公开(公告)号：US5664989A

公开(公告)日：1997-09-09

申请号：US683265

申请日：1996-07-18

申请人： Rempei Nakata ,  Hisashi Kaneko ,  Nobuo Hayasaka ,  Takeshi Nishioka ,  Yoshikuni Tateyama ,  Yutaka Nakano ,  Yasutaka Sasaki

发明人： Rempei Nakata ,  Hisashi Kaneko ,  Nobuo Hayasaka ,  Takeshi Nishioka ,  Yoshikuni Tateyama ,  Yutaka Nakano ,  Yasutaka Sasaki

IPC分类号： B24B37/20 ,  B24B37/22 ,  B24B37/24 ,  B24D13/14 ,  C08J5/14 ,  H01L21/304 ,  B24B1/00

CPC分类号： B24B37/22

摘要： A polishing pad comprises at least a first layer having a first main surface serving to polish a substrate to be polished and a second main surface, and a second layer positioned to face the second main surface of the first layer and having fine bags arranged therein, fluid being hermetically sealed in the fine bag.

摘要翻译： 抛光垫至少包括具有用于抛光待抛光基板的第一主表面和第二主表面的第一层，以及设置成面对第一层的第二主表面并且具有布置在其中的细小袋的第二层， 流体密封在细袋中。

公开(公告)号：US5590001A

公开(公告)日：1996-12-31

申请号：US346370

申请日：1994-11-29

申请人： Tsuneyori Ino ,  Tsuyoshi Furukawa ,  Masaki Jinbo ,  Hisashi Kaneko ,  Shinichi Fukuzawa ,  Masaharu Sugimoto ,  Yoshiaki Nagasawa ,  Katsuaki Ishida ,  Osamu Yamazaki ,  Yukihiro Komura ,  Tomoo Sukagawa

发明人： Tsuneyori Ino ,  Tsuyoshi Furukawa ,  Masaki Jinbo ,  Hisashi Kaneko ,  Shinichi Fukuzawa ,  Masaharu Sugimoto ,  Yoshiaki Nagasawa ,  Katsuaki Ishida ,  Osamu Yamazaki ,  Yukihiro Komura ,  Tomoo Sukagawa

IPC分类号： G11B25/04 ,  G11B33/14

CPC分类号： G11B25/043 ,  G11B33/1486

摘要： A breather filter unit for a magnetic disk drive including a base and a cover fixed to the base, the cover having a vent. The breather filter unit includes a casing fixed to an inner surface of the cover, the casing having a vent inlet communicating with the vent of the cover and a vent outlet communicating with an inside of the magnetic disk drive, and a first filter contained in the casing at a position adjacent to the vent inlet, the first filter being formed from a plurality of fibers extending in a direction substantially parallel to that of an air flow from the vent inlet to the vent outlet. The breather filter unit further includes a second filter bonded to the casing so as to cover the vent outlet, and an activated carbon layer contained in the casing at a position between the first filter and the second filter.

摘要翻译： 一种用于磁盘驱动器的通气过滤器单元，其包括基座和固定到基座的盖，盖具有通风口。 所述通气过滤器单元包括固定到所述盖的内表面的外壳，所述壳体具有与所述盖的通气孔连通的排气入口和与所述磁盘驱动器的内部连通的排气口，以及包含在所述外罩中的第一过滤器 壳体在与排气口相邻的位置处，第一过滤器由多个纤维形成，所述多个纤维沿着与从通气口入口到通风出口的空气流大致平行的方向延伸。 通气过滤器单元还包括结合到壳体以覆盖通气口的第二过滤器，以及在第一过滤器和第二过滤器之间的位置处容纳在壳体中的活性炭层。

公开(公告)号：US20100115479A1

公开(公告)日：2010-05-06

申请号：US12654865

申请日：2010-01-07

申请人： Masaaki Hatano ,  Motoya Okazaki ,  Junichi Wada ,  Takeshi Nishioka ,  Hisashi Kaneko ,  Takeshi Fujimaki ,  Kazuyuki Higashi ,  Kanji Yoshida ,  Noriaki Matsunaga

发明人： Masaaki Hatano ,  Motoya Okazaki ,  Junichi Wada ,  Takeshi Nishioka ,  Hisashi Kaneko ,  Takeshi Fujimaki ,  Kazuyuki Higashi ,  Kanji Yoshida ,  Noriaki Matsunaga

IPC分类号： G06F17/50

CPC分类号： G06F17/5068

摘要： A method for generating a pattern includes reading out an interconnect layout and a hole layout, the interconnect layout prescribing interconnect patterns, the hole layout prescribing hole patterns configured to connect to the interconnect patterns; extracting one of the hole patterns to be connected within the same interconnect layer level to one of the interconnect patterns in a pattern processing area; extracting a first processing area including the extracted hole pattern; calculating a first pattern density of the interconnect patterns included in the first processing area; and generating first additional patterns in the first processing area based on the first pattern density.

