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    Airplane fuel supply system and airplane wing pipeline assembly method
    33.
    发明授权
    Airplane fuel supply system and airplane wing pipeline assembly method 有权
    飞机燃油供应系统和飞机机翼管道装配方法

    公开(公告)号：US06736354B2

    公开(公告)日：2004-05-18

    申请号：US10356616

    申请日：2003-02-03

    申请人： Kenichi Goto ,  Toshiaki Fujii

    发明人： Kenichi Goto ,  Toshiaki Fujii

    IPC分类号： B64D3700

    CPC分类号： B64D37/08 ,  B64D37/20 ,  B64D37/28 ,  Y02T50/44 ,  Y10T137/86196

    摘要： An airplane fuel supply system includes a wing fuel tank that is formed from a wing tip fuel tank having a wing tip fuel pump; a central fuel tank having a central fuel pump; and a wing root fuel tank having a wing root fuel pump. Fuel movement from the wing tip fuel tank to the central fuel tank is allowed by a flapper valve, and fuel movement from the central fuel tank to the wing root fuel tank is allowed by another flapper valve. When the fuel delivery volume of the wing tip fuel pump is represented by Vt, the fuel delivery volume of the central fuel pump is represented by Vc, the fuel delivery volume of the wing root fuel pump is represented by Vr, and the fuel delivery volume from a collector tank to the engine is represented by Ve, the fuel delivery volumes Vt, Vc, Vr, and Ve are set so as to satisfy the relationships Vr>Ve, Vt+Vc>Ve, and Vc

    摘要翻译： 飞机燃料供应系统包括翼型燃料箱，其由具有翼尖燃料泵的翼尖燃料箱形成; 具有中央燃料泵的中央燃料箱; 以及具有翼根燃料泵的翼根燃料箱。 通过挡板阀允许从翼尖燃料箱到中央燃料箱的燃料运动，并且另一个挡板阀允许从中央燃料箱到翼根燃料箱的燃料运动。 当翼顶燃料泵的燃料输送量由Vt表示时，中央燃料泵的燃料输送量由Vc表示，翼根燃料泵的燃料输送量由Vr表示，燃料输送量 从收集箱到发动机的速度由Ve表示，燃料输送量Vt，Vc，Vr和Ve被设定为满足Vr> Ve，Vt + Vc> Ve和Vc

    Method for removing particles from a surface of an article
    35.
    发明授权
    Method for removing particles from a surface of an article 失效
    从制品表面去除颗粒的方法

    公开(公告)号：US06240931B1

    公开(公告)日：2001-06-05

    申请号：US08963685

    申请日：1997-11-04

    申请人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

    发明人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

    IPC分类号： B08B312

    CPC分类号： H01L21/02046 ,  B08B6/00 ,  H01L21/67028 ,  Y10S134/902

    摘要： A method for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

    摘要翻译： 一种用于从洁净室中的诸如半导体晶片的物品的表面去除颗粒的方法。 颗粒被带有电荷。 随后，当施加电场以从表面驱走带电粒子时，将超声波或气流施加到制品的表面上，从而从表面除去尺寸小于1微米的颗粒。 收集构件的存在允许去除所得到的浮动颗粒。

    Method and apparatus for removing particles from surface of article
    36.
    发明授权
    Method and apparatus for removing particles from surface of article 失效
    从制品表面去除颗粒的方法和装置

    公开(公告)号：US06205676B1

    公开(公告)日：2001-03-27

    申请号：US09131914

    申请日：1998-08-10

    申请人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

    发明人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

    IPC分类号： F26B334

    CPC分类号： H01L21/02046 ,  B08B6/00 ,  H01L21/67028 ,  Y10S134/902

    摘要： An apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

    摘要翻译： 一种用于从洁净室中的诸如半导体晶片的物品的表面去除颗粒的设备。 颗粒被带有电荷。 随后，当施加电场以从表面驱走带电粒子时，将超声波或气流施加到制品的表面上，从而从表面除去尺寸小于1微米的颗粒。 收集构件的存在允许去除所得到的浮动颗粒。

    Focused ion beam apparatus and method
    37.
    发明授权
    Focused ion beam apparatus and method 失效
    聚焦离子束装置及方法

