Display screen film, preparation method therefor and energy saving method
    41.
    发明申请
    Display screen film, preparation method therefor and energy saving method 有权
    显示屏幕,其制备方法和节能方法

    公开(公告)号:US20160259235A1

    公开(公告)日:2016-09-08

    申请号:US15030980

    申请日:2014-04-21

    申请人: ZTE CORPORATION

    发明人: Wei Sun Zhengwei Han

    IPC分类号: G03B21/62 C03C17/34

    摘要: Disclosed are a display screen film and a preparation method therefor, and an energy saving method. The display screen film comprises an oriented carbon nanotube layer and a quartz glass layer, wherein the oriented carbon nanotube layer is located above the quartz glass layer, comprises an oriented growth carbon nanotube, and is configured to refract all incident light through the oriented growth carbon nanotube; the quartz glass layer is used for the carbon nanotube layer to grow orientately thereon, and is also used for absorbing the incident light so as to enable all the incident light to reach the oriented carbon nanotube layer.

    摘要翻译: 公开了一种显示屏幕及其制备方法和节能方法。 显示屏膜包括定向碳纳米管层和石英玻璃层,其中定向碳纳米管层位于石英玻璃层之上,包括取向生长碳纳米管,并且被配置为折射通过取向生长碳的所有入射光 纳米管 石英玻璃层用于碳纳米管层以其方向生长,并且还用于吸收入射光,以使所有的入射光能够到达定向碳纳米管层。

    Process for manufacturing a hydrophobic glazing containing a carbon rich silicon oxycarbide tie layer
    44.
    发明授权
    Process for manufacturing a hydrophobic glazing containing a carbon rich silicon oxycarbide tie layer 有权
    用于制造含有富含碳碳硅碳键的层的疏水性玻璃的方法

    公开(公告)号:US09051213B2

    公开(公告)日:2015-06-09

    申请号:US14358496

    申请日:2012-11-14

    IPC分类号: C03C17/34 C03C23/00 C03C17/42

    摘要: A process for manufacturing a hydrophobic glazing by: (i) forming a carbon-rich SiOxCy layer at a surface of a mineral glass substrate via CVD by contacting the surface with a stream containing C2H4, SiH4, and CO2 with an C2H4/SiH4 ratio of less than or equal to 3.3 by volume, at a temperature of between 600° C. and 680° C.; (ii) forming a SiO2 layer or a carbon-poor silicon oxycarbide layer with a mean C/Si ratio of less than 0.2 on the carbon-rich SiOxCy layer, thereby obtaining a layered substrate; (iii) annealing and/or shaping the layered substrate at a temperature of between 580° C. and 700° C.; (iv) activating the SiO2 layer or the carbon-poor silicon oxycarbide layer by plasma treatment or acidic or basic chemical treatment; and (v) grafting, by covalent bonding, a fluorinated hydrophobic agent to the surface of the SiO2 layer or the carbon-poor silicon oxycarbide layer.

    摘要翻译: 一种用于制造疏水性玻璃的方法,该方法是:(i)通过CVD将所述表面与含有C 2 H 4,SiH 4和CO 2的物流接触,使C 2 H 4 / SiH 4比为 小于或等于3.3体积,温度在600℃至680℃之间。 (ii)在富碳的SiO xCy层上形成平均C / Si比小于0.2的SiO 2层或碳碳硅碳化硅层,从而得到层状基板; (iii)在580℃和700℃之间的温度下退火和/或成型层状基板。 (iv)通过等离子体处理或酸性或碱性化学处理来活化SiO 2层或碳 - 碳碳化硅层; 和(v)通过共价键合将氟化疏水剂接枝到SiO 2层的表面或不含碳的硅碳氧化物层上。

    CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING ZINC OXIDE COATINGS, METHOD FOR FORMING A CONDUCTIVE GLASS ARTICLE AND THE COATED GLASS ARTICLES PRODUCED THEREBY
    45.
    发明申请
    CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING ZINC OXIDE COATINGS, METHOD FOR FORMING A CONDUCTIVE GLASS ARTICLE AND THE COATED GLASS ARTICLES PRODUCED THEREBY 有权
    用于沉积氧化锌涂料的化学气相沉积工艺,形成导电玻璃制品的方法和生产的涂层玻璃制品

    公开(公告)号:US20150017431A1

    公开(公告)日:2015-01-15

    申请号:US13261951

    申请日:2013-03-08

    IPC分类号: C03C17/34 C03C17/245

    摘要: A CVD process for depositing a zinc oxide coating is provided. The CVD process includes providing a moving glass substrate. The CVD process also includes forming a gaseous mixture of an alkyl zinc compound and an inert gas as a first stream, providing a first gaseous inorganic oxygen-containing compound in a second stream and providing a second gaseous inorganic oxygen-containing compound in the second stream, a third stream or in both the second and third streams. Additionally, the CVD process includes mixing the streams at or near a surface of the moving glass substrate and a zinc oxide coating is formed thereon. A method for forming a coated glass article is also provided. Additionally, a coated glass article is provided.

    摘要翻译: 提供了沉积氧化锌涂层的CVD工艺。 CVD工艺包括提供移动玻璃基板。 CVD工艺还包括形成烷基锌化合物和惰性气体的气体混合物作为第一流,在第二流中提供第一气态无机含氧化合物,并在第二流中提供第二气态无机含氧化合物 ,第三流或第二流和第三流。 此外,CVD工艺包括在移动玻璃基板的表面处或附近混合流,并且在其上形成氧化锌涂层。 还提供了一种形成涂覆玻璃制品的方法。 另外,提供了涂覆的玻璃制品。

    METHOD OF FABRICATING LIGHT EXTRACTION SUBSTRATE FOR ORGANIC LIGHT-EMITTING DIODE
    49.
    发明申请
    METHOD OF FABRICATING LIGHT EXTRACTION SUBSTRATE FOR ORGANIC LIGHT-EMITTING DIODE 审中-公开
    用于有机发光二极管制造光提取基板的方法

    公开(公告)号:US20140113068A1

    公开(公告)日:2014-04-24

    申请号:US14060264

    申请日:2013-10-22

    IPC分类号: H01L51/52

    摘要: A method of fabricating a light extraction substrate for an organic light-emitting diode (OLED) with which the scattering distribution of light that is emitted from the OLED can be artificially controlled. The method includes the step of forming a light extraction layer by depositing an inorganic oxide at least twice on a base substrate, thereby controlling a structure of a texture formed on a surface of the light extraction layer.

    摘要翻译: 一种制造用于有机发光二极管(OLED)的光提取衬底的方法,通过该方法可以人为地控制从OLED发射的光的散射分布。 该方法包括通过在基底基材上沉积无机氧化物至少两次来形成光提取层的步骤,从而控制在光提取层的表面上形成的织构的结构。