摘要翻译： 一种用于产生图案的方法包括：读出互连布局和孔布局;布置规定互连图案的布局布局;布置配置为连接到互连图案的孔图案的孔布局; 在图案处理区域中将在相同互连层级中连接的孔图案中的一个提取到所述互连图案之一; 提取包括所提取的孔图案的第一处理区域; 计算包括在第一处理区域中的互连图案的第一图案密度; 以及基于所述第一图案密度在所述第一处理区域中生成第一附加图案。

公开(公告)号：US07635646B2

公开(公告)日：2009-12-22

申请号：US12128789

申请日：2008-05-29

申请人： Seiichi Omoto ,  Hisashi Kaneko ,  Masahiko Hasunuma

发明人： Seiichi Omoto ,  Hisashi Kaneko ,  Masahiko Hasunuma

IPC分类号： H01L21/44

CPC分类号： H01L21/76852 ,  H01L21/7682 ,  H01L21/76834 ,  H01L21/76885 ,  H01L23/5222 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for fabricating a semiconductor device, includes forming a first dielectric film above a substrate, forming an opening in the first dielectric film, forming a catalytic characteristic film using at least one of a metal having catalytic characteristics and a conductive oxide having catalytic characteristics as its material on sidewalls and at a bottom of the opening, depositing a conductive material film using a conductive material in the opening in which the catalytic characteristic film is formed on the sidewalls and at the bottom, removing the catalytic characteristic film formed on the sidewalls of the opening, and forming a second dielectric film above the first dielectric film and the conductive material film after the removing.

摘要翻译： 一种制造半导体器件的方法，包括在衬底上形成第一电介质膜，在第一介电膜中形成开口，使用具有催化特性的金属和具有催化特性的导电氧化物中的至少一种形成催化特性膜， 其材料在侧壁和开口的底部，在开口中使用导电材料沉积导电材料膜，在该开口中，在侧壁和底部形成催化特征膜，除去形成在侧壁上的催化特性膜 并且在去除之后在第一电介质膜和导电材料膜之上形成第二电介质膜。

公开(公告)号：US07601638B2

公开(公告)日：2009-10-13

申请号：US11926614

申请日：2007-10-29

申请人： Masahiko Hasunuma ,  Hisashi Kaneko ,  Hiroshi Toyoda

发明人： Masahiko Hasunuma ,  Hisashi Kaneko ,  Hiroshi Toyoda

IPC分类号： H01L21/4763

CPC分类号： H01L21/76877 ,  C23C26/00 ,  C25D5/02 ,  C25D5/18 ,  C25D5/50 ,  C25D7/123 ,  H01L21/2885

摘要： A method for manufacturing a semiconductor device includes forming, on a substrate having a recessed portion on a surface, a plating film which is at least buried in the recessed portion and has a higher impurity concentration in an upper portion than in a lower portion, thermally treating the plating film, and removing the thermally treated plating film except for a portion buried in the recessed portion.

摘要翻译： 一种半导体器件的制造方法，其特征在于，在具有表面的凹部的基板上形成至少埋设在所述凹部内并且在上部比在下部具有较高的杂质浓度的镀膜 处理镀膜，除去除了凹部中的部分以外的热处理电镀膜。

公开(公告)号：US20080299766A1

公开(公告)日：2008-12-04

申请号：US12128789

申请日：2008-05-29

申请人： Seiichi OMOTO ,  Hisashi Kaneko ,  Masahiko Hasunuma

发明人： Seiichi OMOTO ,  Hisashi Kaneko ,  Masahiko Hasunuma

IPC分类号： H01L21/44

CPC分类号： H01L21/76852 ,  H01L21/7682 ,  H01L21/76834 ,  H01L21/76885 ,  H01L23/5222 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for fabricating a semiconductor device, includes forming a first dielectric film above a substrate, forming an opening in the first dielectric film, forming a catalytic characteristic film using at least one of a metal having catalytic characteristics and a conductive oxide having catalytic characteristics as its material on sidewalls and at a bottom of the opening, depositing a conductive material film using a conductive material in the opening in which the catalytic characteristic film is formed on the sidewalls and at the bottom, removing the catalytic characteristic film formed on the sidewalls of the opening, and forming a second dielectric film above the first dielectric film and the conductive material film after the removing.

