公开(公告)号：US06863937B2

公开(公告)日：2005-03-08

申请号：US10299646

申请日：2002-11-19

Applicant: Robert William Bruce ,  Antonio Frank Maricocchi ,  Christopher Lee Lagemann ,  John Douglas Evans, Sr. ,  Keith Humphries Betscher ,  Rudolfo Viguie ,  David Vincent Rigney ,  David John Wortman ,  William Seth Willen

Inventor： Robert William Bruce ,  Antonio Frank Maricocchi ,  Christopher Lee Lagemann ,  John Douglas Evans, Sr. ,  Keith Humphries Betscher ,  Rudolfo Viguie ,  David Vincent Rigney ,  David John Wortman ,  William Seth Willen

IPC: F02C7/00 ,  C23C14/24 ,  C23C14/30 ,  C23C14/52 ,  C23C14/54 ,  C23C14/56 ,  H01J37/305

CPC classification number: C23C14/246 ,  C23C14/30 ,  C23C14/52 ,  C23C14/541 ,  C23C14/56 ,  H01J37/3053 ,  H01J2237/3132

Abstract: An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus at coating pressures above 0.010 mbar.

Abstract translation: 电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。 电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。 在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。 EBPVD装置的操作通过包含或适应一种或多种机械和/或工艺改进而得到增强，包括在涂覆压力高于0.010mbar的条件下操作设备时必需或有益的修改。

公开(公告)号：US06495216B2

公开(公告)日：2002-12-17

申请号：US08876887

申请日：1997-06-16

Applicant: Stefan Locher ,  Eckhard Wirth

Inventor： Stefan Locher ,  Eckhard Wirth

IPC: C23C1430

CPC classification number: H01J37/3053 ,  H01J2237/3132

Abstract: Disclosed is an electron beam evaporator for installation in a vacuum apparatus which provides for variable positioning during or between applications of a coating. The apparatus has a carrier plate which is a flat hollow body, the top cover plate of which supports the evaporator. The hollow body is disposed over the bore in the tank such that it can be turned about the main axis of the bore. The component assemblies of the electron beam evaporator are vacuum-tight on the cover plate and the connecting lines are carried through the interior of the hollow body to the component assemblies.

Abstract translation: 公开了一种用于安装在真空装置中的电子束蒸发器，其提供涂层期间或涂层之间的可变定位。 该装置具有承载板，其是平坦的中空体，其顶盖板支撑蒸发器。 中空体设置在罐中的孔上方，使得其能够围绕孔的主轴线转动。 电子束蒸发器的部件组件在盖板上是真空密封的，并且连接线穿过中空体的内部被运送到部件组件。

公开(公告)号：US20020065309A1

公开(公告)日：2002-05-30

申请号：US09860810

申请日：2001-05-18

Inventor： Ge Peng ,  Mark A. Gallop ,  Tania Chernov-Rogan ,  Stephen D. Yanofsky ,  Jeffrey Claude Pelletier ,  Daniel Michael Green

IPC: A61K031/4188 ,  C07D487/14

CPC classification number: C07D487/04 ,  A61K31/4188 ,  A61K31/5375 ,  C23C14/30 ,  C23C14/52 ,  H01J37/3053 ,  H01J2237/3132

Abstract: Bicyclic and tricyclic pyrrolidine derivatives are disclosed that are useful as antagonists of the GnRH receptor. Methods for using the novel compounds to treat GnRH-related disorders are also provided, as are pharmaceutical compositions and novel synthetic methods.

Abstract translation: 公开了可用作GnRH受体的拮抗剂的双环和三环吡咯烷衍生物。 还提供了使用新化合物治疗GnRH相关病症的方法，药物组合物和新型合成方法也是如此。

公开(公告)号：US20230223234A1

公开(公告)日：2023-07-13

申请号：US18185626

申请日：2023-03-17

Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Inventor： Bert Scheffel ,  Matthias Tenbusch ,  Stefan Saager

IPC: H01J37/32 ,  H01J37/305 ,  C23C14/06 ,  C23C14/24

CPC classification number: H01J37/32055 ,  H01J37/3053 ,  C23C14/0605 ,  C23C14/24 ,  H01J2237/3132 ,  H01J2237/063

Abstract: An apparatus and method for depositing a carbon layer includes an arc discharge is formed between an electron source and an evaporation material by means of a first power supply device. The negative terminal of the first power supply device is connected in an electrically conducting manner to the electron source and the positive terminal of the first power supply device is connected in an electrically conducting manner to the evaporation material. A permanent magnet system and a solenoid coil are arranged in a rotationally symmetrical manner around the evaporation material. The evaporation material is formed as a graphite rod which is surrounded by at least one heat-insulating element at least on the rod end to be evaporated of the graphite rod.

