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    Mechanical signal producer based on micromechanical oscillators and intelligent acoustic detectors and systems based thereon
    52.
    发明授权
    Mechanical signal producer based on micromechanical oscillators and intelligent acoustic detectors and systems based thereon 失效
    基于微机械振荡器和基于其的智能声学检测器和系统的机械信号生成器

    公开(公告)号：US6092422A

    公开(公告)日：2000-07-25

    申请号：US29894

    申请日：1998-03-10

    申请人： Gerd K. Binnig ,  Pierre L. Gueret ,  Heinrich Rohrer ,  Peter Vettiger

    发明人： Gerd K. Binnig ,  Pierre L. Gueret ,  Heinrich Rohrer ,  Peter Vettiger

    IPC分类号： A61F11/00 ,  G01H11/00 ,  G10L11/02 ,  G10L15/28 ,  H04R25/00 ,  G01D21/00

    CPC分类号： G01H11/00

    摘要： The present invention concerns mechanical signal processing comprising a mechanical adder as a basic building block. Such a mechanical adder (40), which is a basic element of the present invention, comprises a first micromechanical member (40.1) being sensitive to a first frequency (f.sub.1) and a second micromechanical member (40.2) being sensitive to a second frequency (f.sub.2). The two micromechanical members (40.1, 40.2) are coupled via a linear coupling (41) to provide a superposition (sum) of the two frequencies (f.sub.1 and f.sub.2). Based on the adder, AND-gates and OR-gates can be realized by adding further micromechanical members and appropriate linear and non-linear coupling elements.

    摘要翻译： PCT No.PCT / IB95 / 00817 Sec。 371日期1998年3月10日 102（e）1998年3月10日PCT PCT 1995年9月29日PCT公布。 公开号WO97 / 13127 日期1997年04月10日本发明涉及机械信号处理，其包括作为基本构建块的机械加法器。 作为本发明的基本元件的这种机械加法器（40）包括对第一频率（f1）敏感的第一微机械构件（40.1）和对第二频率敏感的第二微机械构件（40.2） f2）。 两个微机械构件（40.1,40.2）经由线性耦合（41）耦合以提供两个频率（f1和f2）的叠加（和）。 基于加法器，可以通过添加更多的微机械构件和适当的线性和非线性耦合元件来实现与门和OR门。

    Mask and method for modification of a surface
    53.
    发明授权
    Mask and method for modification of a surface 失效
    用于修饰表面的掩模和方法

    公开(公告)号：US6080513A

    公开(公告)日：2000-06-27

    申请号：US072534

    申请日：1998-05-04

    申请人： Juergen Brugger ,  Michel Despont ,  Peter Vettiger

    发明人： Juergen Brugger ,  Michel Despont ,  Peter Vettiger

    IPC分类号： G03F1/00 ,  G03F9/00

    CPC分类号： G03F9/00 ,  C23C14/042

    摘要： A surface of a substrate (3) is to be exposed to a medium (11) directed towards said surface and which modifies said surface. A mask (4) to be used therefor has at least one opening (9) through which said medium (11) is allowed to reach said surface. The opening (9) is located in a protrusion (10) of said mask (4) which is directed versus said surface.

    摘要翻译： 衬底（3）的表面将暴露于指向所述表面的介质（11）并且修改所述表面。 用于其的掩模（4）具有至少一个开口（9），所述介质（11）可以通过所述开口到达所述表面。 开口（9）位于所述面罩（4）的与所述表面相对的突起（10）中。

    Improved planar etched mirror facets
    54.
    发明授权
    Improved planar etched mirror facets 失效
    改进的平面蚀刻镜面

    公开(公告)号：US5103493A

    公开(公告)日：1992-04-07

    申请号：US669817

    申请日：1991-03-15

    申请人： Peter L. Buchmann ,  Peter Vettiger ,  Otto Voegeli ,  David J. Webb

    发明人： Peter L. Buchmann ,  Peter Vettiger ,  Otto Voegeli ,  David J. Webb

    IPC分类号： H01L21/302 ,  G02B6/122 ,  H01L21/3065 ,  H01L27/15 ,  H01S5/00 ,  H01S5/02 ,  H01S5/028 ,  H01S5/16 ,  H01S5/22

    CPC分类号： H01S5/22 ,  H01S5/028 ,  H01S5/16 ,  H01S5/0202 ,  H01S5/0203

    摘要： A method, and device produced therewith, for improving the planarity of etched mirror facets 18 of integrated optic structures with non-planar stripe waveguides, such as ridge or groove diode lasers or passive devices such as modulators and switches. The curvature of the mirror facet surface at the edges of the waveguide due to topographical, lithographical and etch process effects, causes detrimental phase distortions, and is avoided by widening the waveguide end near the mirror surface thereby shifting the curved facet regions away from the light mode region to surface regions where curvature is not critical.