摘要翻译： 一种制造半导体器件的方法，包括在衬底上形成第一电介质膜，在第一介电膜中形成开口，使用具有催化特性的金属和具有催化特性的导电氧化物中的至少一种形成催化特性膜， 其材料在侧壁和开口的底部，在开口中使用导电材料沉积导电材料膜，在该开口中，在侧壁和底部形成催化特征膜，除去形成在侧壁上的催化特性膜 并且在去除之后在第一电介质膜和导电材料膜之上形成第二电介质膜。

公开(公告)号：US20070153427A1

公开(公告)日：2007-07-05

申请号：US11698035

申请日：2007-01-26

申请人： Mitsuhiro Izumi ,  Mitsuaki Yoshida ,  Hisashi Kaneko ,  Tsuneyori Ino ,  Yukihiro Komura ,  Shinji Fujimoto ,  Kei Funabashi

发明人： Mitsuhiro Izumi ,  Mitsuaki Yoshida ,  Hisashi Kaneko ,  Tsuneyori Ino ,  Yukihiro Komura ,  Shinji Fujimoto ,  Kei Funabashi

IPC分类号： G11B5/55

CPC分类号： G11B33/121 ,  G11B5/4846 ,  G11B33/08 ,  G11B33/122 ,  H05K1/0269 ,  H05K1/0393 ,  H05K3/0058 ,  H05K3/281 ,  H05K3/363 ,  H05K2201/0133 ,  H05K2201/058 ,  H05K2201/09063 ,  H05K2201/0989 ,  H05K2201/099 ,  H05K2201/09918 ,  H05K2201/10386 ,  H05K2201/10409 ,  H05K2201/10598 ,  H05K2201/2045 ,  H05K2203/0191 ,  H05K2203/166 ,  H05K2203/167

摘要： A fixing member is spaced from a head actuator by a predetermined distance. A flexible printed circuit board extends at least from the head actuator to the fixing member. The flexible printed circuit board is superposed on the surface of the fixing member. A viscoelastic layer and a protecting layer are overlaid on the surface of the flexible printed circuit board. A clip clips all the fixing member, the flexible printed circuit board, the viscoelastic layer and the protecting layer together. When a head slider is positioned, the head actuator changes its attitude relative to a recording disk. The inertial force based on the rotation causes the first flexible printed circuit board to vibrate when the actuator block stops rotating. The viscoelastic layer serves to absorb this residual vibration of the first flexible printed circuit board. Vibration of the flexible printed circuit board can be suppressed.

摘要翻译： 固定构件与头致动器间隔预定距离。 柔性印刷电路板至少从头致动器延伸到固定构件。 柔性印刷电路板叠置在固定部件的表面上。 粘弹性层和保护层覆盖在柔性印刷电路板的表面上。 A夹将所有固定构件，柔性印刷电路板，粘弹性层和保护层夹在一起。 当头部滑块定位时，头部致动器相对于记录盘改变其姿态。 当致动器块停止转动时，基于旋转的惯性力使第一柔性印刷电路板振动。 粘弹性层用于吸收第一柔性印刷电路板的残余振动。 可以抑制柔性印刷电路板的振动。

公开(公告)号：US20050190505A1

公开(公告)日：2005-09-01

申请号：US10901214

申请日：2004-07-29

申请人： Shinji Fujimoto ,  Masato Shibuya ,  Hisashi Kaneko ,  Tsuneyori Ino ,  Yukihiro Komura ,  Mitsuhiro Izumi ,  Kei Funabashi

发明人： Shinji Fujimoto ,  Masato Shibuya ,  Hisashi Kaneko ,  Tsuneyori Ino ,  Yukihiro Komura ,  Mitsuhiro Izumi ,  Kei Funabashi

IPC分类号： G11B21/02 ,  G11B5/54 ,  G11B5/55 ,  G11B21/22 ,  G11B21/08

CPC分类号： G11B5/5569 ,  G11B5/54

摘要： A magnetic disk device comprises a magnetic disk in which a data zone is formed. An actuator has a voice coil and a head slider carrying a magnetic head, the actuator being swung to move the magnetic head over the disk between an innermost position of the data zone and an outermost position of the data zone. A magnet has a magnetization center and is opposed to the voice coil so that a voice coil motor which swings the actuator is formed, the magnet having a north pole and a south pole confronting each other via the magnetization center. The magnetic disk device is provided so that a deviation of a center of the voice coil from the magnetization center when the magnetic head is in the innermost position of the data zone is substantially equal to a deviation of the center of the voice coil from the magnetization center when the magnetic head is in the outermost position of the data zone.

