公开(公告)号：US3619393A

公开(公告)日：1971-11-09

申请号：US3619393D

申请日：1969-12-04

申请人： GRACE W R & CO

发明人： STAHLY ELDON E

IPC分类号： C08F2/50 ,  C08G18/67 ,  C08G18/83 ,  C08G75/04 ,  C08L81/00 ,  C08D1/00 ,  C08F1/16 ,  C08G23/00

CPC分类号： C08G75/045 ,  C08G18/6715 ,  C08G18/835 ,  C08G75/12 ,  C08L81/00 ,  Y10S430/118 ,  Y10S525/925

摘要： Free-radical scavenger-vinyl stabilizers are incorporated into photocurable compositions to give the composition storage stability for months. The photocurable composition contains a polythiol that adds to the vinyl group of the stabilizers upon photocuring with U.V. light, so that the stabilizer is chemically bound in the polymer molecules. The photocurable compositions can contain polyenes that also polymerize with the polythiol and can contain photocuring rate accelerators. A preferred stabilizer is triallyl phosphite. The incorporated stabilizers can be present in sufficient amounts to make the cured polymeric systems burnresistant.

公开(公告)号：US3615629A

公开(公告)日：1971-10-26

申请号：US71118568

申请日：1968-03-07

申请人： BASF AG

发明人： WILHELM HANS ,  FLOSS JOSEF GEORG ,  HENKLER HERBERT

IPC分类号： C08F2/38 ,  C08F2/50 ,  G03F7/027 ,  G03C1/70

CPC分类号： G03F7/027 ,  C08F2/38 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/112 ,  Y10S430/118

摘要： Crosslinkable photosensitive sheets, plates or film of soluble highly polymerized substances, compounds having at least two photopolymerizable double bonds, a photoinitiator and Nnitrosohydroxylamine derivatives as polymerization inhibitors.

公开(公告)号：US07879528B2

公开(公告)日：2011-02-01

申请号：US12044678

申请日：2008-03-07

申请人： Takeo Watanabe ,  Hideo Hada ,  Hiroo Kinoshita

发明人： Takeo Watanabe ,  Hideo Hada ,  Hiroo Kinoshita

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20 ,  G03F7/26 ,  G03F7/40

CPC分类号： G03F7/0048 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/118 ,  Y10S430/12 ,  Y10S430/143 ,  Y10S430/146

摘要： A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.

摘要翻译： 在使用电子束或EUV（极紫外光）的光刻工艺中，抗蚀剂组合物和形成能够防止曝光装置内的污染的抗蚀剂图案的方法。 在该方法中，含有选自丙二醇单甲基醚（PGME），甲基戊基酮（MAK），乙酸丁酯（BuOAc）和3-甲基甲氧基中的一种或多种化合物作为主要成分的有机溶剂 丙酸盐（MMP）用作抗蚀剂溶剂。

公开(公告)号：US07514201B2

公开(公告)日：2009-04-07

申请号：US11698114

申请日：2007-01-26

申请人： Toru Fujimori

发明人： Toru Fujimori

IPC分类号： G03F7/039

CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/118 ,  Y10S430/12 ,  Y10S430/121

摘要： A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.

摘要翻译： 一种正型光敏组合物，其包含（A）在光化射线或辐射照射时产生酸的酸产生剂，（B）具有单环或多环脂环烃结构并通过酸作用而分解以增加溶解度的树脂 在碱性显影液中，和（C）特定的碱性化合物。

公开(公告)号：US07442489B2

公开(公告)日：2008-10-28

申请号：US11334200

申请日：2006-01-17

申请人： Boo-Deuk Kim ,  Jin-A Ryu ,  Jae-Ho Kim ,  Young-Ho Kim ,  Kyoung-Mi Kim

发明人： Boo-Deuk Kim ,  Jin-A Ryu ,  Jae-Ho Kim ,  Young-Ho Kim ,  Kyoung-Mi Kim

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  Y10S430/114 ,  Y10S430/118

摘要： In a photoresist composition for a semiconductor manufacturing process and a method of forming a photoresist pattern using the photoresist composition, the photoresist composition includes an organic dispersing agent for dispersing acid (H+). The photoresist film may have enough spaces among photosensitive polymers so that acid may be dispersed sufficiently in an exposure process. Thus, a photoresist pattern may be easily formed in a defocus region. Defects in a semiconductor device may be reduced and a productivity of the semiconductor manufacturing process may be enhanced.

摘要翻译： 在用于半导体制造方法的光致抗蚀剂组合物和使用光致抗蚀剂组合物形成光致抗蚀剂图案的方法中，光致抗蚀剂组合物包括用于分散酸（H +）的有机分散剂。 光致抗蚀剂膜可以在光敏聚合物中具有足够的空间，使得酸可以在曝光过程中充分分散。 因此，可以在散焦区域中容易地形成光致抗蚀剂图案。 可以减少半导体器件中的缺陷，并且可以提高半导体制造工艺的生产率。

公开(公告)号：US07232646B2

公开(公告)日：2007-06-19

申请号：US10561651

申请日：2004-06-17

申请人： Martin Klare ,  Reiner Altmann ,  Michael Kutschinski ,  Georgia Meissner ,  Thomas Veit

发明人： Martin Klare ,  Reiner Altmann ,  Michael Kutschinski ,  Georgia Meissner ,  Thomas Veit

IPC分类号： G03F7/00 ,  B29C67/00

CPC分类号： G03F7/027 ,  B29C64/106 ,  B29C64/135 ,  B33Y40/00 ,  B33Y70/00 ,  G03F7/0037 ,  Y10S430/118

摘要： The invention relates to a biocompatible, low-viscous, radiation curable formulation, particularly for use in stereolithography, for use in medical technology, in particular, for producing earpieces, containing: a) 55-95% by weight of a monomeric or oligomeric dimethacrylate based on bisphenol A or bisphenol F; b) 0-20% by weight of a urethane methacrylate having a functionality of n

摘要翻译： 本发明涉及生物相容性低粘度的可辐射固化制剂，特别是用于立体光刻，用于医疗技术，特别是用于制造耳塞，其包含：a）55-95重量％的单体或低聚二甲基丙烯酸酯 基于双酚A或双酚F; b）0-20重量％的官能度为n <4且粘度<15Pa·s的氨基甲酸酯甲基丙烯酸酯; c）2-15重量％的粘度为5Pa·s的单体脂族或脂环族二甲基丙烯酸酯; d）0-15重量％的粘度<3Pa·s的单官能甲基丙烯酸酯; e）0.5-6重量％的光引发剂或其吸收位于所用激光束的波长范围内的许多光引发剂的组合; f）0.0001-2重量％的抑制剂2,2,6,6-四甲基哌啶-1-基氧基（自由基），也与已知的抑制剂结合; g）0-40重量％的填料; h）0-5重量％的着色颜料; i）0-5重量％的剩余添加剂如UV稳定剂或铺展添加剂，其中组分a）至h）的比例总计为100重量％。

公开(公告)号：US20060228644A1

公开(公告)日：2006-10-12

申请号：US11103093

申请日：2005-04-11

申请人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

发明人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

IPC分类号： G03C1/00

CPC分类号： G03F7/0226 ,  G03F7/0047 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/118 ,  Y10S430/151

摘要： The present invention relates to a photoresist composition suitable for image-wise exposure and development as a positive photoresist comprising a positive photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The positive photoresist composition can be selected from (1) a composition comprising (i) a film-forming resin having acid labile groups, and (ii) a photoacid generator, or (2) a composition comprising (i) a film-forming novolak resin, and (ii) a photoactive compound, or (3) a composition comprising (i) a film-forming resin, (ii) a photoacid generator, and (iii) a dissolution inhibitor.

公开(公告)号：US06929896B2

公开(公告)日：2005-08-16

申请号：US10432263

申请日：2001-11-26

申请人： Hitoshi Yamato ,  Toshikag Asakura ,  Akira Matsumoto ,  Masaki Ohwa

发明人： Hitoshi Yamato ,  Toshikag Asakura ,  Akira Matsumoto ,  Masaki Ohwa

IPC分类号： C07B61/00 ,  C07C25/00 ,  C07C25/18 ,  C07C305/04 ,  C07C305/06 ,  C07C305/12 ,  C07C305/18 ,  C07C305/20 ,  C07C305/22 ,  C07C305/24 ,  C07C381/12 ,  C07D309/06 ,  C07D317/54 ,  C07D333/16 ,  C07H9/04 ,  C08G59/68 ,  C08G65/10 ,  G02B5/20 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/30

CPC分类号： C07H9/04 ,  B33Y70/00 ,  C07B2200/11 ,  C07C25/18 ,  C07C305/06 ,  C07C305/20 ,  C07C305/22 ,  C07C305/24 ,  C07C381/12 ,  C07C2601/14 ,  C07D309/06 ,  C07D317/54 ,  C07D333/16 ,  C08G59/68 ,  C08G65/105 ,  C40B40/00 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/118 ,  Y10S430/122 ,  Y10S430/123

摘要： A chemically amplified photoresist composition comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) as photosensitive acid donor, at least one compound of the formula Ia, Ib, Ic, IIb or IIc wherein R1 is for example C1-C5alkyl, C3-C30cycloalkyl, C1-C5haloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, C6-C12bicycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, or is a heteroaryl radical; all of which are unsubstituted or substituted; optionally some of the substituents form 5- or 6-membered rings with further substituents on the phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl ring or with one of the carbon atoms of the phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl ring; R′1 is for example C1-C12alkylene, C3-C30cycloalkylene, phenylene, naphtylene, diphenylene, or oxydiphenylene, wherein these radicals are unsubstituted or substituted; A and B for example are a direct bond; Ar1 and Ar2 independently of each other for example are phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl, all of which are unsubstituted or are substituted; Ar3, Ar4 and Ar5 for example have one of the meanings given for Ar1 and Ar2; Y is for example C3-C3-C30cycloalkylene, phenylene, naphthylene, diphenylene, or oxydiphenylene, all of which are unsubstituted or substituted.

