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74 条记录 (耗时 0.019 秒)

    REMOVAL OF IMPURITIES FROM HYDROGEN-CONTAINING MATERIALS
    51.
    发明申请
    REMOVAL OF IMPURITIES FROM HYDROGEN-CONTAINING MATERIALS 有权
    从含氢材料中清除污染物

    公开(公告)号：US20090282975A1

    公开(公告)日：2009-11-19

    申请号：US12466272

    申请日：2009-05-14

    申请人： Tadaharu Watanabe ,  Mark Raynor ,  Ade Lau ,  Hirotaka Mangyo

    发明人： Tadaharu Watanabe ,  Mark Raynor ,  Ade Lau ,  Hirotaka Mangyo

    IPC分类号： B01D53/04

    CPC分类号： C01B33/046 ,  B01D53/02 ,  B01D53/38 ,  B01D2251/202 ,  B01D2251/2062 ,  B01D2253/106 ,  B01D2255/30 ,  B01D2258/0216 ,  B01J20/103 ,  B01J20/186 ,  B01J2220/42

    摘要： Methods of purifying hydrogen-containing materials are described. The methods may include the steps of providing a purifier material comprising silica. The silica may be heated at temperature of about 100° C. or more in a dry atmosphere to form activated silica. The activated silica may be contacted with a starting hydrogen-containing material, where the activated silica reduces a concentration of one or more impurity from the starting hydrogen-containing material to form the purified hydrogen-containing material, and where the activated silica does not decompose the purified hydrogen-containing material.

    摘要翻译： 描述了纯化含氢材料的方法。 所述方法可以包括提供包含二氧化硅的净化剂材料的步骤。 二氧化硅可以在约100℃或更高的温度下在干燥气氛中加热以形成活性二氧化硅。 活化的二氧化硅可以与起始含氢材料接触，其中活性二氧化硅从起始含氢材料中降低一种或多种杂质的浓度以形成纯化的含氢材料，并且其中活性二氧化硅不分解 纯化的含氢材料。

    Torque limiting hand wheel
    52.
    发明授权
    Torque limiting hand wheel 有权
    扭矩限制手轮

    公开(公告)号：US07584936B2

    公开(公告)日：2009-09-08

    申请号：US11470751

    申请日：2006-09-07

    申请人： Jeff Lewis ,  Stuart Muller

    发明人： Jeff Lewis ,  Stuart Muller

    IPC分类号： F16K31/44

    CPC分类号： F16K31/60 ,  F16D7/048 ,  F16D43/2028 ,  G05G1/08

    摘要： According to the invention, a system for applying torque to a valve element that stops fluid flow through the valve is disclosed. The system may include an input element, a drive element, and a torque transferring mechanism. The input element may be configured to receive a torque. The drive element may be configured to apply substantially none of the torque, or at least a portion of the torque, to the valve element. The torque transferring mechanism may be configured to receive the torque from the input element, and transfer substantially none of the torque, or at least a portion of the torque, to the drive element based at least in part on a resistance of the valve element to turning.

    摘要翻译： 根据本发明，公开了一种用于向阻止流体流过阀门的阀元件施加扭矩的系统。 该系统可以包括输入元件，驱动元件和扭矩传递机构。 输入元件可被配置为接收转矩。 驱动元件可以构造成基本上施加扭矩或至少一部分扭矩的阀元件。 转矩传递机构可以被配置为从输入元件接收扭矩，并且至少部分地基于阀元件的电阻至少部分地将扭矩或至少一部分转矩传递到驱动元件 转动

    High Flow Surface Mount Components
    53.
    发明申请
    High Flow Surface Mount Components 审中-公开
    高流量表面贴装元件

    公开(公告)号：US20080271800A1

    公开(公告)日：2008-11-06

    申请号：US12110907

    申请日：2008-04-28

    申请人： William J. Curran ,  Dane C. Scott

    发明人： William J. Curran ,  Dane C. Scott

    IPC分类号： F16K11/02

    CPC分类号： F16K27/003 ,  F16L47/03 ,  Y10T137/87885

    摘要： A modular fluid handling system is disclosed and may include a plurality of fluid handling units. Adjacent fluid handling units may be coupled together to form the fluid handling system. The fluid handling system may deliver fluid from at least one fluid source to fluid utilizing equipment. A plurality of fluid passages may be formed from the coupled plurality of fluid handling units, where the diameter of at least one fluid passage may be greater than the diameter of at least one other fluid passage.

    摘要翻译： 公开了一种模块化流体处理系统，并且可以包括多个流体处理单元。 相邻的流体处理单元可以联接在一起以形成流体处理系统。 流体处理系统可以将流体从至少一个流体源输送到利用流体的设备。 多个流体通道可以由联接的多个流体处理单元形成，其中至少一个流体通道的直径可以大于至少一个其它流体通道的直径。

    Method and materials for purifying hydride gases, inert gases, and non-reactive gases
    56.
    发明授权
    Method and materials for purifying hydride gases, inert gases, and non-reactive gases 失效

    公开(公告)号：US07033418B2

    公开(公告)日：2006-04-25

    申请号：US10260060

    申请日：2002-09-27

    申请人： Tadaharu Watanabe ,  Dan Fraenkel

    发明人： Tadaharu Watanabe ,  Dan Fraenkel

    IPC分类号： B01D53/02 ,  C01F7/02

    CPC分类号： B01J20/30 ,  B01D53/46 ,  B01D2253/10 ,  B01D2257/00 ,  B01J20/08 ,  Y02C10/08 ,  Y10S95/90

    摘要： A process for removing trace amounts of moisture and/or one or more impurities from contaminated hydride, inert and non-reactive gases, thus decreasing the concentration of the impurities to parts-per-billion (ppb) or parts-per-trillion (ppt) levels. The gas purifier materials of this invention include thermally activated aluminas, said aluminas including organic alumina materials, modified organic alumina materials, and modified inorganic aluminas. The thermally activated alumina materials of this invention are activated by heating the alumina material at a temperature between about 50° C.–1000° C. in an inert or non-inert atmosphere or in a vacuum and maintaining the activated material in the inert or non-inert atmosphere or in a vacuum atmosphere subsequent to said activation but prior to use.

    In-situ generation of the molecular etcher carbonyl fluoride or any of its variants and its use
    58.
    发明授权
    In-situ generation of the molecular etcher carbonyl fluoride or any of its variants and its use 有权
    原位生成分子蚀刻剂羰基氟化物或其任何变体及其用途

    公开(公告)号：US08932406B2

    公开(公告)日：2015-01-13

    申请号：US13831613

    申请日：2013-03-15

    申请人： Glenn Mitchell ,  Ramkumar Subramanian ,  Carrie L. Wyse ,  Robert Torres, Jr.

    发明人： Glenn Mitchell ,  Ramkumar Subramanian ,  Carrie L. Wyse ,  Robert Torres, Jr.

    IPC分类号： C25F1/00 ,  B01J19/08 ,  B01J19/12 ,  B08B7/00 ,  C01B31/00 ,  C23C16/44 ,  H01L21/311

    CPC分类号： B01J19/087 ,  B01J19/081 ,  B01J19/088 ,  B01J19/123 ,  B01J19/125 ,  B01J19/126 ,  B01J19/127 ,  B01J19/128 ,  B01J19/129 ,  B01J2219/0883 ,  B01J2219/0892 ,  C01B31/00 ,  C01B32/00 ,  C01B32/80 ,  C23C16/4405 ,  H01L21/31116 ,  Y02C20/30 ,  Y02P70/605

