摘要:
Embodiments of the invention are provided for a thin film stack containing a plurality of epitaxial stacks disposed on a substrate and a method for forming such a thin film stack. In one embodiment, the epitaxial stack contains a first sacrificial layer disposed over the substrate, a first epitaxial film disposed over the first sacrificial layer, a second sacrificial layer disposed over the first epitaxial film, and a second epitaxial film disposed over the second sacrificial layer. The thin film stack may further contain additional epitaxial films disposed over sacrificial layers. Generally, the epitaxial films contain gallium arsenide alloys and the sacrificial layers contain aluminum arsenide alloys. Methods provide the removal of the epitaxial films from the substrate by etching away the sacrificial layers during an epitaxial lift off (ELO) process. The epitaxial films are useful as photovoltaic cells, laser diodes, or other devices or materials.
摘要:
A system and method, that will allow helicopter pilots to air taxi from an instrument approach to an airport to a designated landing area or pad, includes symbology characterizing an approach aim point different from an aim point for aircraft landing on the runway, and symbology indicating an air taxi route from the approach aim point to a landing pad.
摘要:
There is provided a method of determining at least one linear-crosstalk-related parameter of an optical signal-under-test having, within an optical channel bandwidth, at least a data-carrying signal contribution and a wavelength-dependent linear-crosstalk contribution arising from a data-carrying signal contribution of an adjacent optical signal associated with an adjacent channel to the optical signal-under-test, the method comprising: acquiring at least one optical spectrum trace encompassing a quasi-continuum of closely-spaced wavelengths over a spectral range extending to at least part of both the signal under test and the adjacent optical signal; and estimating said linear-crosstalk contribution using at least spectral properties of said at least one optical spectrum trace; wherein one of said at least one linear-crosstalk-related parameter is the linear-crosstalk contribution and is determined from said estimating.
摘要:
Embodiments of the invention generally relate to a chemical vapor deposition system and related method of use. In one embodiment, the system includes a reactor lid assembly having a body, a track assembly having a body and a guide path located along the body, and a heating assembly operable to heat the substrate as the substrate moves along the guide path. The body of the lid assembly and the body of the track assembly are coupled together to form a gap that is configured to receive a substrate. In another embodiment, a method of forming layers on a substrate using the chemical vapor deposition system includes introducing the substrate into a guide path, depositing a first layer on the substrate and depositing a second layer on the substrate, while the substrate moves along the guide path; and preventing mixing of gases between the first deposition step and the second deposition step.
摘要:
A method and system for dicing semiconductor devices from semiconductor thin films. A semiconductor film, backed by a metal layer, is bonded by an adhesive layer to a flexible translucent substrate. Reference features define device boundaries. An ultraviolet laser beam is aligned to the reference features and cuts through the semiconductor film, the metal layer and partially into the adhesive layer, cutting a frontside street along a real or imaginary scribe line on the cutting path. An infrared laser beam is aligned to the trough of the frontside street from the back surface of the flexible substrate, or the scribe lines are mapped to the back surface of the flexible substrate. The infrared laser beam cuts through the flexible substrate and the majority of the thickness of the adhesive layer, cutting a backside street along the scribe line. The backside street overlaps or cuts through to the frontside street, thereby separating the semiconductor devices.
摘要:
There is provided a method for determining the in-band noise in agile multichannel Dense Wavelength Division Multiplexing (DWDM) optical systems, where the interchannel noise is not representative of the in-band noise in the optical channel. The method relies on the analysis of two observations of the same input optical signal. In the two observations, the linear relationship between the optical signal contribution and the optical noise contribution (i.e. the observed OSNR) is different, which allows the discrimination of the signal and noise contributions in the input optical signal. In a first approach, the two observations are provided by polarization analysis of the input optical signal. In a second, the input optical signal is obtained using two different integration widths.
摘要:
Embodiments for displaying first and second images to a pilot of an aircraft are presented. The embodiments include, but are not limited to, obtaining a first image signal and a second image signal, commanding a display unit to display a first image on a display screen corresponding to the first signal, and computing an image moving velocity of the first image. The method further comprises estimating an image flow velocity for the second image based on the second image signal and comparing the image moving velocity of the first image to the image flow velocity of the second image. After the comparison, the display unit is commanded to display the second image overlaid on the first image, and commanding the display unit to establish an intensity of the second image within a predefined range based upon the comparison.
摘要:
A method displaying a pathway (226, 502) for an aircraft includes receiving (302, 402, 602) an instrument generated course generally in alignment with a runway centerline (214), determining (304, 404, 604) the pathway (226, 502) based on aircraft flight parameters in which the aircraft may fly in order to intersect the instrument generated course, rendering (306, 406, 606) on a display the instrument generated course and the pathway; and periodically repeating (308, 408, 608) the determining and rendering steps. The energy state of the aircraft may be considered in determining the pathway and optional indices (508) may be displayed indicating deviation from the pathway centerline.
摘要:
Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD). In one embodiment, a heating lamp assembly for a CVD reactor system is provided which includes a lamp housing disposed on an upper surface of a support base and containing a plurality of lamps extending from a first lamp holder to a second lamp holder. The lamps may have split filament lamps and/or non-split filament lamps, and in some examples, split and non-split filament may be alternately disposed between the first and second lamp holders. A reflector may be disposed on the upper surface of the support base between the first and second lamp holders. In another embodiment, the method includes exposing a lower surface of a wafer carrier to energy emitted from the heating lamp assembly and heating the wafer carrier to a predetermined temperature.
摘要:
Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor has a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isolator assembly, a second showerhead assembly, and an exhaust assembly consecutively and linearly disposed next to each other on a lid support. The CVD reactor further contains first and second faceplates disposed on opposite ends of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly and the exhaust assembly is disposed between the second showerhead assembly and the second faceplate. The reactor body has a wafer carrier disposed on a wafer carrier track and a lamp assembly disposed below the wafer carrier track and containing a plurality of lamps which may be utilized to heat wafers disposed on the wafer carrier.