摘要翻译： 磁盘装置包括形成数据区的磁盘。 致动器具有音圈和携带磁头的磁头滑块，所述致动器摆动以使磁头在数据区的最内位置和数据区的最外位置之间的磁盘上移动。 磁体具有磁化中心并且与音圈相对，从而形成摆动致动器的音圈电动机，磁体具有通过磁化中心彼此相对的北极和南极。 提供磁盘装置，使得当磁头处于数据区的最内位置时，音圈的中心与磁化中心的偏差基本上等于音圈的中心与磁化的偏差 当磁头位于数据区的最外侧位置时居中。

公开(公告)号：US06897143B2

公开(公告)日：2005-05-24

申请号：US10600568

申请日：2003-06-23

申请人： Hiroshi Toyoda ,  Hiroyuki Yano ,  Gaku Minamihaba ,  Dai Fukushima ,  Tetsuo Matsuda ,  Hisashi Kaneko

发明人： Hiroshi Toyoda ,  Hiroyuki Yano ,  Gaku Minamihaba ,  Dai Fukushima ,  Tetsuo Matsuda ,  Hisashi Kaneko

IPC分类号： H01L21/304 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  H01L21/4763

CPC分类号： H01L21/76846 ,  H01L21/31053 ,  H01L21/3212 ,  H01L21/76819 ,  H01L21/76831 ,  H01L21/76834 ,  H01L21/7684 ,  H01L21/76849 ,  H01L23/5222 ,  H01L23/53238 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method of forming a cap film comprises a first polishing step of performing a polishing operation at selectivity of R1 (=removal rate for the cap film/removal rate for the insulating film), and a second polishing step of performing a polishing operation at selectivity of R2 (=removal rate for the cap film/removal rate for the insulating film). Each of the polishing operations is performed by using a slurry having the condition of R1>R2. By performing the polishing operations at different selectivity, the cap film free from problems such as dishing of the cap film and the residual cap film on side walls of a recess is formed. Consequently, a semiconductor device having an excellent RC characteristic can be provided.

摘要翻译： 形成盖膜的方法包括以R 1的选择性（=盖膜的去除速率/绝缘膜的去除速率）进行抛光操作的第一抛光步骤，以及进行抛光操作的第二抛光步骤 R 2的选择性（=盖膜的去除率/绝缘膜的去除率）。 通过使用条件为R 1> R 2的浆料进行每次研磨操作。 通过以不同的选择性进行抛光操作，形成了帽膜没有诸如凹陷的盖膜和残留帽膜之间的问题。 因此，可以提供具有优异RC特性的半导体器件。

公开(公告)号：US20050075854A1

公开(公告)日：2005-04-07

申请号：US10757415

申请日：2004-01-15

申请人： Hisashi Kaneko ,  Motoya Okazaki ,  Hiroyuki Toshima

发明人： Hisashi Kaneko ,  Motoya Okazaki ,  Hiroyuki Toshima

IPC分类号： H01L21/66 ,  G06F17/50 ,  H01L21/3205 ,  H01L21/768 ,  H01L23/52 ,  G06F9/45

CPC分类号： G06F17/5068

摘要： According to an aspect of the present invention, there is provided a simulation circuit pattern evaluation method including: designing an aggregate of simulation circuit patterns, which simulate a circuit pattern of a semiconductor integrated circuit, by combining plural geometrical structure defining parameters respectively having at least two states in such a manner that the respective states appear the same number of times in the respective geometrical structure defining parameters; forming the aggregate of the simulation circuit patterns on a substrate; and evaluating the formed aggregate of the simulation circuit patterns.

摘要翻译： 根据本发明的一个方面，提供了一种仿真电路图案评估方法，包括：通过组合多个几何结构来设计模拟电路图案的集合，模拟电路图案模拟半导体集成电路的电路图案， 两种状态使得各个状态在相应的几何结构定义参数中出现相同的次数; 在基板上形成模拟电路图案的集合体; 并对所形成的仿真电路图案进行评估。