    公开(公告)号：US5574280A

    公开(公告)日：1996-11-12

    申请号：US204468

    申请日：1994-03-01

    申请人： Toshiaki Fujii ,  Tatsuya Adachi

    发明人： Toshiaki Fujii ,  Tatsuya Adachi

    IPC分类号： H01J37/28 ,  G01Q90/00 ,  H01J37/305 ,  H01J37/31 ,  H01J37/317 ,  H01L21/265 ,  H01L21/306 ,  H01J37/30

    CPC分类号： H01L21/02052 ,  H01J37/3056 ,  H01J37/317 ,  H01J2237/31744 ,  H01J2237/31745

    摘要： A sample semiconductor device which is processed and/or observed with the focused liquid metal ion beam can be returned again to the manufacturing process in this invention. The metal ions used in this apparatus are generally Ga ions. Ga ions contaminate a semiconductor device and a semiconductor manufacturing apparatus by auto-doping. An area which is irradiated with a focused liquid metal ion is doped by the metal ions which are subsequently removed by irradiation with a gas ion beam or covered by hard fusing metal.

    摘要翻译： 用聚焦液态金属离子束进行加工和/或观察的半导体器件可再次返回到本发明的制造工艺中。 在该装置中使用的金属离子通常是Ga离子。 Ga离子通过自动掺杂污染半导体器件和半导体制造装置。 被聚焦液体金属离子照射的区域被金属离子掺杂，金属离子随后通过用气体离子束照射或被硬熔融金属覆盖而被去除。

    Focused ion beam apparatus
    38.
    发明授权
    Focused ion beam apparatus 失效
    聚焦离子束装置

    公开(公告)号：US5438197A

    公开(公告)日：1995-08-01

    申请号：US272545

    申请日：1994-07-11

    申请人： Toshiaki Fujii ,  Yasuhiko Sugiyama

    发明人： Toshiaki Fujii ,  Yasuhiko Sugiyama

    IPC分类号： G01Q90/00 ,  H01J37/244 ,  H01J37/30 ,  H01J37/28

    CPC分类号： H01J37/244 ,  H01J37/3005 ,  H01J2237/2448

    摘要： A focussed ion-beam apparatus, to realize the simultaneous observation of both the brighter area and the darker area on the sample, which are generated because of the difference in the generation efficiency of the secondary charged particle due to the ion-beam irradiation. According to the result in the comparison of the output signal from the secondary charged particle detector with the reference voltage, to optimize the signal above as the input signal for the image display. To realize the simultaneous observation of both the brighter area and the darker area of the sample.

    摘要翻译： 一种聚焦离子束装置，用于实现由于离子束照射引起的二次带电粒子的产生效率的差异而产生的样品上较亮区域和较暗区域的同时观察。 根据将二次带电粒子检测器的输出信号与参考电压进行比较的结果，优化上述作为图像显示输入信号的信号。 实现同时观察样品的较亮区域和较暗区域。

    Photoelectron emitting member and method of electrically charging fine particles with photoelectrons
    39.
    发明授权
    Photoelectron emitting member and method of electrically charging fine particles with photoelectrons 失效
    光电子发射元件及其电子电荷精细粒子的方法

    公开(公告)号：US5154733A

    公开(公告)日：1992-10-13

    申请号：US664853

    申请日：1991-03-05

    申请人： Toshiaki Fujii ,  Kazuhiko Sakamoto

    发明人： Toshiaki Fujii ,  Kazuhiko Sakamoto

    IPC分类号： B03C3/38 ,  G01N15/02 ,  H01J1/34

    CPC分类号： H01J1/34 ,  B03C3/383 ,  G01N15/0266 ,  H01J2201/3425

    摘要： A photoelectron emitting member and method of electrically charging fine particles with photoelectrons, wherein the member includes a matrix that is at least composed of a material capable of transmitting ultraviolet rays and a material that is provided on the surface of the matrix or in its neighborhood and which emits photoelectrons upon irradiation with ultraviolet rays or sunlight. The member emitting photoelectrons upon irradiation with ultraviolet rays or sunlight is disposed in an electric field from the side opposite to the irradiated side. The member permits efficient utilization of the energy of ultraviolet rays. When sunlight is applied to the member to have it emit photoelectrons, particles can be electrically charged with energy costs being reduced to substantially zero.

    Composite focused ion beam device, and processing observation method and processing method using the same
    40.
    发明授权
    Composite focused ion beam device, and processing observation method and processing method using the same 有权
    复合聚焦离子束装置及其加工方法及处理方法

    公开(公告)号：US08269194B2

    公开(公告)日：2012-09-18

    申请号：US12733089

    申请日：2008-08-06

    申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

    发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

    IPC分类号： H01J49/00

    CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

    摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

    摘要翻译： 复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统 样品。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。 第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。