Abstract:
A first laminated sub-structure having a semiconductor substrate, a lower insulating layer on the semiconductor substrate, emitter electrodes formed in micro-apertures in the lower insulating layer and a gate electrode on the upper surface of the lower insulating layer is aligned with a second laminated sub-structure having a transparent upper insulating layer and a grid member on the transparent upper insulating layer by means of a stepper, and the first and second laminated sub-structures are fixed to each other through a field assisted glass-metal sealing technique.
Abstract:
An electron beam apparatus for applying an electron beam from an electron source onto a target plane is characterized by comprising one sheet of electrode disposed between said electron source for emitting the electron beam in parallel or substantially parallel and a target arrangement position, and a power source for supplying a desired voltage to said electrode.
Abstract:
A charged particle beam focussing device in which a pair of rod like electrodes having a potential difference maintained between them are arranged on either side of the path of a beam to be focussed. The configuration of the electrodes is such that the significant electric field between them is confined to a short section of the path of the particles. A second pair of similar electrodes are arranged parallel to and in a plane substantially parallel to the plane of the first pair and displaced in a direction parallel to the plane in which the first pair lie, a potential difference being maintained between the second pair of electrodes. The arrangement is such that by variation of the potentials between the electrodes a beam of charged particles passing along the beam path between the electrodes can be caused to come to a focal line in a predetermined plane. A further device arranged at right angles to the first beam is provided to bring the beam to a point focus. The electrodes are preferably passed through earth reflector planes arranged on either side of the path of the beam.
Abstract:
An electron-optical lens arrangement for electron beam apparatus having a static and a dynamic focussing lens system, in which the dynamic focussing lens system is situated inside the static focussing lens system.
Abstract:
In the present invention, a cathode assembly for an X-ray tube is provided including a cathode cup, a pair of emitters disposed within the cup and each configured to emit an electron beam therefrom and an electrode spaced from the pair of emitters and configured to affect the shape and/or intensity of the electron beams emitted by the pair of emitters. The electrode includes a rod extending across a central aperture defined within the electrode that enables the electrode to grid or focus the electron beam or beams emitted from the emitters using a bias voltage between +10 kV and −10 kV.
Abstract:
The invention relates to an electron gun for generating a flat electron beam, comprising a cathode with an emission surface which is curved about a central axis and which is designed to emit electrons. The electron gun further comprises an accelerating device for accelerating the electrons in a radial direction towards a target region on the central axis. Furthermore, the emission surface has a width in the azimuth direction and a height oriented perpendicularly to the width, said width being at least ten times greater than the height.
Abstract:
A hybrid electrostatic lens is used to shape and focus an ion beam. The hybrid electrostatic lens comprises an Einzel lens defined by an elongated tube having a first and second ends and a first electrode disposed at the first end and a second electrode disposed at the second end. The elongated tube is configured to receive a voltage bias to create an electric field within the Einzel lens as the ion beam travels through the hybrid electrostatic lens. The hybrid electrostatic lens further includes a quadrupole lens having a first stage and a second stage, where each of the stages is defined by a plurality of electrodes turned 90° with respect to each other to define a pathway in the Z direction through the elongated tube. The Einzel lens focuses the ion beam and the quadrupole lens shapes the ion beam.
Abstract:
A charged particle shaped beam column includes: an objective lens configured to form a charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate; an optical element with 8N poles disposed radially symmetrically about the optic axis of the column, the optical element being positioned between a condenser lens and the objective lens, wherein integer N1; and a power supply applying excitations to the optical element's 8N poles to provide an octupole electromagnetic field. The octupole electromagnetic field induces azimuthally-varying third-order deflections to beam trajectories passing through the 8N-pole optical element. By controlling the excitation of the 8N poles a shaped beam, such as a square beam, can be formed at the surface of the substrate.
Abstract:
An ion transfer arrangement for transporting ions between higher and lower pressure regions of the mass spectrometer comprises an ion transfer conduit 60. The conduit 60 has an inlet opening towards a relatively high pressure chamber 40 and an outlet 70 opening towards a relatively low pressure chamber. The conduit 60 also has at least one side wall surrounding an ion transfer channel 115. The side wall includes a plurality of apertures 140 formed in the longitudinal direction of the side wall so as to permit a flow of gas from within the ion transfer channel 115 to a lower pressure region outside of the side wall of the conduit 60.
Abstract:
An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected.