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    Laser thin film poly-silicon annealing optical system
    52.
    发明授权
    Laser thin film poly-silicon annealing optical system 有权
    激光薄膜多晶硅退火光学系统

    公开(公告)号：US07009140B2

    公开(公告)日：2006-03-07

    申请号：US10884101

    申请日：2004-07-01

    申请人： William N. Partio ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partio ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 μm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of teh long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2. The apparatus may also have a high average power in the laser ouput light pulse beam as delivered to the workpiece and a a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The linewidth due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热方法和装置，其可以使在等于或高于4000Hz的工作的脉冲XeF激光器产生在约351nm的中心波长的激光输出光脉冲光束; 光学系统将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20um，并且扩大激光输出光脉冲光束以在光束的长轴上形成工件覆盖的长度 轴; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将所述激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍数以允许所述场停止在所述工件处保持足够陡峭的光束轮廓而不阻塞所述光束轮廓 强度水平太高 该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有弯管校正机构。 弯管矫正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的弯头矫正机构，其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。

    Electric discharge laser with active wavelength chirp correction
    55.
    发明授权
    Electric discharge laser with active wavelength chirp correction 有权
    具有有源波长啁啾校正的放电激光器

    公开(公告)号：US06621846B1

    公开(公告)日：2003-09-16

    申请号：US09501160

    申请日：2000-02-09

    申请人： Richard L. Sandstrom ,  Palash P. Das ,  George J. Everage ,  Frederick G. Erie ,  William N. Partlo ,  Igor V. Fomenkov

    发明人： Richard L. Sandstrom ,  Palash P. Das ,  George J. Everage ,  Frederick G. Erie ,  William N. Partlo ,  Igor V. Fomenkov

    IPC分类号： H01S322

    CPC分类号： H01S3/104 ,  G03F7/70025 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/708 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/134 ,  H01S3/225

    摘要： Electric discharge laser with active chirp correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.

    摘要翻译： 具有主动啁啾校正的放电激光器。 本申请公开了用于调节和分配这些压力波的技术。 在一些激光器中，可以使用现有技术的相对较慢的波长控制装置的主动波长控制基本上校正了小的可预测的图案。 在优选实施例中，描述了一种简单的学习算法，以便在预期学习的啁啾模式中允许预调谐镜调节。 实施例包括具有非常精细调节的步进电动机，使得调节步骤的尺寸被显着减小以便更精确的调谐。 然而，完全消除波长啁啾通常不可行，在激光室的结构变化和提前调谐; 因此，申请人已经开发了用于非常快的主动啁啾校正的设备和技术。 改进的技术包括相对较慢的步进电机和非常快的压电驱动器的组合。 在另一个优选实施例中，在脉冲对脉冲基础上进行啁啾校正，其中测量一个脉冲的波长，并且基于测量校正下一个脉冲的波长。 该校正技术能够以2000Hz及更高​​的重复速率工作。

    Wavelength reference for laser
    57.
    发明授权
    Wavelength reference for laser 有权
    激光波长参考

    公开(公告)号：US06396582B1

    公开(公告)日：2002-05-28

    申请号：US09206526

    申请日：1998-12-07

    申请人： Jesse D. Buck ,  Raymond F. Cybulski ,  Peter C. Newman ,  Palash P. Das

    发明人： Jesse D. Buck ,  Raymond F. Cybulski ,  Peter C. Newman ,  Palash P. Das

    IPC分类号： G01J328

    CPC分类号： H01S3/1303 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/225

    摘要： The present invention includes a system and method for characterizing the wavelength of a beam of radiation using a known reference transition. The invention comprises a vapor including a material having a transition which absorbs radiation of a known wavelength, the vapor being contained in a container. The container includes an optical path along which the beam of radiation can propagate through the vapor. A dispersive optical element is aligned along the optical path. A detector is aligned along the optical path after the dispersive element. Wavelength information about the beam of radiation is determined from the position of a dip in the detector signal that is correlated to the known reference transition. This method is most useful when the laser bandwidth substantially exceeds the transition bandwidth.

