Semiconductor contact structure
    35.
    发明授权
    Semiconductor contact structure 有权
    半导体接触结构

    公开(公告)号:US07466028B1

    公开(公告)日:2008-12-16

    申请号:US11873037

    申请日:2007-10-16

    摘要: A semiconductor device structure for a three-dimensional integrated circuit is provided. The semiconductor device structure includes: a substrate having a first surface and a second surface; a via defined in the substrate and extending from the first surface to the second surface; and a first plurality of contact structures on the first surface contacting the via. A cross section of each of the first plurality of contact structures parallel to the first surface has a first side and a second side, and a ratio of the longer side to the shorter side of the first side and the second side is more than about 2:1.

    摘要翻译: 提供了一种用于三维集成电路的半导体器件结构。 半导体器件结构包括:具有第一表面和第二表面的衬底; 通孔,其限定在所述基板中并且从所述第一表面延伸到所述第二表面; 以及在所述第一表面上接触所述通孔的第一多个接触结构。 平行于第一表面的第一多个接触结构中的每一个的横截面具有第一侧和第二侧,并且第一侧和第二侧的长边与短边的比例大于约2 :1。

    Wafer Bonding
    36.
    发明申请
    Wafer Bonding 有权
    晶圆贴合

    公开(公告)号:US20080268614A1

    公开(公告)日:2008-10-30

    申请号:US11740178

    申请日:2007-04-25

    IPC分类号: H01L21/30

    CPC分类号: H01L21/2007

    摘要: A method for providing a stacked wafer configuration is provided. The method includes bonding a first wafer to a second wafer. A filler material is applied in a gap formed along edges of the first wafer and the second wafer. The filler material provides support along the edges during a thinning and transportation process to help reduce cracking or chipping. The filler material may be cured to reduce any bubbling that may have occurred while applying the filler material. Thereafter, the second wafer may be thinned by grinding, plasma etching, wet etching, or the like. In some embodiments of the present invention, this process may be repeated multiple times to create a stacked wafer configuration having three or more stacked wafers.

    摘要翻译: 提供一种用于提供堆叠晶片配置的方法。 该方法包括将第一晶片接合到第二晶片。 将填料施加在沿着第一晶片和第二晶片的边缘形成的间隙中。 填充材料在减薄和运输过程中沿着边缘提供支撑以帮助减少开裂或碎裂。 可以固化填充材料以减少在施加填充材料时可能发生的任何起泡。 此后,可以通过研磨,等离子体蚀刻,湿蚀刻等来减薄第二晶片。 在本发明的一些实施例中,该过程可以重复多次以产生具有三个或更多个堆叠晶片的堆叠晶片配置。