公开(公告)号：US20030003399A1

公开(公告)日：2003-01-02

申请号：US09832989

申请日：2001-04-11

发明人： Ursula Muller ,  Tobias Wittig ,  Hans-Joachim Timpe

IPC分类号： G03F007/031 ,  G03F007/029 ,  G03F007/038 ,  G03F007/11 ,  G03F007/38 ,  G03F007/30

CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/465 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/118 ,  Y10S430/119 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/126 ,  Y10S430/127 ,  Y10S430/145 ,  Y10S430/146

摘要： The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazolium dyes, cyanine dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes and phthalocyanine pigments (b) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds (c) at least one polycarboxylic acid represented by the following formula I 1 wherein Y is selected from the group consisting of O, S and NR7, each of R4, R5 and R6 is independently selected from the group consisting of hydrogen, C1-C4 alkyl, aryl which is optionally substituted, nullCOOH and NR8CH2COOH, R7 is selected from the group consisting of hydrogen, C1-C6 alkyl, nullCH2CH2OH, and C1-C5 alkyl substituted with -COOH, R8 is selected from the group consisting of nullCH2COOH, nullCH2OH and null(CH2)2N(CH2COOH)2 and r is 0, 1, 2 or 3 with the proviso that at least one of R4, R5, R6, R7 and R8 comprises a nullCOOH group or salts thereof, and (d) at least one leuco dye, wherein the following inequation is met: oxa

摘要翻译： 本发明涉及含有引发剂体系的IR敏感组合物，其包含：（a）至少一种能够吸收选自三芳基胺染料，噻唑鎓染料，吲哚鎓染料，恶唑鎓染料，花青染料，聚苯胺染料，聚吡咯染料， 聚噻吩染料和酞菁颜料（b）至少一种能够产生选自多卤烷基取代的化合物的基团的化合物（c）至少一种由下式I表示的多元羧酸，其中Y选自O，S和NR7 ，R 4，R 5和R 6各自独立地选自氢，C 1 -C 4烷基，任选被取代的芳基，-COOH和NR 8 CH 2 COOH，R 7选自氢，C 1 -C 6烷基， CH 2 CH 2 OH和被-COOH取代的C 1 -C 5烷基，R 8选自-CH 2 COOH，-CH 2 OH和 - （CH 2）2 N（CH 2 COOH）2，r是0,1,2或3，条件是在 最小 R 4，R 5，R 6，R 7和R 8中的一个包含-COOH基团或其盐，和（d）至少一种无色染料，其中符合以下不等式：<段落lvl =“0” （e）中oxa =组分（a）的氧化电位的公式> oxa e e redb = eV中组分（b）的还原电位这些组合物特别适用于制备 印版。

公开(公告)号：US06263939B1

公开(公告)日：2001-07-24

申请号：US09366935

申请日：1999-08-04

申请人： Hisaki Miyamoto ,  Michiyoshi Nagashima ,  Kiyoshi Inoue ,  Sakae Noda

发明人： Hisaki Miyamoto ,  Michiyoshi Nagashima ,  Kiyoshi Inoue ,  Sakae Noda

IPC分类号： B32B3128

CPC分类号： B29C65/521 ,  B29C45/263 ,  B29C65/1406 ,  B29C65/1435 ,  B29C65/1445 ,  B29C65/1448 ,  B29C65/1467 ,  B29C65/1483 ,  B29C65/4815 ,  B29C65/4845 ,  B29C65/542 ,  B29C65/544 ,  B29C66/1122 ,  B29C66/322 ,  B29C66/452 ,  B29C66/65 ,  B29C66/71 ,  B29C66/72321 ,  B29C66/81267 ,  B29C66/8322 ,  B29C67/0044 ,  B29C2045/2659 ,  B29K2995/0027 ,  B29L2017/005 ,  B32B37/1284 ,  B32B2310/0831 ,  B32B2429/02 ,  G11B7/24 ,  G11B7/26 ,  Y10S430/118 ,  Y10S430/146 ,  Y10T156/1702 ,  Y10T428/21 ,  Y10T428/24479 ,  Y10T428/25 ,  Y10T428/31 ,  Y10T428/31515 ,  B29K2069/00

摘要： The disk-shaped optical information medium of this invention includes: a first substrate having a center hole; a second substrate having a center hole; and a radiation curable resin interposed between the first and second substrates for bonding together the first and second substrates, wherein the optical information medium further includes a stopper for preventing the radiation curable resin from protruding into the center holes of the substrates, and a space between the first and second substrates of at least a half of a clamp region for clamping the optical information medium is filled with the resin.

摘要翻译： 本发明的盘状光信息介质包括：具有中心孔的第一基板; 具有中心孔的第二基板; 以及插入在第一和第二基板之间的可辐射固化树脂，用于将第一和第二基板接合在一起，其中光学信息介质还包括用于防止可辐射固化树脂突出到基板的中心孔中的挡块和 用于夹持光学信息介质的夹持区域的至少一半的第一和第二基板被树脂填充。