    摘要翻译： 本发明包括使用已知参考转变来表征辐射束的波长的系统和方法。 本发明包括一种蒸汽，其包括具有吸收已知波长的辐射的过渡物质，该蒸气被包含在容器中。 容器包括一个光路，辐射束沿着该光路传播通过蒸汽。 色散光学元件沿光路对准。 在分散元件之后，检测器沿光路对齐。 关于辐射束的波长信息根据与已知参考转变相关的检测器信号中的倾角的位置来确定。 当激光带宽基本上超过转换带宽时，该方法是最有用的。

    Energy efficient lithography laser
    59.
    发明授权
    Energy efficient lithography laser 失效
    节能光刻激光

    公开(公告)号：US06320892B1

    公开(公告)日：2001-11-20

    申请号：US09420297

    申请日：1999-10-18

    申请人： Gamaralalage G. Padmabandu ,  Palash P. Das ,  Tom A. Watson ,  Paolo Zambon

    发明人： Gamaralalage G. Padmabandu ,  Palash P. Das ,  Tom A. Watson ,  Paolo Zambon

    IPC分类号： H01S3223

    CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

    摘要： An excimer laser system with an automatic fluorine control system to permit precise control of the fluorine concentration within an F2 “sweet spot” in a gas discharge laser chamber. This is done with a computer control system which monitors laser parameters, determines &Dgr;E/&Dgr;V, the change of pulse energy with voltage, and automatically and precisely controls the fluorine concentration based on &Dgr;E/&Dgr;V without the need to actually measure the fluorine concentration. The present invention is especially useful in lithography environments in which photo resist having a wide range of sensitivity are used. The present invention permits operation of the laser at substantially maximum efficiency over a wide range of pulse energy outputs.

    摘要翻译： 一种具有自动氟控制系统的准分子激光系统，用于在气体放电激光室中精确控制F2“甜点”内的氟浓度。 这是通过电脑控制系统进行的，该系统监视激光参数，确定DELTAE / DELTAV，脉冲能量随电压的变化，并且可以根据DELTAE / DELTAV自动精确控制氟浓度，而无需实际测量氟浓度。 本发明在使用具有宽灵敏度范围的光刻胶的光刻环境中特别有用。 本发明允许激光器在宽范围的脉冲能量输出上以基本最大的效率进行操作。

    Bandwidth estimating technique for narrow band laser
    60.
    发明授权
    Bandwidth estimating technique for narrow band laser 有权
    窄带激光器带宽估计技术

    公开(公告)号：US06317448B1

    公开(公告)日：2001-11-13

    申请号：US09405615

    申请日：1999-09-23

    申请人： Palash P. Das ,  Jesse D. Buck

    发明人： Palash P. Das ,  Jesse D. Buck

    IPC分类号： H01S310

    CPC分类号： G01J9/00 ,  H01S3/1303 ,  H01S3/225

    摘要： A wavelength system for measuring the bandwidth of a narrowband laser utilizing prior art equipment normally provided for calibrating wavelength measurement equipment. The prior art includes a wavemeter for measuring incremental changes in wavelength and an atomic wavelength reference for calibrating the wavemeter. The atomic wavelength reference includes a vapor cell for providing a vapor having at least one absorption line near a desired operating wavelength. The system includes a wavelength tuning device with a tuning range sufficient to tune the laser to operate at the wavelength of the absorption line in order to calibrate the wavemeter. Measurements of the bandwidth of the absorption spectrum obtained by scanning the laser output wavelength over the absorption line are used to estimate the bandwidth of the output beam. This estimate in a preferred embodiment is used to confirm the accuracy of the normal bandwith measurements. In a preferred system the laser is a KrF laser and the vapor is iron vapor. In another preferred embodiment, the laser is an ArF laser, the vapor is platinum and the absorption line is either 193,224.3 pm or 193,436.9.

    摘要翻译： 用于测量通常用于校准波长测量设备的现有技术设备的窄带激光器的带宽的波长系统。 现有技术包括用于测量波长的增量变化的波长计和用于校准波形计的原子波长基准。 原子波长参考包括用于提供具有靠近所需工作波长的至少一个吸收线的蒸汽的蒸汽池。 该系统包括具有调谐范围足以调谐激光器以在吸收线的波长处操作以便校准波形计的波长调谐装置。 使用通过在吸收线上扫描激光输出波长而获得的吸收光谱的带宽的测量来估计输出光束的带宽。 在优选实施例中的该估计用于确认正常带宽测量的精度。 在优选的系统中，激光是KrF激光，蒸气是铁蒸气。 在另一个优选实施例中，激光是ArF激光，蒸汽是铂，吸收线是193,224.3μm或193,436.9。