SEMICONDUCTOR DEVICE MANUFACTURING METHOD
    35.
    发明公开

    公开(公告)号:US20240178265A1

    公开(公告)日:2024-05-30

    申请号:US18522042

    申请日:2023-11-28

    IPC分类号: H01L27/146 H01L23/00

    摘要: A semiconductor device manufacturing method including: preparing a first substrate having a first plane and a second plane facing the first plane; preparing a second substrate having a third plane and a fourth plane facing the third plane; forming a first semiconductor device and a first wiring layer near the first plane in the first substrate; forming an insulating region near the third plane in the second substrate; after the forming the insulating region, forming a second semiconductor device and a second wiring layer near the third plane; after the forming the second semiconductor device and the second wiring layer, thinning the second substrate from the fourth plane to expose the insulating region; after exposing, forming a through-electrode configured to penetrate through the insulating region and be connected to the second wiring layer; and joining the first and second substrates so as to be electrically connected to each other.

    METHOD FOR COPPER-TO-COPPER DIRECT BONDING AND ASSEMBLY

    公开(公告)号:US20240170428A1

    公开(公告)日:2024-05-23

    申请号:US18549211

    申请日:2022-03-04

    发明人: Ralf SCHMIDT

    IPC分类号: H01L23/00

    摘要: The invention relates to method for copper-to-copper direct bonding comprising the steps:



    a) providing a first substrate comprising a first pure copper deposit having a bonding surface;
    b) providing a second substrate comprising a second pure copper deposit having a bonding surface;
    c) connecting the bonding surface of the first deposit with the bonding surface of the second deposit and obtaining a connected deposit; and
    d) converting the first deposit and the second deposit of the connected deposit into a connected and converted deposit,
    wherein the first deposit and the second deposit are formed by an electrochemical copper deposition step and having copper grains with a grain size which is smaller than a grain size after the converting in step d),
    wherein the connected and converted deposit is having grains with a grain size which is larger than the grain size of the first deposit and the second deposit before the converting in step d); and to an assembly and a device produced by the method. (FIG. 1)