公开(公告)号：US20090238225A1

公开(公告)日：2009-09-24

申请号：US12454763

申请日：2009-05-22

申请人： Chaofeng Huang ,  Paul C. Melcher ,  Richard M. Ness

发明人： Chaofeng Huang ,  Paul C. Melcher ,  Richard M. Ness

IPC分类号： H01S3/00 ,  H01S3/22

CPC分类号： H01S3/097 ,  H01S3/04 ,  H01S3/09702 ,  H01S3/0975 ,  H01S3/225 ,  H03K3/57 ,  H03K17/127 ,  H03K17/567 ,  H03K17/6872 ,  H03K17/785

摘要： A method and apparatus for operating a very high repetition gas discharge laser system magnetic switch pulsed power system is disclosed, which may comprise a solid state switch, a charging power supply electrically connected to one side of the solid state switch; a charging inductor electrically connected to the other side of the solid state switch; a deque circuit electrically in parallel with the solid state switch comprising a deque switch; a peaking capacitor electrically connected to the charging inductor, a peaking capacitor charging control system operative to charge the peaking capacitor by opening the deque switch and leaving the solid state switch open and then shutting the solid state switch. The solid state switch may comprise a plurality of solid state switches electrically in parallel.

摘要翻译： 公开了一种用于操作非常高重复气体放电激光系统磁开关脉冲功率系统的方法和装置，其可以包括固态开关，电连接到固态开关的一侧的充电电源; 充电电感器电连接到固态开关的另一侧; 与固态开关并联电路的德克电路，其包括德克式开关; 与充电电感器电连接的峰值电容器，峰值电容器充电控制系统，其操作以通过打开所述开关开关并使固态开关断开并且然后关断所述固态开关来对所述峰值电容器充电。 固态开关可以并联电连接多个固态开关。

公开(公告)号：US07535948B2

公开(公告)日：2009-05-19

申请号：US11488205

申请日：2006-07-18

申请人： Thomas D. Steiger ,  Joshua C. Brown ,  Thomas P. Duffey ,  Walter D. Gillespie ,  Richard G. Morton

发明人： Thomas D. Steiger ,  Joshua C. Brown ,  Thomas P. Duffey ,  Walter D. Gillespie ,  Richard G. Morton

IPC分类号： H01S3/22 ,  H01S3/097

CPC分类号： H01S3/038 ,  H01S3/036 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/0385 ,  H01S3/0388 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

摘要： A fluorine gas discharge laser electrode for a gas discharge laser having a laser gas containing fluorine is disclosed which may comprise a copper and copper alloy cathode body having an upper curved region containing the discharge footprint for the cathode comprising copper and a lower portion comprising a copper alloy, with the facing portion of the electrode if formed in a arcuate shape extending into straight line portions on either side of the arcuate portion, the straight line portions terminating in vertical straight sides, with the boundary between the copper including at least the arcuate portion, the electrode may comprise a bonded element machined from two pieces of material the first made of copper and the second made of a copper alloy bonded together before machining. The electrode may also comprise a first and a second elongated lopsided V-shaped groove formed along substantially all of the elongated electrode body forming a discharge receiving ridge between the first and second lopsided V-shaped grooves, with a differentially faster eroding material filling the first and second lopsided V-shaped grooves. also disclosed is an electrode system in which the one electrode, e.g., the cathode bows during operation and may comprise at least one of a first and second elongated gas discharge electrode being machined to form a crown to receive the gas discharge that compensates for the bowing of at least one of the gas discharge electrodes during operation of the fluorine gas discharge laser.

摘要翻译： 公开了一种用于具有含氟激光气体的气体放电激光器的氟气放电激光电极，其可包括铜和铜合金阴极体，该铜和铜合金阴极体具有包含铜的阴极的放电足迹的上部弯曲区域，以及包含铜 合金，如果电极的对置部分形成为延伸到弓形部分两侧的直线部分的弓形形状，则直线部分终止于垂直的直边，铜线之间的边界至少包括弧形部分 电极可以包括由铜制成的两片材料加工的接合元件，以及在加工之前由铜合金制成的第二种材料。 电极还可以包括沿着基本上所有的细长电极体形成的第一和第二细长的非平面V形槽，该细长电极体在第一和第二偏斜V形槽之间形成放电接收脊，其中填充有第一 和第二个不对称的V形槽。 还公开了一种电极系统，其中一个电极，例如，阴极在操作期间弯曲并且可以包括被加工成形成冠部的第一和第二细长气体放电电极中的至少一个，以接收补偿弯曲的气体放电 的至少一个气体放电电极在氟气放电激光器的操作期间。

公开(公告)号：US20090057567A1

公开(公告)日：2009-03-05

申请号：US11897644

申请日：2007-08-31

申请人： Alexander N. Bykanov ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David C. Brandt

发明人： Alexander N. Bykanov ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David C. Brandt

IPC分类号： H05G2/00 ,  H01H1/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008 ,  Y10S422/906

摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.

摘要翻译： 本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

公开(公告)号：US07491954B2

公开(公告)日：2009-02-17

申请号：US11580414

申请日：2006-10-13

申请人： Alexander N. Bykanov ,  Igor V. Fomenkov ,  Oleh Khodykin ,  Alexander I. Ershov

发明人： Alexander N. Bykanov ,  Igor V. Fomenkov ,  Oleh Khodykin ,  Alexander I. Ershov

IPC分类号： H01J35/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H01S3/0064 ,  H01S3/073 ,  H01S3/0805 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/1066 ,  H01S3/115 ,  H01S3/121 ,  H01S3/127 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2383 ,  H05G2/008

摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.

摘要翻译： 公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。 对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。 在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。

公开(公告)号：US20080267242A1

公开(公告)日：2008-10-30

申请号：US11981195

申请日：2007-10-30

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

IPC分类号： H01S3/225

CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/235 ,  H01S2301/02

摘要： A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.