    摘要： The molecular etcher carbonyl fluoride (COF2) or any of its variants, are provided for, according to the present invention, to increase the efficiency of etching and/or cleaning and/or removal of materials such as the unwanted film and/or deposits on the chamber walls and other components in a process chamber or substrate (collectively referred to herein as “materials”). The methods of the present invention involve igniting and sustaining a plasma, whether it is a remote or in-situ plasma, by stepwise addition of additives, such as but not limited to, a saturated, unsaturated or partially unsaturated perfluorocarbon compound (PFC) having the general formula (CyFz) and/or an oxide of carbon (COx) to a nitrogen trifluoride (NF3) plasma into a chemical deposition chamber (CVD) chamber, thereby generating COF2. The NF3 may be excited in a plasma inside the CVD chamber or in a remote plasma region upstream from the CVD chamber. The additive(s) may be introduced upstream or downstream of the remote plasma such that both NF3 and the additive(s) (and any plasma-generated effluents) are present in the CVD chamber during cleaning.

    摘要翻译： 根据本发明，提供分子蚀刻剂碳酰氟（COF 2）或其任何变体，以提高蚀刻和/或清洁和/或去除诸如不需要的膜和/或沉积物之类的材料的效率 处理室或基板（这里统称为“材料”）中的室壁和其它部件。 本发明的方法包括通过逐步添加添加剂，例如但不限于饱和的，不饱和的或部分不饱和的全氟化碳化合物（PFC）来点燃和维持等离子体，无论是远距离还是原位等离子体，其具有 通式（CyFz）和/或碳（COx）与三氟化氮（NF3）等离子体的氧化物进入化学沉积室（CVD）室，从而产生COF 2。 NF 3可以在CVD室内的等离子体中或在CVD室上游的远程等离子体区域中被激发。 添加剂可以被引入远程等离子体的上游或下游，使得NF 3和添加剂（和任何等离子体产生的流出物）在清洁期间都存在于CVD室中。

    Acetylene process gas purification methods and systems
    59.
    发明授权
    Acetylene process gas purification methods and systems 失效
    乙炔工艺气体净化方法和系统

    公开(公告)号：US08182589B2

    公开(公告)日：2012-05-22

    申请号：US12631017

    申请日：2009-12-04

    申请人： Praveen Jha ,  Joseph V. Vininski

    发明人： Praveen Jha ,  Joseph V. Vininski

    IPC分类号： B01D8/00

    CPC分类号： B01D53/002 ,  B01D53/72 ,  B01D2257/704 ,  C07C7/09 ,  C07C11/24

    摘要： Methods and systems of purifying an acetylene process gas are described. The methods may include the steps of providing an acetylene vessel containing source acetylene mixed with a solvent impurity, and flowing the source acetylene through a purification container that holds a cooled purifying medium, where at least a portion of the solvent impurity in the source acetylene separates as a liquid impurity on the purifying medium. The method may also include removing the liquid from the purification container and flowing a purified acetylene gas from the purification container. The purified acetylene gas has a concentration of the solvent impurity of about 5 vol. % or less, and the separated liquid impurity is removed without interrupting the flow of the acetylene while the purified acetylene gas flows from the purification container to keep the concentration of the solvent impurity substantially constant in the purified acetylene gas.

    摘要翻译： 描述了乙炔工艺气体的纯化方法和系统。 所述方法可以包括以下步骤：提供含有与溶剂杂质混合的源乙炔的乙炔容器，并使源乙炔流过保持冷却的纯化介质的净化容器，其中源乙炔中的至少一部分溶剂杂质分离 作为净化介质上的液体杂质。 该方法还可以包括从净化容器中除去液体并使净化的乙炔气体从净化容器流出。 纯化的乙炔气体的溶剂杂质浓度约为5体积％。 ％以下，分离出的液体杂质被除去，而不会中断乙炔的流动，同时纯化的乙炔气体从净化容器流出，使得纯化的乙炔气体中的溶剂杂质的浓度基本保持不变。