Nonlinerar optical device structure with compound semiconductor having
graded chemical composition
    51.
    发明授权
    Nonlinerar optical device structure with compound semiconductor having graded chemical composition 失效
    具有分级化学成分的化合物半导体的非线性光学器件结构

    公开(公告)号:US4999485A

    公开(公告)日:1991-03-12

    申请号:US533999

    申请日:1990-06-04

    IPC分类号: G02F1/017 G02F1/355

    摘要: A nonlinear optical device structure is formed by a compound semiconductor having a graded chemical composition such that the average drift velocity of electrons is in the same direction as, but of greater magnitude than, that of holes. In this way, when a pump optical beam (control beam) is flashed (as by a picosecond pulse) upon the structure, electron-hole pairs are created with a resulting temporary spatial separation between the holes and the electron--whereby an electric dipole moment is temporarily induced in the structure. In turn, this dipole moment temporarily modifies either the birefringence or absorption property, or both, with respect to a controlled beam--whereby the polarization, phase, or intensity, of the controlled beam can be modified by the control beam. After the electrons and holes drift to positions which extinguish the dipole the structure is ready for a repeat performance.

    摘要翻译: 非线性光学器件结构由具有分级化学成分的化合物半导体形成,使得电子的平均漂移速度与孔的方向相同但大于其值。 以这种方式,当泵结构的光束(控制光束)通过皮秒脉冲闪光时,电子 - 空穴对产生空穴和电子之间的临时空间分隔,由此电偶极矩 在结构中暂时诱导。 反过来,这个偶极矩相对于被控制的光束临时修改双折射或吸收特性或二者,由此受控束的偏振,相位或强度可以被控制光束修改。 在电子和空穴漂移到熄灭偶极子的位置之后,该结构准备好重复执行。

    Repeated velocity overshoot semiconductor device
    53.
    发明授权
    Repeated velocity overshoot semiconductor device 失效
    重复速度超调半导体器件

    公开(公告)号:US4719496A

    公开(公告)日:1988-01-12

    申请号:US631041

    申请日:1986-02-12

    摘要: Semiconductor structures suitable for repeated velocity overshoot are described. The structure comprises at least two velocity overshoot sections with each section comprising a first semiconductor region having a rapid change in potential and a dimension such that the carrier transit time is comparable to or shorter than the mean scattering time and a second semiconductor region having a more gradual change in potential and a dimension such that the carrier transit time is sufficient to allow the energy relaxation time to be exceeded.

    摘要翻译: 描述适用于重复速度超调的半导体结构。 该结构包括至少两个速度过冲部分,每个部分包括具有快速变化的电位的第一半导体区域和使得载流子渡越时间与平均散射时间相当或更短的尺寸,以及具有更多的第二半导体区域 电势的逐渐变化和使得载流子传播时间足以允许超过能量松弛时间的尺寸。

    METHODS AND APPARATUSES FOR ENGINEERING ELECTROMAGNETIC RADIATION
    55.
    发明申请
    METHODS AND APPARATUSES FOR ENGINEERING ELECTROMAGNETIC RADIATION 审中-公开
    工程电磁辐射的方法和装置

    公开(公告)号:US20130266034A1

    公开(公告)日:2013-10-10

    申请号:US13696734

    申请日:2011-05-06

    IPC分类号: H01S3/063

    摘要: laser devices described may emit a beam of electromagnetic radiation having a large wavelength (e.g., mid-infrared, far-infrared) and exhibiting a low angle of divergence. In some embodiments, the wavelength of the electromagnetic radiation is between 3 microns and 500 microns and the divergence angel is less than 15 degrees. Electromagnetic waves may be produced from a single monolithic laser device which includes a laser waveguide (e.g., quantum cascade laser waveguide) and a collimating element having at least one indented region (e.g., a plurality of periodically disposed grooved structures). A portion of the electromagnetic radiation may propagate as surface waves (e.g., surface plasmons) along the surface of the collimating element where indented regions in the collimating element may decrease the propagation velocity of the surface waves. A portion of the electromagnetic radiation may also be substantially convinced within a grooved structure of the collimating element (e.g., as channel polaritons).

    摘要翻译: 所描述的激光器件可以发射具有大波长(例如,中红外,远红外)并且呈现低发散角的电磁辐射束。 在一些实施例中,电磁辐射的波长在3微米至500微米之间,发散角小于15度。 电磁波可以由包括激光波导(例如,量子级联激光波导)和具有至少一个凹陷区域(例如,多个周期性设置的带槽结构)的准直元件的单个单片激光装置产生。 电磁辐射的一部分可以沿着准直元件的表面作为表面波(例如,表面等离子体激元)传播,其中准直元件中的凹陷区域可能降低表面波的传播速度。 电磁辐射的一部分也可以在准直元件的沟槽结构内(例如,作为通道极化子)基本相信。

    Methods and apparatus for improving collimation of radiation beams
    56.
    发明授权
    Methods and apparatus for improving collimation of radiation beams 有权
    用于改善辐射束准直的方法和装置

    公开(公告)号:US08328396B2

    公开(公告)日:2012-12-11

    申请号:US12738180

    申请日:2008-11-19

    IPC分类号: F21V33/00

    摘要: An apparatus for collimating radiation can include an aperture of subwavelength dimensions and a neighboring set of grooves defined on a metal film integrated with an active or passive device that emits radiation. Integration of the beam collimator onto the facet of a laser or other radiation-emitting device provides for beam collimation and polarization selection. Beam divergence can be reduced by more than one order of magnitude compared with the output of a conventional laser. An active beam collimator with an aperture-groove structure can be integrated with a wide range of optical devices, such as semiconductor lasers (e.g., quantum cascade lasers), light emitting diodes, optical fibers, and fiber lasers.

    摘要翻译: 用于准直辐射的装置可以包括亚波长尺寸的孔径和限定在与发射辐射的有源或无源器件集成的金属膜上的相邻的一组沟槽。 将光束准直仪集成到激光器或其他辐射发射器件的小面上提供光束准直和偏振选择。 与常规激光器的输出相比,光束发散度可以减少超过一个数量级。 具有孔径凹槽结构的有源光束准直器可以与诸如半导体激光器(例如,量子级联激光器),发光二极管,光纤和光纤激光器等宽范围的光学器件集成。