公开(公告)号：US20180308660A1

公开(公告)日：2018-10-25

申请号：US15768486

申请日：2016-10-13

Applicant: ALD Vacuum Technologies GmbH

Inventor： Georg REITER ,  Matthias WAELZLEIN

IPC: H01J37/305 ,  H01J37/30

CPC classification number: H01J37/3053 ,  H01J37/3005 ,  H01J2237/2482 ,  H01J2237/30455 ,  H01J2237/30472 ,  H01J2237/3132

Abstract: In order to evaporate material, an electronic beam is guided over a melt surface in a periodic pattern by a detecting unit. Whether or not the actual pattern matches the target pattern specified by the deflecting unit is detected in principle on an image of the melt surface. In order to allow a better analysis of the image, the periodicity of the deflection pattern during the analysis of temporally successive images is taken into consideration.

公开(公告)号：US20150345021A1

公开(公告)日：2015-12-03

申请号：US14654138

申请日：2013-12-20

Applicant: ORGANIC SPINTRONICS S.R.L.

Inventor： Dmitry YARMOLICH ,  Carlo Taliani

IPC: C23C16/515 ,  H01J37/32 ,  C23C16/48 ,  H01J37/30

CPC classification number: C23C16/515 ,  C23C16/487 ,  H01J3/025 ,  H01J37/077 ,  H01J37/30 ,  H01J37/3053 ,  H01J37/32532 ,  H01J2237/06375 ,  H01J2237/151 ,  H01J2237/3132

Abstract: A pulsed plasma deposition device, including an apparatus for generating a beam of electrons, a target and a substrate, the apparatus being suitable for generating a pulsed beam of electrons directed towards said target to determine the ablation of the material of said target in the form of a plasma plume directed towards said substrate. The device includes a transportation and focussing group of the beam of electrons towards said target, arranged between said apparatus and said target and including a transportation cone, the transportation and focussing group also including a focussing electrode directly connected to the transportation cone and shaped substantially like a loop. The axis of symmetry of the focussing electrode is perpendicular, or substantially perpendicular, to the surface of the target.

Abstract translation: 一种脉冲等离子体沉积装置，包括用于产生电子束的装置，靶和衬底，所述装置适于产生朝向所述靶的脉冲电子束，以确定所述靶的材料以所述形式 的等离子体羽流朝向所述衬底。 该装置包括朝向所述目标的电子束的输送和聚焦组，布置在所述装置和所述靶之间并且包括输送锥体，所述输送和聚焦组还包括直接连接到输送锥体的聚焦电极并且基本上形状 一个循环。 聚焦电极的对称轴线与目标表面垂直或基本垂直。

公开(公告)号：US08878422B2

公开(公告)日：2014-11-04

申请号：US13821887

申请日：2011-09-08

Applicant: Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

Inventor： Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

IPC: H01J1/02 ,  F03H1/00 ,  H01J27/26 ,  H01J37/075

CPC classification number: H01J37/075 ,  H01J3/025 ,  H01J37/077 ,  H01J2237/3104 ,  H01J2237/3128 ,  H01J2237/3132

Abstract: Device for producing an electron beam includes a housing, which delimits a space that is evacuatable and has an electron beam outlet opening; an inlet structured and arranged for feeding process gas into the space; and a planar cathode and an anode, which are arranged in the space, and between which, a glow discharge plasma is producible by an applied electrical voltage. Ions are accelerateable from the glow discharge plasma onto a surface of the cathode and electrons emitted by the cathode are accelerateable into the glow discharge plasma. The cathode includes a first part made of a first material at least on an emission side, which forms a centrally arranged first surface region of the cathode, and a second part made of a second material, which forms a second surface region of the cathode that encloses the first surface region.

