Wafer on wafer stack method of forming and method of using the same
    43.
    发明授权
    Wafer on wafer stack method of forming and method of using the same 有权
    晶圆叠片方法的晶圆及其使用方法

    公开(公告)号:US09391110B2

    公开(公告)日:2016-07-12

    申请号:US14458873

    申请日:2014-08-13

    摘要: A wafer on wafer (WOW) stack includes a first wafer having dies of a first type. The WOW stack further includes a second wafer bonded to the first wafer. The second wafer has dies of a second type. An integer number of dies of the second type are bonded to a corresponding die of the first type. A total area of the dies of the second type bonded to the corresponding die of the first type is less than or equal to an area of the corresponding die of the first type. A functionality of the dies of the first type is different from a functionality of the dies of the second type.

    摘要翻译: 晶片(WOW)堆叠上的晶片包括具有第一类型的管芯的第一晶片。 WOW堆叠还包括结合到第一晶片的第二晶片。 第二晶片具有第二类型的管芯。 第二类型的模具的整数数目与第一类型的相应的模具结合。 结合到第一类型的相应管芯的第二类型的管芯的总面积小于或等于第一类型的相应管芯的面积。 第一类型的管芯的功能与第二类型的管芯的功能不同。

    System and Method for Designing Cell Rows
    45.
    发明申请
    System and Method for Designing Cell Rows 审中-公开
    用于设计单元行的系统和方法

    公开(公告)号:US20150213183A1

    公开(公告)日:2015-07-30

    申请号:US14679843

    申请日:2015-04-06

    发明人: Yun-Han Lee Wu-An Kuo

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5072

    摘要: A system and method for designing integrated circuits is disclosed. An embodiment comprises placing a standard cell with a first cell height into a cell row with a different height. The standard cell may have a height smaller than the cell row or else may have a height that is larger than the cell row. Vertical fillers and horizontal fillers are utilized to extend and connect the standard cell to adjacent cells without having to redesign the entire cell row.

    摘要翻译: 公开了一种用于设计集成电路的系统和方法。 一个实施例包括将具有第一单元高度的标准单元放置到具有不同高度的单元行中。 标准单元可以具有小于单元行的高度,或者可以具有大于单元行的高度。 使用垂直填料和水平填料将标准池延伸并连接到相邻的单元,而不必重新设计整个单元行。

    System and Method for Designing Cell Rows
    46.
    发明申请
    System and Method for Designing Cell Rows 审中-公开
    用于设计单元行的系统和方法

    公开(公告)号:US20140115553A1

    公开(公告)日:2014-04-24

    申请号:US14139436

    申请日:2013-12-23

    发明人: Yun-Han Lee Wu-An Kuo

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5072

    摘要: A system and method for designing integrated circuits is disclosed. An embodiment comprises placing a standard cell with a first cell height into a cell row with a different height. The standard cell may have a height smaller than the cell row or else may have a height that is larger than the cell row. Vertical fillers and horizontal fillers are utilized to extend and connect the standard cell to adjacent cells without having to redesign the entire cell row.

    摘要翻译: 公开了一种用于设计集成电路的系统和方法。 一个实施例包括将具有第一单元高度的标准单元放置到具有不同高度的单元行中。 标准单元可以具有小于单元行的高度,或者可以具有大于单元行的高度。 使用垂直填料和水平填料将标准池延伸并连接到相邻的单元,而不必重新设计整个单元行。

    SUBSTRATE BIAS CONTROL CIRCUIT
    47.
    发明申请
    SUBSTRATE BIAS CONTROL CIRCUIT 有权
    基板偏置控制电路

    公开(公告)号:US20140015599A1

    公开(公告)日:2014-01-16

    申请号:US14025171

    申请日:2013-09-12

    IPC分类号: G05F3/20

    CPC分类号: G05F3/205 H03K19/00384

    摘要: An integrated circuit includes a process voltage temperature (PVT) effect transducer responsive to a PVT effect, a PVT effect quantifier coupled to the PVT effect transducer and configured to quantify the PVT effect to provide an output, and a bias controller configured to receive the output of the PVT effect quantifier and provide a bias voltage for a substrate of an NMOS or a PMOS transistor. The bias controller is configured to compare the output received from the PVT effect quantifier to a threshold value, and decrease or increase the bias voltage depending on whether the output is higher or lower than the threshold value.

    摘要翻译: 集成电路包括响应于PVT效应的过程电压温度(PVT)效应传感器,耦合到PVT效应传感器并被配置为量化PVT效应以提供输出的PVT效应量化器,以及配置成接收输出的偏置控制器 的PVT效应量化器,并为NMOS或PMOS晶体管的衬底提供偏置电压。 偏置控制器被配置为将从PVT效应量化器接收的输出与阈值进行比较,并且根据输出是高于还是低于阈值来降低或增加偏置电压。