摘要翻译： 方法/装置可以包括通过使用种子激光振荡器来操作线窄的脉冲准分子或分子氟气体放电激光系统，以产生可包括第一气体放电准分子或分子氟激光室的输出; 线缩小模块; 可以包括环功率放大级的激光放大级; 操作方法可以是：选择第一激光室中的一对电极与第二激光室中的一对电极之间的放电之间的差分定时，同时使ASE保持在选定的极限以下，并且脉冲能量 激光系统输出光束的脉冲基本恒定。

公开(公告)号：US20080225908A1

公开(公告)日：2008-09-18

申请号：US11981449

申请日：2007-10-30

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

IPC分类号： H01S3/225

CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/08 ,  H01S3/08059 ,  H01S3/105 ,  H01S3/2251 ,  H01S3/235 ,  H01S3/2366

摘要： An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.

摘要翻译： 可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法，其可以包括种子激光振荡器，其产生包括种子激光输出的脉冲光束的输出，所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光 房间 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括激光系统输出光束 的脉冲，其可以包括环形功率放大级; 种子注射机制。

公开(公告)号：US20080225904A1

公开(公告)日：2008-09-18

申请号：US11982103

申请日：2007-10-31

申请人： Daniel J.W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

发明人： Daniel J.W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

IPC分类号： H01S3/109

CPC分类号： G03F7/70341 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the second seed laser.

摘要翻译： 一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自 第一种子激光器 第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2 X kHz工作。

公开(公告)号：US20080205472A1

公开(公告)日：2008-08-28

申请号：US11796065

申请日：2007-04-25

申请人： Wayne J. Dunstan ,  Kevin M. O'Brien ,  Robert N. Jacques ,  Herve A. Besaucele ,  Daniel J. Riggs ,  Aravind Ratnam

发明人： Wayne J. Dunstan ,  Kevin M. O'Brien ,  Robert N. Jacques ,  Herve A. Besaucele ,  Daniel J. Riggs ,  Aravind Ratnam

IPC分类号： H01S3/22

CPC分类号： H01S3/036 ,  G03F7/70025 ,  G03F7/70525 ,  G03F7/70975 ,  H01S3/0014 ,  H01S3/1305 ,  H01S3/1306 ,  H01S3/134 ,  H01S3/2251 ,  H01S3/2256

摘要： A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.

摘要翻译： 公开了一种方法和装置，其可以包括预测用于光刻工艺的气体放电激光光源的气体寿命，包括含卤素的激光气体的光源可以包括：利用多个激光操作输入和/ 或输出参数; 在光刻工艺中利用一组至少一个利用参数来确定相对于相应输入或输出参数的气体使用模型; 基于模型和相应的输入或输出参数的测量来预测气体寿命的结束。 该参数可以包括脉冲利用模式。 该方法和装置可以包括对用于光刻工艺的气体放电激光光源执行气体管理，该光源包括含卤素的激光气体，其包括：利用周期性和频繁的部分气体再填充，其包括含有卤素气体和体积的混合物 气体通常与在全气体再填充中提供给激光器的预混合比率相同，并且其量小于喷射前的总气体压力的2％。

公开(公告)号：US07415056B2

公开(公告)日：2008-08-19

申请号：US11394512

申请日：2006-03-31

申请人： Palash P. Das ,  Thomas Hofmann ,  Gang Lei

发明人： Palash P. Das ,  Thomas Hofmann ,  Gang Lei

IPC分类号： H01S3/22

CPC分类号： H01S3/0057 ,  G03F7/7055 ,  H01S3/225

摘要： A gas discharge laser system producing a laser output pulse and a method of operating such a system is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic directing a portion of the laser output pulse along a laser system output pulse optical axis and diverting a portion of the output pulse into an optical delay having an optical delay path and which may comprise a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic; an optical axis alignment mechanism comprising an radial mirror positioning mechanism operable to position the output of the optical delay to the align with the portion of the laser output pulse transmitted along the optical axis of the portion of the laser system output pulse transmitted by the laser output pulse optical delay initiating optic.

摘要翻译： 公开了一种产生激光输出脉冲的气体放电激光器系统和一种操作这种系统的方法，其可以包括脉冲展宽器，其可以包括激光输出脉冲光学延迟启动光学器件，以将激光输出脉冲的一部分沿着激光系统输出 脉冲光轴并将输出脉冲的一部分转换成具有光学延迟路径的光学延迟，并且可以包括串联对准的多个共焦谐振器，以将光学延迟的输出传递到激光输出脉冲光学延迟启动光学器件; 光轴对准机构，其包括径向镜定位机构，其可操作以将光学延迟的输出定位成与激光输出脉冲的沿激光输出脉冲发射的激光系统输出脉冲部分的光轴传输的部分对准 脉冲光学延迟启动光学器件。

公开(公告)号：US07411203B2

公开(公告)日：2008-08-12

申请号：US11647016

申请日：2006-12-27

申请人： Igor V. Fomenkov ,  Alexander I. Ershov

发明人： Igor V. Fomenkov ,  Alexander I. Ershov

IPC分类号： H01J49/00

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a ibeus defining a desired plasma initiation site, comprising; a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis genemily perpendicular to the target stream track from a desired stream truck intersecting the desired plasma initiation site.

摘要翻译： 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集 光学元件具有限定期望的等离子体起始位置的ibeus，包括： 目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中所述目标流轨迹由所述摄像机的成像速度导致太慢以不能成像形成所述目标的各个等离子体形成目标 流成像为目标流轨道; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流动车辆，在垂直于目标流轨迹的至少一个轴中至少一个轴上检测目标流轨迹的位置的误差。