Abstract translation: 用于制造电子束的装置包括壳体，其限定可抽空并具有电子束出口的空间; 一个构造和布置成用于将工艺气体供给到空间中的入口; 以及布置在该空间中的平面阴极和阳极之间，其中通过所施加的电压产生辉光放电等离子体。 离子可以从辉光放电等离子体加速到阴极的表面上，由阴极发射的电子可加速到辉光放电等离子体中。 阴极包括由至少在发射侧的第一材料制成的第一部分，其形成中心布置的阴极的第一表面区域，以及由第二材料制成的第二部分，其形成阴极的第二表面区域， 封闭第一表面区域。

公开(公告)号：US08159118B2

公开(公告)日：2012-04-17

申请号：US11266032

申请日：2005-11-02

Applicant: Viktor A. Tymashov ,  Oleg L. Zhdanov ,  Sergiy I. Ryabenko ,  Andriy A. Tsepkalov ,  Steven M. Burns

Inventor： Viktor A. Tymashov ,  Oleg L. Zhdanov ,  Sergiy I. Ryabenko ,  Andriy A. Tsepkalov ,  Steven M. Burns

IPC: H01J37/00 ,  H05H1/00

CPC classification number: H01J37/3053 ,  H01J3/02 ,  H01J3/027 ,  H01J37/065 ,  H01J2237/06308 ,  H01J2237/14 ,  H01J2237/15 ,  H01J2237/3132

Abstract: An electron gun includes the following: a primary thermionic electron source, a secondary thermionic electron source and a focusing electrode disposed within a first housing that includes one or more reference members adjustably attached to a housing support connected to a first platform; an anode and one or more focusing coils disposed within a second housing comprising one or more insulating members adjustably connected to the first platform; and one or more deflection coils disposed within a third housing connected to the second housing and located opposite said first housing.

Abstract translation: 电子枪包括以下：初级热离子电子源，二次热离子电子源和聚焦电极，其设置在第一壳体内，该第一壳体包括一个或多个可调节地连接到连接到第一平台的壳体支撑件的参考构件; 阳极和设置在第二壳体内的一个或多个聚焦线圈，包括可调节地连接到第一平台的一个或多个绝缘构件; 以及设置在连接到第二壳体并且与第一壳体相对定位的第三壳体内的一个或多个偏转线圈。

公开(公告)号：US20110117387A1

公开(公告)日：2011-05-19

申请号：US12947558

申请日：2010-11-16

Applicant: Shivaraman Ramaswamy ,  Gopalakrishnan Chandasekaran

Inventor： Shivaraman Ramaswamy ,  Gopalakrishnan Chandasekaran

IPC: G11B5/84 ,  B05D5/02 ,  C23C14/34 ,  C23C14/14 ,  C25D5/02 ,  C30B23/02 ,  G11B5/62 ,  G11B5/85 ,  G11B5/851 ,  G11B5/855 ,  G11B5/858 ,  B32B3/26 ,  B82Y10/00

CPC classification number: G11B5/855 ,  B82Y10/00 ,  C23C14/14 ,  C23C18/06 ,  C23C18/14 ,  C25D5/022 ,  H01J2237/3132 ,  Y10T428/249994

Abstract: A method for fabricating metal nanodots on a substrate is provided. The method includes: preparing a nanoporous polysulfone membrane; applying the nanoporous polysulfone membrane onto a substrate; depositing a metal into the pores of the polysulfone membrane thereby forming metal nanodots on the substrate; and removing the nanoporous polysulfone membrane.

Abstract translation: 提供了在基板上制造金属纳米点的方法。 该方法包括：制备纳米多孔聚砜膜; 将纳米多孔聚砜膜施加到基底上; 将金属沉积到聚砜膜的孔中，从而在基底上形成金属纳米点; 并除去纳米多孔聚砜膜。

公开(公告)号：US20100247807A1

公开(公告)日：2010-09-30

申请号：US12438452

申请日：2008-01-29

Applicant: Masato Nakayama

Inventor： Masato Nakayama

IPC: C23C14/28 ,  C23C14/00

CPC classification number: C23C14/30 ,  C23C14/544 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/30466 ,  H01J2237/30483 ,  H01J2237/3132

Abstract: An electron gun evaporation apparatus capable of efficiently using an evaporation source includes an electron beam position controller which determines, as an applicable range, a range within which the distribution of the film thickness growth rate is almost constant in each scanning direction of an electron beam to be applied to an evaporation source in a crucible for the irradiation position of the electron beam, on the basis of information pertaining to the electron beam irradiation position and the film thickness growth rate in the electron beam irradiation position.

Abstract translation: 能够有效地使用蒸发源的电子枪蒸发装置包括电子束位置控制器，该电子束位置控制器将电子束的每个扫描方向上的膜厚增长率的分布几乎恒定的范围确定为适用范围， 基于与电子束照射位置和电子束照射位置的膜厚度生长速度有关的信息，施加到用于电子束的照射位置的坩埚中的蒸发源。