    摘要翻译： 一种用于改进具有非平面条纹波导的集成光学结构的蚀刻镜面18（例如脊或沟槽二极管激光器）或无源器件（诸如调制器和开关）的平面度的方法和装置。 由于地形，光刻和蚀刻过程效应，波导边缘处的镜面表面的曲率造成有害的相位失真，并且通过加宽靠近镜面的波导端来避免，从而使弯曲的小面区域远离光线 模式区域到曲面不重要的表面区域。

    Process for forming sub-micrometer patterns using silylation of resist side walls
    55.
    发明授权
    Process for forming sub-micrometer patterns using silylation of resist side walls 失效
    使用抗蚀剂侧壁的甲硅烷基化形成亚微米图案的方法

    公开(公告)号：US4803181A

    公开(公告)日：1989-02-07

    申请号：US26799

    申请日：1987-03-17

    申请人： Peter L. Buchmann ,  Peter Vettiger ,  Bart J. Van Zeghbroech

    发明人： Peter L. Buchmann ,  Peter Vettiger ,  Bart J. Van Zeghbroech

    IPC分类号： H01L21/30 ,  G03F7/40 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/265

    CPC分类号： G03F7/405 ,  Y10S148/051 ,  Y10S148/111 ,  Y10S148/137 ,  Y10S438/947 ,  Y10S438/948 ,  Y10S438/949 ,  Y10S438/95

    摘要： A process for forming sidewalls for use in the fabrication of semiconductor structures, where the thin, vertical sidewalls are "image transferred" to define sub-micron lateral dimensions.First, a patterned resist profile with substantially vertical edges is formed on a substrate on which the sidewalls are to be created. Then, the profile is soaked in a reactive organometallic silylation agent to silylate the top and the vertical edges of the resist to a predetermined depth, thereby rendering the profile surfaces highly oxygen etch resistant. In a subsequent anisotropic RIE process, the horizontal surfaces of the silylated profile and the unsilylated resist are removed, leaving the silylated vertical edges, that provide the desired free-standing sidewalls, essentially unaffected.

    摘要翻译： 用于形成用于制造半导体结构的侧壁的方法，其中薄的垂直侧壁被“图像转印”以限定亚微米横向尺寸。 首先，在其上将形成侧壁的基板上形成具有基本垂直边缘的图案化抗蚀剂轮廓。 然后，将该轮廓浸泡在反应性有机金属硅烷化剂中以将抗蚀剂的顶部和垂直边缘甲硅烷化至预定深度，从而使轮廓表面具有高耐氧蚀刻性。 在随后的各向异性RIE过程中，去除了甲硅烷基化曲线和未磺酰化的抗蚀剂的水平表面，留下提供所需的独立侧壁的甲硅烷基化的垂直边缘基本上不受影响。

    Electronic hybrid circuit for connecting a two-wire line to switching system
    58.
    发明授权
    Electronic hybrid circuit for connecting a two-wire line to switching system 失效
    用于将双线线路连接到交换系统的电子混合电路

    公开(公告)号：US4086447A

    公开(公告)日：1978-04-25

    申请号：US769247

    申请日：1977-02-16

    申请人： Hans Rudolf Schindler ,  Peter Vettiger

    发明人： Hans Rudolf Schindler ,  Peter Vettiger

    IPC分类号： H04B3/03 ,  H04B1/58 ,  H04M19/00

    CPC分类号： H04M19/005 ,  H04B1/587

    摘要： This invention comprises a telephone hybrid circuit having two opto-coupler arrangements for transferring voice signals from the two-wire line to a port of the switching system on one hand and from a port of the switching system to the two-wire line on the other hand. In addition, a pair of feeder circuits in the form of current sources comprising active elements are provided for feeding a constant positive direct current to one wire of the two-wire line and a negative direct current of equal magnitude to the other wire of the two-wire line. Each of the current sources includes control circuitry for maintaining a constant ratio between the current furnished by the current source and a control current common to both current sources. A control current path is connected to the output of one of the opto-coupler arrangements for generating a common control current in response to a dc signal and a superimposed voice signal received from a port of the switching system. The other opto-coupler arrangement couples the signals from the two-wire line to a port of the switching system.

    摘要翻译： 本发明包括具有两个光耦合装置的电话混合电路，用于一方面将语音信号从双线线路传送到交换系统的端口，另一方面从另一方面将交换系统的端口传输到双线线路 手。 另外，提供了包括有源元件的电流源形式的一对馈电电路，用于将恒定的正直流电流馈送到双线线路的一条线路，并且向两条线路的另一条线路提供等量的负直流电流 一线。 每个电流源包括用于维持由电流源提供的电流与两个电流源公共的控制电流之间的恒定比率的控制电路。 控制电流路径连接到光耦合装置之一的输出，以响应于从交换系统的端口接收的直流信号和叠加的语音信号而产生公共控制电流。 另一个光耦合装置将来自双线线路的信号耦合到交换系统的端口。