摘要:
A weir with locks is used to encompass a platen used for chemical-mechanical polishing. The weir retains slurry that would otherwise be flung from a rotating platen because of centrifugal force. However, the locks permit some slurry to leave the platen, which enables the polishing process to include desirable flows of fresh slurry through the polishing pad to replenish polishing components and to flush out deleterious waste products. Additionally, the effective orifice size of the locks may be made a function of platen rotation rate. Polishing processes are possible in which the depth of the polishing slurry on the platen is a function of platen rotation rate.
摘要:
Methods of planarizing structures formed on the surfaces of substrates and wafers are disclosed. The methods form a planarizing layer over the surface and the structures, or the locations where the structures are to be formed, such that the top surface of the layer has low areas between the locations of the structures, and such that the low areas lie substantially within a plane which is below the tops of the structures. A polish-stop layer is then formed over the low areas of the planarizing layer, the polish-stop layer being more resistant to polishing than the planarizing layer and, preferably, the structures. The resulting surface is then polished. The polishing may be accomplished by, for example, standard mechanical polishing, and chemical-mechanical polishing.
摘要:
A fully automated cappuccino, latte, and espresso brewing machine which includes a refrigerated milk supply from which milk is drawn by a steam driven venturi apparatus. The venturi subcombination includes independently electrically operated valving for the driving steam, for drawing milk from its supply, and for drawing air, as desired, for foaming the milk in a vortex mixer coupled to the output of the venturi. The valving may be sequential so that with each cycle of use of the apparatus, it is hygienically steam cleaned of all milk residue.
摘要:
A high density through-hole interconnect with high aspect ratio vias is formed by sequentially forming layers of dielectric material on a previous dielectric layer. After each layer is formed, a plurality of through holes are etched through each layer and filled or metalized with an electrically conductive material having a coefficient of thermal expansion matching that of the dielectric layers and the integrated circuit that it will connect with. Preferably, the process of forming dielectric layers, forming through holes, and metalizing the through holes is repeated until the metalized through holes have an aspect ratio in the range of from 6 to 10. A support structure is constructed to interconnect with and support the metalized vias while the dielectric material is removed. A second dielectric material having the desired mechanical and electrical properties is poured into the support structure to fill the space between the metalized vias and allowed to solidify. The support structure is removed and the through-hole interconnector, comprising the metalized vias and the second dielectric material, is lapped and polished to predetermined manufacturing dimensions and tolerances.
摘要:
A thin-film bypass capacitor is fabricated by forming a plurality of through holes through the thickness of a nonconductive base substrate and filling the through holes with a conductive material to form ground vias and power vias. A sequence of back side metalization layers are applied to the back side surface of the base substrate. A sequence of bottom contact layers are applied to the front side surface of the base substrate. A bottom contact power terminal is formed and a bottom contact metalization layer is applied to the surface of the bottom contact layers. A portion of the metalization layer is removed and an insulating layer is formed on the surface of the bottom contact metalization layer. A ground metalization feedthrough and a power metalization feedthrough are formed at the surface of the insulating layer. A sequence of top contact layers are applied to the surface of the insulating layer and a front side ground terminal and front side power terminal are formed. A back side ground terminal and a back side power terminal are formed at the back side of the base substrate.
摘要:
An apparatus and method for smoothing the reproduction of digitized waveforms on a raster scan line display by providing control signals which increase and decrease the electron beam pattern along the scan line in a trapezoidal pattern which is representative of the amplitude of the sampled waveform along that scan line. A microprocessor provides a plurality of digital signals which define the slopes of the increasing and decreasing ramps of the trapazoids and their starting points along the scan line. The digital signals for an entire frame of scan lines are stored during the frame blanking interval of the display and are accessed for each scan line during the scan line blanking interval. The digital signals are stored in a random access memory (RAM) at raster scan line addresses provided by the processor through a scroll counter and at digital signal addresses provided through a display controller. During scan line blanking intervals the scroll counter incrementally steps through raster scan line addresses starting with the last address provided by the processor during the storing of the data.
摘要:
A semiconductor assembly is provided that includes a first substrate that has a first surface. A second substrate is coupled to and spaced apart from the first substrate. The second substrate has a second surface facing the first surface of the first substrate. The second substrate includes a set of cavities. A set of non-conductive pillars is disposed on and protrudes from the first surface of the first substrate. The set of non-conductive pillars is configured and positioned to engage the set of cavities of the second substrate to align the second substrate with the first substrate.
摘要:
The present invention is directed to an apparatus and related methods related to an optical bump for optically coupling devices. An exemplary apparatus includes a first device, a second device, and at least one optical bump. The first device has a first surface including at least one first optically active area. The second device has a second surface including at least one second optically active area positioned in an opposed and spaced-apart relationship with respect to the at least one first optically active area. The first surface is separated from the second surface by a distance. The at least one optical bump is coupled to the first surface between the at least one first optically active area and the at least one second optically active area. The at least one optical bump has a height that is less than the distance between the first surface and the second surface. The at least one optical bump is configured to couple light between the at least one second optically active area and the at least one first optically active area.