Abstract:
A stack of layers defines a filter and is formed by copper on hydrogenated silicon nitride supported by a carrier. The filter includes a layer of hydrogenated silicon nitride, a layer of silicon oxide on the layer of hydrogenated silicon nitride and a layer of copper on the layer of silicon oxide. The layer of hydrogenated silicon nitride may have, in a vicinity of its upper side, a ratio of a number of silicon atoms per cubic centimeter to a number of nitrogen atoms per cubic centimeter lower than 0.8 (or even lower than 0.6), with a number of silicon-hydrogen bonds smaller than or equal to 6×1021 bonds per cubic centimeter (or even smaller than 0.5×1021 bonds per cubic centimeter). The filter further includes an additional layer of copper between the layer of hydrogenated silicon nitride and the carrier.
Abstract:
A method for preparing a multilayer substrate includes the step of deposing an epitaxial γ-Al2O3 Miller index (001) layer on a Si Miller index (001) substrate.
Abstract translation:制备多层衬底的方法包括在Si Miller指数(001)衬底上去除外延γ-Al 2 O 3 Miller指数(001)层的步骤。
Abstract:
An integrated circuit (IC) cell may include first and second semiconductor regions, and parallel electrically conductive lines extending above the first and second semiconductor regions. The IC cell may further include electrically conductive line contacts electrically connected to the parallel electrically conductive lines, and may include at least one first line contact between the first semiconductor region and a corresponding end of the IC cell, and at least one second line contact between the first semiconductor region and the second semiconductor region. Adjacent ones of the electrically conductive lines may be respectively coupled to one of the at least one first line contact and to one of the at least one second line contact.
Abstract:
A method is provided for producing a semiconductor layer having at least two different thicknesses from a stack of the semiconductor on insulator type including at least one substrate on which an insulating layer and a first semiconductor layer are successively disposed, the method including etching the first layer so that said layer is continuous and includes at least one first region having a thickness less than that of at least one second region; oxidizing the first layer to form an electrically insulating oxide film on a surface thereof so that, in the first region, the oxide film extends as far as the insulating layer; partly removing the oxide film to bare the first layer outside the first region; forming a second semiconductor layer on the stack, to form, with the first layer, a third continuous semiconductor layer having a different thickness than that of the first and second regions.
Abstract:
A coplanar waveguide electronic device is formed on a substrate. The waveguide includes a signal ribbon and a ground plane. The signal ribbon is formed of two or more signal lines of a same level of metallization that are electrically connected together. The ground plane is formed of an electrically conducting material which includes rows of holes.
Abstract:
A Method for manufacturing a transistor comprising: a) amorphization and doping, by means of one or more localised implantation(s), of given regions of source and drain blocks based on crystalline semi-conductor material lying on an insulating layer of a semi-conductor on insulator substrate, the implantation(s) being carried out so as to conserve at the surface of said blocks zones of crystalline semi-conductor material on the regions of amorphous semi-conductor material, b) recrystallization of at least one portion of said given regions.
Abstract:
A deserializer circuit includes demultiplexer circuitry configured to receive serial data from an input and output a plurality of divided data outputs, and multiplexer circuitry configured to receive a first logic level at a first input of said multiplexer circuitry, and receive a second logic level at a second input of said multiplexer circuitry and receive one of said divided data outputs at a control input of said multiplexer circuitry. The outputs of the multiplexer circuitry produce the received serial data in a parallel form.
Abstract:
A method for scan-testing of an integrated circuit includes the following steps carried out by the circuit itself: upon powering on of the circuit, watching for bit sequences applied to a use pin configured for receiving serial data from the exterior at the rate of a clock signal applied to a clock pin; configuring the circuit in a test mode when a bit sequence is identified as a test initialization sequence; connecting latches of the circuit in a shift register configuration, and connecting the shift register for receiving a test vector in series from the use pin; switching the transfer direction of the use pin to the output mode for providing to the exterior serial data at the rate of the clock signal; and connecting the shift register for providing its content, as a test result set, in series on the use pin.
Abstract:
The invention relates to a method for manufacturing a transistor comprising the preparation of a stack of layers of the semiconductor on insulator type comprising at least one substrate on which an insulating layer and an initial semiconductor layer are successively disposed. The method includes the formation of at least one oxide pad extending from a top face of the insulating layer, the formation of an additional layer made from semiconductor material covering the oxide pad and intended to form a channel for the transistor, the formation of a gate stack above the oxide pad, and the formation of a source and drain on either side of the gate stack.
Abstract:
According to one mode of implementation, a method includes an estimation including on the one hand a correlation processing involving at least one part of the sampled signal, at least one part of at least one first signal gleaned from a derived signal representative of a temporal derivative of the sampled signal and at least one part of N partial filtered signals respectively representative of N weighted differences between N pairs of bracketing versions flanking the sampled signal, N being greater than or equal to 1. On the other hand, the estimation includes a matrix processing on the results of this correlation processing. Correction processing of the M−1 trains involves respectively M−1 second signals gleaned from the derived signal and the suite of M−1 shift coefficients.