and the metal material layer, the SAM forming a molecular dipole on an interface of the silicon semiconductor layer in a direction of reducing a Schottky barrier height (SBH).

公开(公告)号：US20170033003A1

公开(公告)日：2017-02-02

申请号：US15172908

申请日：2016-06-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyunjae SONG ,  Seunggeol NAM ,  Seongjun PARK ,  Keunwook SHIN ,  Hyeonjin SHIN ,  Jaeho LEE ,  Changseok LEE ,  Yeonchoo CHO

IPC: H01L21/768 ,  H01L21/285 ,  H01L23/532 ,  H01L29/45

CPC classification number: H01L21/76846 ,  H01L21/28525 ,  H01L21/28568 ,  H01L23/485 ,  H01L23/53209 ,  H01L23/53238 ,  H01L23/53266 ,  H01L23/53271 ,  H01L29/45

Abstract: A multilayer structure includes a first material layer, a second material layer, and a diffusion barrier layer. The second material layer is connected to the first material layer. The second material layer is spaced apart from the first material layer. The diffusion barrier layer is between the first material layer and the second material layer. The diffusion barrier layer may include a two-dimensional (2D) material. The 2D material may be a non-graphene-based material, such as a metal chalcogenide-based material having a 2D crystal structure. The first material layer may be a semiconductor or an insulator, and the second material layer may be a conductor. At least a part of the multilayer structure may constitute an interconnection for an electronic device.

Abstract translation: 多层结构包括第一材料层，第二材料层和扩散阻挡层。 第二材料层连接到第一材料层。 第二材料层与第一材料层间隔开。 扩散阻挡层在第一材料层和第二材料层之间。 扩散阻挡层可以包括二维（2D）材料。 2D材料可以是非石墨烯材料，例如具有2D晶体结构的金属硫族化物基材料。 第一材料层可以是半导体或绝缘体，第二材料层可以是导体。 多层结构的至少一部分可以构成电子设备的互连。

公开(公告)号：US20170025273A1

公开(公告)日：2017-01-26

申请号：US14984189

申请日：2015-12-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Keunwook SHIN ,  Minsu SEOL ,  Hyeonjin SHIN ,  Sangwon KIM ,  Seongjun PARK

IPC: H01L21/033 ,  H01L21/027 ,  H01L21/311 ,  H01L21/3215 ,  H01L21/02

CPC classification number: H01L21/0332 ,  H01L21/02118 ,  H01L21/02274

Abstract: A 2D material hard mask includes hydrogen, oxygen, and a 2D material layer having a layered crystalline structure. The 2D material layer may be a material layer including one of a carbon structure (for example, a graphene sheet) and a non-carbon structure.

Abstract translation: 2D材料硬掩模包括氢，氧和具有层状晶体结构的2D材料层。 2D材料层可以是包括碳结构（例如，石墨烯片）和非碳结构之一的材料层。

公开(公告)号：US20160359062A1

公开(公告)日：2016-12-08

申请号：US14932701

申请日：2015-11-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinseong HEO ,  Kiyoung LEE ,  Jaeho LEE ,  Sangyeob LEE ,  Eunkyu LEE ,  Seongjun PARK

IPC: H01L31/0352 ,  H01L31/18 ,  H01L31/0264

CPC classification number: H01L31/0352 ,  H01L31/0264 ,  H01L31/028 ,  H01L31/032 ,  H01L31/035218 ,  H01L31/036 ,  H01L31/112 ,  H01L31/18 ,  Y02E10/547

Abstract: An optical device including a two-dimensional material and a method of manufacturing the same are provided. The optical device may include a barrier stack formed on a bottom channel layer, a top channel layer formed on the barrier stack, a drain electrode connected to the bottom channel layer, a source electrode formed on a substrate. The barrier stack may include two or more barrier layers, and one or more channel units at least partially interposing between the barrier layers. Channel units connected to the drain electrode and channel units connected to the source electrode may be formed, in an alternating sequence, between barrier layers included in the barrier stack. The barrier layers may each have a thickness which is less than a distance which may be traveled by electrons and holes generated by photo absorption prior to recombination. As a result, the optical device may provide improved photo separation efficiency.

Abstract translation: 提供了包括二维材料的光学装置及其制造方法。 光学器件可以包括形成在底部沟道层上的势垒堆叠，形成在势垒堆叠上的顶部沟道层，连接到底部沟道层的漏电极，形成在衬底上的源电极。 势垒堆叠可以包括两个或更多个阻挡层，以及至少部分地插入阻挡层之间的一个或多个沟道单元。 连接到漏电极的通道单元和连接到源极的通道单元可以以交替的顺序形成在阻挡叠层中包括的阻挡层之间。 阻挡层可以各自具有小于在复合之前由光吸收产生的电子和空穴行进的距离的厚度。 结果，光学装置可以提供改善的光分离效率。